Correlation between midgap interface state density and thickness‐averaged oxide stress and strain at Si/SiO2interfaces formed by thermal oxidation of Si
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2009 ◽
Vol 615-617
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pp. 789-792
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1979 ◽
Vol 126
(9)
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pp. 1573-1581
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2013 ◽
Vol 133
(7)
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pp. 1279-1284
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1998 ◽
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