Long-Term Operation of Si3N4Ball Bearings at Temperatures up to 650°C in Ultra-High Vacuum©

1997 ◽  
Vol 40 (1) ◽  
pp. 31-40 ◽  
Author(s):  
Shingo Obara ◽  
Mineo Suzuki
Keyword(s):  
High Vacuum ◽  
Ultra High Vacuum ◽  
Term Operation

Low friction states for thin solid lubricant film of MoS2

2018 ◽  
Vol 70 (4) ◽  
pp. 639-644 ◽  
Author(s):  
Kwang-Hua R. Chu
Keyword(s):  
Thin Films ◽  
Solid Lubricant ◽  
Activation Volume ◽  
High Vacuum ◽  
Low Friction ◽  
Friction Behavior ◽  
Stick Slip ◽  
Content Type ◽  
Term Operation

Purpose During the operation of Wendelstein 7-X (W7-X), any mechanical disturbance such as stick-slip may cause quenching of superconducting (SC) coils. The friction behavior of MoS2 lubrication (thin film) for narrow support elements between the SC coils in W7-X is rather important, as there is a design requirement for a coefficient of friction (COF) 0.05 between the sliding surfaces to control the stress contribution (from friction). Design/methodology/approach The author has carried out intensive calibrations or verifications using verified models considering previous friction tests on various samples which measured the COF in 4.2 K, 77 K and room temperature conditions (at high vacuum) to simulate the actual working condition. Findings The author has given useful explanations and diagnosis for previous anomalous scattered data. To improve the performance of MoS2, the author has predicted its better COF (0.002 via tuning of the activation volume), which could be a superlubricating state for MoS2 thin films considering the long-term operation requirement W7-X. Originality/value In this paper, the author has adopted Eyring’s approach to predict the low COF (0.002 via tuning of the activation volume), which could be a superlubricating state for MoS2 thin films considering the long-term operation requirement W7-X. Finally, some recent progresses about the possible few-layer MoS2 role in the electromagnetic loads have been provided.

LONG-TERM OPERATION TESTS OF ORGANIC SOLID-STATE SOLAR CELLS

2007 ◽  
Vol 14 (04) ◽  
pp. 539-542 ◽  
Author(s):  
HIROKI SHIOKAWA ◽  
MASAAKI YOKOYAMA ◽  
MASAHIRO HIRAMOTO
Keyword(s):  
Solid State ◽  
Short Circuit ◽  
High Vacuum ◽  
Organic Photovoltaic ◽  
Organic Layer ◽  
Term Operation ◽  
Organic Solid ◽  
Initial Decrease ◽  
Junction Type

The long-term operation tests of two types of solid-state organic photovoltaic (OPV) cells, p–n heterojunction type cells and p–i–n junction type cells, were performed. In both cells, a drastic decrease in photocurrent within 1 h was observed in air. This rapid decrease was revealed to be caused by oxygen molecules which act as a electron trap in the electron transporting organic layer. Initial decrease of photocurrent was effectively suppressed under high vacuum (10-7 Torr). In the case of a p–n type cell, the decrease in short-circuit photocurrent was only 15% even under prolonged light irradiation of 260 h.

scholarly journals An ultra-high-stability four-axis ultra-high-vacuum sample manipulator

2021 ◽  
Vol 28 (4) ◽  
Author(s):  
Marcus Agåker ◽  
Carl-Johan Englund ◽  
Peter Sjöblom ◽  
Nial Wassdahl ◽  
Pierre Fredriksson ◽  
...  
Keyword(s):  
High Stability ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Design Parameters ◽  
Light Weight ◽  
Term Stability ◽  
Long Term Stability ◽  
Rotary Seal ◽  
Better Than

A report on a four-axis ultra-high-stability manipulator developed for use at the Veritas and Species RIXS beamlines at MAX IV Laboratory, Lund, Sweden, is presented. The manipulator consists of a compact, light-weight X–Y table with a stiffened Z tower carrying a platform with a rotary seal to which a manipulator rod holding the sample can be attached. Its design parameters have been optimized to achieve high eigen-frequencies via a light-weight yet stiff construction, to absorb forces without deformations, provide a low center of gravity, and have a compact footprint without compromising access to the manipulator rod. The manipulator system can house a multitude of different, easily exchangeable, manipulator rods that can be tailor-made for specific experimental requirements without having to rebuild the entire sample positioning system. It is shown that the manipulator has its lowest eigen-frequency at 48.5 Hz and that long-term stability is in the few tens of nanometres. Position accuracy is shown to be better than 100 nm. Angular accuracy is in the 500 nrad range with a long-term stability of a few hundred nanoradians.

Thin Pyrolytic Graphite Films for Electron Microscope Substrates

1971 ◽  
Vol 29 ◽  
pp. 226-227 ◽  
Author(s):  
George H. N. Riddle ◽  
Benjamin M. Siegel
Keyword(s):  
Vacuum Chamber ◽  
Pyrolytic Graphite ◽  
High Vacuum ◽  
Dark Field ◽  
Ultra High Vacuum ◽  
Graphite Substrate ◽  
Nickel Substrate ◽  
Routine Procedure ◽  
Field Electron Microscopy ◽  
Dark Field Electron

A routine procedure for growing very thin graphite substrate films has been developed. The films are grown pyrolytically in an ultra-high vacuum chamber by exposing (111) epitaxial nickel films to carbon monoxide gas. The nickel serves as a catalyst for the disproportionation of CO through the reaction 2C0 → C + CO2. The nickel catalyst is prepared by evaporation onto artificial mica at 400°C and annealing for 1/2 hour at 600°C in vacuum. Exposure of the annealed nickel to 1 torr CO for 3 hours at 500°C results in the growth of very thin continuous graphite films. The graphite is stripped from its nickel substrate in acid and mounted on holey formvar support films for use as specimen substrates.The graphite films, self-supporting over formvar holes up to five microns in diameter, have been studied by bright and dark field electron microscopy, by electron diffraction, and have been shadowed to reveal their topography and thickness. The films consist of individual crystallites typically a micron across with their basal planes parallel to the surface but oriented in different, apparently random directions about the normal to the basal plane.

A High Voltage Electron Microscopy Study of Sub-Oxide Formation in Vanadium

1971 ◽  
Vol 29 ◽  
pp. 212-213
Author(s):  
R. H. Geiss ◽  
R. L. Ladd ◽  
K. R. Lawless
Keyword(s):  
High Vacuum ◽  
Microscopy Study ◽  
Electron Microscopy Study ◽  
Ultra High Vacuum ◽  
Pure Oxygen ◽  
Pressure Oxidation ◽  
High Voltage Electron Microscopy ◽  
Oxidation Study ◽  
Voltage Electron ◽  
Good Agreement

Detailed electron microscope and diffraction studies of the sub-oxides of vanadium have been reported by Cambini and co-workers, and an oxidation study, possibly complicated by carbon and/or nitrogen, has been published by Edington and Smallman. The results reported by these different authors are not in good agreement. For this study, high purity polycrystalline vanadium samples were electrochemically thinned in a dual jet polisher using a solution of 20% H2SO4, 80% CH3OH, and then oxidized in an ion-pumped ultra-high vacuum reactor system using spectroscopically pure oxygen. Samples were oxidized at 350°C and 100μ oxygen pressure for periods of 30,60,90 and 160 minutes. Since our primary interest is in the mechanism of the low pressure oxidation process, the oxidized samples were cooled rapidly and not homogenized. The specimens were then examined in the HVEM at voltages up to 500 kV, the higher voltages being necessary to examine thick sections for which the oxidation behavior was more characteristic of the bulk.

The High Resolution Scanning Transmission Electron Microscope

1974 ◽  
Vol 32 ◽  
pp. 316-317
Author(s):  
A. V. Crewe
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
High Vacuum ◽  
Scanning Transmission Electron Microscope ◽  
Ultra High Vacuum ◽  
Resolving Power ◽  
Imaging Characteristics ◽  
Transmission Electron ◽  
Scanning Transmission ◽  
The Moment

The high resolution STEM is now a fact of life. I think that we have, in the last few years, demonstrated that this instrument is capable of the same resolving power as a CEM but is sufficiently different in its imaging characteristics to offer some real advantages.It seems possible to prove in a quite general way that only a field emission source can give adequate intensity for the highest resolution^ and at the moment this means operating at ultra high vacuum levels. Our experience, however, is that neither the source nor the vacuum are difficult to manage and indeed are simpler than many other systems and substantially trouble-free.

Structure of Palladium Single-Crystal Films Prepared by Flash Evaporation onto (001) NaCl Substrates

1970 ◽  
Vol 28 ◽  
pp. 456-457
Author(s):  
L. E. Murr ◽  
G. Wong
Keyword(s):  
Single Crystal ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
High Rate ◽  
Flash Evaporation ◽  
Optimum Load ◽  
Single Crystal Films ◽  
Crystal Films ◽  
A Current

Palladium single-crystal films have been prepared by Matthews in ultra-high vacuum by evaporation onto (001) NaCl substrates cleaved in-situ, and maintained at ∼ 350° C. Murr has also produced large-grained and single-crystal Pd films by high-rate evaporation onto (001) NaCl air-cleaved substrates at 350°C. In the present work, very large (∼ 3cm2), continuous single-crystal films of Pd have been prepared by flash evaporation onto air-cleaved (001) NaCl substrates at temperatures at or below 250°C. Evaporation rates estimated to be ≧ 2000 Å/sec, were obtained by effectively short-circuiting 1 mil tungsten evaporation boats in a self-regulating system which maintained an optimum load current of approximately 90 amperes; corresponding to a current density through the boat of ∼ 4 × 104 amperes/cm2.

A Field Emission System For Transmission Electron Microscopy

1973 ◽  
Vol 31 ◽  
pp. 298-299
Author(s):  
Michel Troyonal ◽  
Huei Pei Kuoal ◽  
Benjamin M. Siegelal
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Optical System ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Objective Lens ◽  
Electron Optical System ◽  
Cross Sectional ◽  
Transmission Electron ◽  
Emission System

A field emission system for our experimental ultra high vacuum electron microscope has been designed, constructed and tested. The electron optical system is based on the prototype whose performance has already been reported. A cross-sectional schematic illustrating the field emission source, preaccelerator lens and accelerator is given in Fig. 1. This field emission system is designed to be used with an electron microscope operated at 100-150kV in the conventional transmission mode. The electron optical system used to control the imaging of the field emission beam on the specimen consists of a weak condenser lens and the pre-field of a strong objective lens. The pre-accelerator lens is an einzel lens and is operated together with the accelerator in the constant angular magnification mode (CAM).

Hetero-Epitaxy of Group Va Metals on Sapphire

1972 ◽  
Vol 30 ◽  
pp. 492-493
Author(s):  
J. E. O'Neal ◽  
J. J. Bellina ◽  
B. B. Rath
Keyword(s):  
Thermal Contact ◽  
High Vacuum ◽  
Electron Beam Evaporation ◽  
Ultra High Vacuum ◽  
Backing Plate ◽  
Sapphire Substrates ◽  
Deposition Parameters ◽  
Polishing Damage ◽  
Reflection Electron Diffraction

Thin films of the bcc metals vanadium, niobium and tantalum were epitaxially grown on (0001) and sapphire substrates. Prior to deposition, the mechanical polishing damage on the substrates was removed by an in-situ etch. The metal films were deposited by electron-beam evaporation in ultra-high vacuum. The substrates were heated by thermal contact with an electron-bombarded backing plate. The deposition parameters are summarized in Table 1.The films were replicated and examined by electron microscopy and their crystallographic orientation and texture were determined by reflection electron diffraction. Verneuil-grown and Czochralskigrown sapphire substrates of both orientations were employed for each evaporation. The orientation of the metal deposit was not affected by either increasing the density of sub-grain boundaries by about a factor of ten or decreasing the deposition rate by a factor of two. The results on growth epitaxy are summarized in Tables 2 and 3.

Sign in / Sign up

Export Citation Format

Share Document