scholarly journals Formation of SiO2 film by chemical vapor deposition enhanced by atomic species extracted from a surface-wave generated plasma

2017 ◽  
Author(s):  
H. Okada ◽  
M. Baba ◽  
M. Furukawa ◽  
K. Yamane ◽  
H. Sekiguchi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Surface Wave ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Sio2 Film ◽  
Atomic Species

NITROGEN INCORPORATED HYDROGENATED AMORPHOUS CARBON THIN FILMS DEPOSITED BY MICROWAVE SURFACE-WAVE PLASMA CHEMICAL VAPOR DEPOSITION

2009 ◽  
Vol 23 (09) ◽  
pp. 2159-2165 ◽  
Author(s):  
SUDIP ADHIKARI ◽  
MASAYOSHI UMENO
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Surface Wave ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Hydrogenated Amorphous Carbon ◽  
Plasma Chemical Vapor Deposition ◽  
Hydrogenated Amorphous

Nitrogen incorporated hydrogenated amorphous carbon (a-C:N:H) thin films have been deposited by microwave surface-wave plasma chemical vapor deposition on silicon and quartz substrates, using helium, methane and nitrogen ( N 2) as plasma source. The deposited a-C:N:H films were characterized by their optical, structural and electrical properties through UV/VIS/NIR spectroscopy, Raman spectroscopy, atomic force microscope and current-voltage characteristics. The optical band gap decreased gently from 3.0 eV to 2.5 eV with increasing N 2 concentration in the films. The a-C:N:H film shows significantly higher electrical conductivity compared to that of N 2-free a-C:H film.

Superconformal chemical vapor deposition using plasma-generated atomic species as a consumable growth inhibitor

2021 ◽  
Vol 39 (4) ◽  
pp. 043409
Author(s):  
Yu Yang ◽  
Kinsey L. Canova ◽  
Sreenivas Jayaraman ◽  
Do-Young Kim ◽  
Gregory S. Girolami ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Growth Inhibitor ◽  
Atomic Species

Large-Scale Synthesis of Aligned Carbon Nanotubes by Surface-Wave-Excited Microwave-Plasma-Enhanced Chemical Vapor Deposition

2002 ◽  
Vol 41 (Part 2, No. 12B) ◽  
pp. L1488-L1491 ◽  
Author(s):  
Hiroyuki Hayashi ◽  
Mizuho Koga ◽  
Jun Kashirajima ◽  
Kazumasa Takahashi ◽  
Yasuaki Hayashi ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Surface Wave ◽  
Vapor Deposition ◽  
Large Scale ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Aligned Carbon Nanotubes ◽  
Large Scale Synthesis

CATALYTIC EFFECTS OF FERROCENE ON BONDING, OPTICAL AND STRUCTURAL PROPERTIES OF DIAMOND-LIKE CARBON FILMS DEPOSITED BY MICROWAVE SURFACE-WAVE PLASMA CHEMICAL VAPOR DEPOSITION

2006 ◽  
Vol 13 (06) ◽  
pp. 789-793 ◽  
Author(s):  
SUDIP ADHIKARI ◽  
SUNIL ADHIKARY ◽  
HIDEO UCHIDA ◽  
MASAYOSHI UMENO
Keyword(s):  
Chemical Vapor Deposition ◽  
Surface Wave ◽  
Structural Properties ◽  
Vapor Deposition ◽  
Optical Band Gap ◽  
Chemical Vapor ◽  
Diamond Like Carbon ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Catalytic Effects

This paper reports catalytic effects of ferrocene on bonding, optical and structural properties of diamond-like carbon (DLC) thin films grown on silicon and quartz substrates by microwave surface-wave plasma chemical vapor deposition. For film deposition, helium and methane gases were used as plasma source. Bonding, optical and structural properties of the DLC films were measured both with and without using ferrocene as a catalyst. The ferrocene content in the DLC was confirmed by X-ray spectroscopy (XPS) measurement. The optical band gap decreased from 2.7 eV (without ferrocene) to 1.6 eV (with ferrocene). Raman spectra of the ferrocene content film shows that the G-peak was more pronounced compared to the film without ferrocene. Results suggest that appropriate concentration of ferrocene in DLC film helps to reduce the optical band gap because of ferrocene-induced graphitization.

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