Investigation of silicon oxide films prepared by room-temperature ion plating

1998 ◽  
Vol 83 (2) ◽  
pp. 1107-1113 ◽  
Author(s):  
Ching-Fa Yeh ◽  
Tai-Ju Chen ◽  
Ching-Lin Fan ◽  
Jiann-Shiun Kao
Keyword(s):  
Room Temperature ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Ion Plating

Thermally Stable Carbon-Doped Silicon Oxide Films Deposited at Room Temperature

2006 ◽  
Author(s):  
Keisuke Yamaoka ◽  
Hideaki Kato ◽  
Daisuke Tsukiyama ◽  
Yuji Yoshizako ◽  
Yoshikazu Terai ◽  
...  
Keyword(s):  
Room Temperature ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Thermally Stable ◽  
Stable Carbon ◽  
Carbon Doped ◽  
Doped Silicon

Room-temperature deposition of high-purity silicon oxide films by RF plasma-enhanced CVD

2001 ◽  
Vol 146-147 ◽  
pp. 451-456 ◽  
Author(s):  
Katsuya Teshima ◽  
Yasushi Inoue ◽  
Hiroyuki Sugimura ◽  
Osamu Takai
Keyword(s):  
High Purity ◽  
Room Temperature ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Rf Plasma ◽  
Plasma Enhanced Cvd ◽  
High Purity Silicon ◽  
Temperature Deposition

Room-Temperature Formation of Low Refractive Index Silicon Oxide Films Using Atmospheric-Pressure Plasma

2011 ◽  
Vol 11 (4) ◽  
pp. 2851-2855 ◽  
Author(s):  
Kei Nakamura ◽  
Yoshihito Yamaguchi ◽  
Keiji Yokoyama ◽  
Kosuke Higashida ◽  
Hiromasa Ohmi ◽  
...  
Keyword(s):  
Refractive Index ◽  
Atmospheric Pressure ◽  
Room Temperature ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Atmospheric Pressure Plasma ◽  
Pressure Plasma ◽  
Low Refractive Index

Room-temperature visible electroluminescence of Al-doped silicon oxide films

2001 ◽  
Vol 78 (26) ◽  
pp. 4121-4123 ◽  
Author(s):  
X. M. Wu ◽  
Y. M. Dong ◽  
L. J. Zhuge ◽  
C. N. Ye ◽  
N. Y. Tang ◽  
...  
Keyword(s):  
Room Temperature ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Doped Silicon
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