Terahertz scattering-type near-field microscopy quantitatively determines the conductivity and charge carrier density of optically doped and impurity-doped silicon

Abstract For Very Deep submicron Technologies, techniques based on the analysis of reflected laser beam properties are widely used. The Laser Voltage Imaging (LVI) technique, introduced in 2009, allows mapping frequencies through the backside of integrated circuit. In this paper, we propose a new technique based on the LVI technique to debug a scan chain related issue. We describe the method to use LVI, usually dedicated to frequency mapping of digital active parts, in a way that enables localization of resistive leakage. Origin of this signal is investigated on a 40nm case study. This signal can be properly understood when two different effects, charge carrier density variations (LVI) and thermo reflectance effect (Thermal Frequency Imaging, TFI), are taken into account.

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Electronic transport in normal-conductor/graphene/normal-conductor junctions and conditions for insulating behavior at a finite charge-carrier density

Physical Review B ◽

10.1103/physrevb.76.115430 ◽

2007 ◽

Vol 76 (11) ◽

Cited By ~ 68

Author(s):

John P. Robinson ◽

Henning Schomerus

Keyword(s):

Charge Carrier ◽

Electronic Transport ◽

Carrier Density ◽

Charge Carrier Density ◽

Normal Conductor

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Zn2+ Ion Surface Enrichment in Doped Iron Oxide Nanoparticles Leads to Charge Carrier Density Enhancement

ACS Omega ◽

10.1021/acsomega.8b02411 ◽

2018 ◽

Vol 3 (11) ◽

pp. 16328-16337 ◽

Cited By ~ 3

Author(s):

Stanley Bram ◽

Matthew N. Gordon ◽

Michael A. Carbonell ◽

Maren Pink ◽

Barry D. Stein ◽

...

Keyword(s):

Iron Oxide ◽

Charge Carrier ◽

Iron Oxide Nanoparticles ◽

Carrier Density ◽

Oxide Nanoparticles ◽

Charge Carrier Density ◽

Surface Enrichment ◽

Density Enhancement

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Tuning of charge carrier density by deposition pressure in Sb-doped Bi2Se3 thin films

Thin Solid Films ◽

10.1016/j.tsf.2019.137689 ◽

2020 ◽

Vol 693 ◽

pp. 137689

Author(s):

S. Abhirami ◽

Shilpam Sharma ◽

E.P. Amaladass ◽

R. Rajitha ◽

P. Magudapathy ◽

...

Keyword(s):

Thin Films ◽

Charge Carrier ◽

Carrier Density ◽

Charge Carrier Density ◽

Deposition Pressure

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Moderate strain induced indirect bandgap and conduction electrons in MoS2 single layers

npj 2D Materials and Applications ◽

10.1038/s41699-019-0123-5 ◽

2019 ◽

Vol 3 (1) ◽

Cited By ~ 6

Author(s):

János Pető ◽

Gergely Dobrik ◽

Gergő Kukucska ◽

Péter Vancsó ◽

Antal A. Koós ◽

...

Keyword(s):

Charge Carrier ◽

Fermi Level ◽

Conduction Band ◽

Carrier Density ◽

Tensile Strain ◽

Charge Carrier Density ◽

Conduction Electrons ◽

Metallic Character ◽

Optical Bandgaps ◽

Biaxial Tensile Strain

Abstract MoS2 single layers are valued for their sizeable direct bandgap at the heart of the envisaged electronic and optoelectronic applications. Here we experimentally demonstrate that moderate strain values (~2%) can already trigger an indirect bandgap transition and induce a finite charge carrier density in 2D MoS2 layers. A conclusive proof of the direct-to-indirect bandgap transition is provided by directly comparing the electronic and optical bandgaps of strained MoS2 single layers obtained from tunneling spectroscopy and photoluminescence measurements of MoS2 nanobubbles. Upon 2% biaxial tensile strain, the electronic gap becomes significantly smaller (1.45 ± 0.15 eV) than the optical direct gap (1.73 ± 0.1 eV), clearly evidencing a strain-induced direct to indirect bandgap transition. Moreover, the Fermi level can shift inside the conduction band already in moderately strained (~2%) MoS2 single layers conferring them a metallic character.

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