Highly conductive and wide band gap amorphous‐microcrystalline mixed‐phase silicon films prepared by photochemical vapor deposition

1985 ◽  
Vol 58 (4) ◽  
pp. 1427-1431 ◽  
Author(s):  
Shoji Nishida ◽  
Hirohisa Tasaki ◽  
Makoto Konagai ◽  
Kiyoshi Takahashi
Keyword(s):  
Band Gap ◽  
Vapor Deposition ◽  
Wide Band ◽  
Mixed Phase ◽  
Silicon Films ◽  
Wide Band Gap ◽  
Photochemical Vapor Deposition

Hydrogenated Amorphous Silicon-Nitrogen, a-Si,N:H ALLOYS: An Alternative to A-SI,C:H for the Wide Band Gap Photo-Active Material in Tandem PV Cells

1993 ◽  
Vol 297 ◽  
Author(s):  
M.J. Williams ◽  
S.M. Cho ◽  
G. Lucovsky
Keyword(s):  
Chemical Vapor Deposition ◽  
Band Gap ◽  
Vapor Deposition ◽  
Active Material ◽  
Hydrogenated Amorphous Silicon ◽  
Chemical Vapor ◽  
Wide Band ◽  
Wide Band Gap ◽  
Staebler Wronski Effect ◽  
Hydrogenated Amorphous

We have investigated a-Si,N:H alloys as an alternative wide band-gap, photo-active material. The entire alloy range between a-Si:H and a-Si3N4:H can be formed by a remote plasma-enhanced chemical-vapor deposition (PECVD) process. Other studies have demonstrated that a-Si,N:H alloys could be doped to form window materials for p-i-n devices. This paper focuses on alloy materials with E04 bandgaps to about 2.2 eV. We have prepared these a-Si,N:H alloys, characterized their microstructure, and studied their photoconductivity, sensitivity to light-soaking and transport properties. For example, with increased alloying we show that i) the white-light photoconductivity and ii) the kinetics and magnitude of the decay of photoconducitivity under intense illumination (the Staebler-Wronski effect), are about the same as for PV-grade a-Si:H.

Epitaxial growth of wide-band-gap ZnGa2O4 films by mist chemical vapor deposition

2014 ◽  
Vol 386 ◽  
pp. 190-193 ◽  
Author(s):  
Takayoshi Oshima ◽  
Mifuyu Niwa ◽  
Akira Mukai ◽  
Tomohito Nagami ◽  
Toshihisa Suyama ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Band Gap ◽  
Epitaxial Growth ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Wide Band ◽  
Wide Band Gap

Correlation Between Electrical-Optical and Structural Properties of Microcrystalline Silicon N Type Films

1996 ◽  
Vol 420 ◽  
Author(s):  
R. Martins ◽  
A. Macarico ◽  
I. Ferreira ◽  
R. Nunes ◽  
A. Bicho ◽  
...  
Keyword(s):  
Solar Cells ◽  
Band Gap ◽  
Structural Properties ◽  
Wide Band ◽  
Optical Devices ◽  
Silicon Films ◽  
Optical Characteristics ◽  
Microcrystalline Silicon ◽  
Wide Band Gap ◽  
Crystalline Materials

AbstractWide band gap microcrystalline silicon films have aroused considerable interest since they combine some electro-optical advantages of amorphous and crystalline materials highly important to produce electro-optical devices such as TFTs and solar cells. In this paper we present results concerning the electro-optical characteristics of highly transparent and conductive n-type µc-Si based films. Here, emphasis is given to the production of n-type ýtc-films with optical gaps of 2.3 eV and dark conductivity's of 6.5 Scm-1

Highly Conductive and Wide Band GaP Microcrystalline Silicon Films Prepared by Photochemical Vapor Deposition and Applications to Devices

1985 ◽  
Vol 49 ◽  
Author(s):  
S. Nishida ◽  
H. Tasaki ◽  
M. Konagai ◽  
K. Takahashi
Keyword(s):  
Band Gap ◽  
Optical Band Gap ◽  
Wide Band ◽  
Dark Conductivity ◽  
Hydrogen Gas ◽  
Microcrystalline Silicon ◽  
Wide Band Gap ◽  
Wide Gap ◽  
P Type ◽  
Photochemical Vapor Deposition

AbstractDoped hydrogenated microcrystalline silicon (μc-Si:H) and fluorinated hydrogenated microcrystalline (μc-Si:F:H) films were prepared by the mercury photosensitized decomposition of a disilane-hydrogen or a difluorosilane-hydrogen gas mixture, respectively. The maximum dark conductivity and optical band gap of μc-Si:H films were respectively 20 S•cm−1 and ∼2.0 eV for n-type and 1 S•cm−1 and 2.3 eV for p-type. A higher dark conductivity as much as 50 S•cm−1 and a wide gap of 2.0 eV were obtained for n-type μc-Si:F:H. It is most significant that the gaseous ratio of hydrogen to disilane should be enhanced to obtain such a highly conductive and wide gap film. The crystallinity of the photo-deposited μc-Si:H films appeared to be improved in comparison with that of films by the conventional plasma glow discharge technique.

scholarly journals Optical Properties of Wide Band Gap Indium Sulphide Thin Films Obtained by Physical Vapor Deposition

2001 ◽  
Vol 184 (1) ◽  
pp. 179-186 ◽  
Author(s):  
N. Barreau ◽  
S. Marsillac ◽  
J.C. Bern�de ◽  
T. Ben Nasrallah ◽  
S. Belgacem
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Band Gap ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Wide Band ◽  
Wide Band Gap ◽  
Indium Sulphide

Wide band gap and conducting tungsten carbide (WC) thin films prepared by hot wire chemical vapor deposition (HW-CVD) method

2016 ◽  
Vol 183 ◽  
pp. 315-317 ◽  
Author(s):  
Amit Pawbake ◽  
Ravindra Waykar ◽  
Ashok Jadhavar ◽  
Rupali Kulkarni ◽  
Vaishali Waman ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Tungsten Carbide ◽  
Band Gap ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Wide Band ◽  
Hot Wire ◽  
Wide Band Gap ◽  
Cvd Method
Sign in / Sign up

Export Citation Format

Share Document