scholarly journals Experiments on intense ion beam formation with inhomogeneous electric field

2021 ◽  
Author(s):  
Sergey Vybin ◽  
V. A. Skalyga ◽  
Ivan Izotov ◽  
Sergey Golubev ◽  
Sergey Razin ◽  
...  
Keyword(s):  
Electric Field ◽  
Current Density ◽  
Microwave Plasma ◽  
Ion Beam ◽  
Plasma Heating ◽  
Ion Source ◽  
Ecr Ion Source ◽  
Inhomogeneous Electric Field ◽  
Beam Formation ◽  
Current Densities

Abstract The high efficiency of a new ion beam extraction system with a strongly inhomogeneous electric field has been experimentally demonstrated. Previously, this approach was proposed and analysed numerically by the authors. The experiment was carried out using a pulsed high-current electron-cyclotron resonance (ECR) ion source SMIS 37 with high frequency (37.5 GHz) and high power (100 kW) microwave plasma heating. The accelerating field strength is increased (when compared to a flat or a quasi-pierced geometry) in the plasma meniscus region due to its inhomogeneity. It allows for the increase of the ion acceleration rate and for expansion of the available range of current densities with effective ion beam formation. The experiment demonstrated the main advantages of this approach, such as: a significant decrease in the optimal accelerating voltage for certain values of current density; a possibility of ion beam formation with previously inaccessible current densities; a significant decrease in the ion flux to the puller in non-optimal modes of ion beam formation. Proton beams with a current density of up to 1.1 A cm-2 were obtained for the first time with an ECR ion source.

TiOxCy Thin Film Deposition by CO2+-Ion Beam Sputtering of Titanium

1993 ◽  
Vol 316 ◽  
Author(s):  
BERTILO E. KEMPF
Keyword(s):  
Near Infrared ◽  
Ion Beam ◽  
Thin Film Deposition ◽  
Ion Source ◽  
Film Deposition ◽  
Refractive Indices ◽  
Ion Beam Sputtering ◽  
Infrared Wavelength ◽  
Beam Sputtering ◽  
Current Densities

ABSTRACTTitanium metal is sputtered by ion beams using a Kaufman-type ion source with carbondioxide as working gas. Deposition takes place on watercooled substrates of silicon and InP. The films obtained are amorphous; they adhere excellently. SEM-pictures reveal a featureless dense fracture and a smooth surface. Despite a carbon content of 9 at % the films are highly transparent in the visible and near infrared wavelength range. Refractive indices center around 2.15 at values typically found for amorphous TiO2. The electrical properties are characterized by dielectric constant of ε = 26 ± 3, leakage current densities at breakdown of jL = 3.65 . 10-3 A/cm2 and breakdown fields EB > 1 MeV/cm.

Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source

1982 ◽  
Vol 21 (Part 2, No. 1) ◽  
pp. L4-L6 ◽  
Author(s):  
Seitaro Matsuo ◽  
Yoshio Adachi
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Ecr Ion Source ◽  
Ion Beam Etching ◽  
Broad Beam ◽  
Reactive Ion Beam Etching

A New Design and Computer Simulation of a 5-Electrode Ion Extraction/Focusing System

2005 ◽  
Vol 107 ◽  
pp. 21-24 ◽  
Author(s):  
M. Medhisuwakul ◽  
Thiraphat Vilaithong ◽  
Jürgen Engemann
Keyword(s):  
Microwave Plasma ◽  
Ion Beam ◽  
Plasma Source ◽  
Ion Source ◽  
Simulation Software ◽  
Ion Current ◽  
Extraction System ◽  
Beam Shape ◽  
Ion Extraction ◽  
Argon Ion

A 13.56 MHz radio-frequency (rf) driven multicusp ion source has been constructed [1] to produce a high argon ion current density. Milliampere-range argon ion current can be extracted from the source. An in-waveguide microwave plasma source has been utilized as the ion beam neutralizer [2]. The neutralization source was placed 20 cm downstream from the extraction system. With the former extraction system, comprised of extraction electrodes and an Einzel lens, the electrons from the neutralizer were attracted to the high positive potential of the lens. Consequently, the potential of the lens drops and the beam is diverged. To suppress electrons from being accelerated to the Einzel lens a negatively biased electrode was placed before the last electrode, which is grounded, to produce a retarding electric field for electrons. The hole of the electrode was made small to make sure that the potential at the center is negative enough to suppress electrons. All simulations have been performed with the KOBRA3-INP simulation software. The results of the beam shape from the simulation will be presented.

scholarly journals Decreased beam divergence in proof-of-principle experiment for the light ion beam fusion facility PBFA II

1985 ◽  
Vol 3 (1) ◽  
pp. 93-105 ◽  
Author(s):  
J. P. Vandevender ◽  
J. A. Swegle ◽  
D. J. Johnson ◽  
K. W. Bieg ◽  
E. J. T. Burns ◽  
...  
Keyword(s):  
Current Density ◽  
Ion Beam ◽  
Ion Source ◽  
Beam Divergence ◽  
Anode Current Density ◽  
Anode Current ◽  
Lithium Ions ◽  
Short Pulses ◽  
Proof Of Principle

The Proto-I experiment for a proof-of-principle experiment is described resulting in a beam divergence for ions of only 14mrad at 1·5 MV—420 KA operation and 6 KA/cm2 anode current density before focusing. This is a better beam divergence than required for Sandia National Laboratories' PBFA I and II installations, for which scaling is discussed. Ion source development is reported and the PBFA II experiment described for 30 MV operation with short pulses (10–15 nsec) of lithium ions. Pulses of 50 nsec width and 130 KJ energy have been achieved from the prototype module for PBFA II.

Numerical simulation multicomponent ion beam transport from ECR ion source

2004 ◽  
Vol 75 (5) ◽  
pp. 1494-1496 ◽  
Author(s):  
L. Ma ◽  
M. T. Song ◽  
Z. M. Zhang ◽  
Y. Cao ◽  
X. Y. Chen
Keyword(s):  
Numerical Simulation ◽  
Ion Beam ◽  
Ion Source ◽  
Beam Transport ◽  
Ecr Ion Source

scholarly journals RF and Microwave Ion Sources Study at Institute of Modern Physics

Plasma ◽  
2021 ◽  
Vol 4 (2) ◽  
pp. 332-344
Author(s):  
Qian Y. Jin ◽  
Yu G. Liu ◽  
Yang Zhou ◽  
Qi Wu ◽  
Yao J. Zhai ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Ion Beam ◽  
Ion Beams ◽  
Ion Source ◽  
Negative Ion ◽  
Power Coupling ◽  
Beam Production ◽  
Planar Coil ◽  
Coil Antenna ◽  
Ridged Waveguide

Intense ion beam production is of high importance for various versatile applications from accelerator injectors to secondary ion mass spectrometry (SIMS). For these purposes, different types of ion beams are needed and, accordingly, the optimum plasma to produce the desired ion beams. RF-type plasma features a simple structure, high plasma density and low plasma temperature, which is essential for negative ion beam production. A very compact RF-type ion source using a planar coil antenna has been developed at IMP for negative molecular oxygen ion beam production. In terms of high-intensity positive ion beam production, 2.45 GHz microwave power-excited plasma has been widely used. At IMP, we developed a 2.45 GHz plasma source with both ridged waveguide and coaxial antenna coupling schemes, tested successfully with intense beam production. Thanks to the plasma built with an external planar coil antenna, high O2− production efficiency has been achieved, i.e., up to 43%. With 2.45 GHz microwave plasma, the ridged waveguide can support a higher power coupling of high efficiency that leads to the production of intense hydrogen beams up to 90 emA, whereas the coaxial antenna is less efficient in power coupling to plasma but can lead to attractive ion source compactness, with a reasonable beam extraction of several emA.

Sign in / Sign up

Export Citation Format

Share Document