Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi3+ as primary ion coupled with surface etching by Ar cluster ion beam: The effect of etching conditions on surface structure

2018 ◽  
Vol 123 (1) ◽  
pp. 015303 ◽  
Author(s):  
Eun Ji Park ◽  
Chang Min Choi ◽  
Il Hee Kim ◽  
Jung-Hwan Kim ◽  
Gaehang Lee ◽  
...  
Keyword(s):  
Surface Structure ◽  
Mass Spectroscopy ◽  
Au Nanoparticles ◽  
Ion Beam ◽  
Secondary Ion Mass Spectroscopy ◽  
Surface Etching ◽  
Cluster Ion ◽  
Secondary Ion ◽  
Si Wafer

Time-of-flight secondary ion mass spectroscopy for surface analysis of insulators using a cluster ion beam

2003 ◽  
Vol 83 (23) ◽  
pp. 4872-4874 ◽  
Author(s):  
K. Hirata ◽  
Y. Saitoh ◽  
A. Chiba ◽  
K. Narumi ◽  
Y. Kobayashi ◽  
...  
Keyword(s):  
Surface Analysis ◽  
Mass Spectroscopy ◽  
Ion Beam ◽  
Time Of Flight ◽  
Secondary Ion Mass Spectroscopy ◽  
Cluster Ion ◽  
Secondary Ion

Improvement of the gas cluster ion beam-(GCIB)-based molecular secondary ion mass spectroscopy (SIMS) depth profile with O2+ cosputtering

The Analyst ◽  
2016 ◽  
Vol 141 (8) ◽  
pp. 2523-2533 ◽  
Author(s):  
Yi-Hsuan Chu ◽  
Hua-Yang Liao ◽  
Kang-Yi Lin ◽  
Hsun-Yun Chang ◽  
Wei-Lun Kao ◽  
...  
Keyword(s):  
Steady State ◽  
Depth Profile ◽  
Mass Spectroscopy ◽  
Ion Beam ◽  
Depth Profiles ◽  
Tof Sims ◽  
Cluster Ion ◽  
Gas Cluster Ion Beam ◽  
Secondary Ion ◽  
Sims Depth Profile

The Ar2500+ and O2+ cosputter in ToF-SIMS depth profiles retained >95% molecular ion intensity in the steady-state.

scholarly journals Secondary ion mass spectroscopy of TiN thin films obtained by ion beam mixing.

Shinku ◽  
1987 ◽  
Vol 30 (5) ◽  
pp. 310-313
Author(s):  
Ichiro TAKANO ◽  
Masahiro ISHIDA ◽  
Tomo BABA ◽  
Masakatsu TAKEMOTO ◽  
Shoji ISOBE
Keyword(s):  
Thin Films ◽  
Mass Spectroscopy ◽  
Ion Beam ◽  
Ion Beam Mixing ◽  
Secondary Ion Mass Spectroscopy ◽  
Tin Thin Films ◽  
Secondary Ion
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