Effect of hydrogen content on dielectric strength of the silicon nitride film deposited by ICP-CVD*

2021 ◽  
Vol 30 (4) ◽  
pp. 048103
Author(s):  
Yudong Zhang ◽  
Jiale Tang ◽  
Yongjie Hu ◽  
Jie Yuan ◽  
Lulu Guan ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Hydrogen Content ◽  
Dielectric Strength ◽  
Nitride Film ◽  
Silicon Nitride Film

Analysis of Hydrogen Content in Plasma Silicon Nitride Film

1980 ◽  
Vol 127 (8) ◽  
pp. 1853-1854 ◽  
Author(s):  
Takeo Yoshimi ◽  
Hideo Sakai ◽  
Keizo Tanaka
Keyword(s):  
Silicon Nitride ◽  
Hydrogen Content ◽  
Nitride Film ◽  
Silicon Nitride Film

Microbridge Testing of Thin Films Under Small Deformation

1999 ◽  
Vol 594 ◽  
Author(s):  
T. Y. Zhang ◽  
Y. J. Su ◽  
C. F. Qian ◽  
M. H. Zhao ◽  
L. Q. Chen
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Silicon Nitride ◽  
Young’S Modulus ◽  
Young's Modulus ◽  
Chemical Vapor ◽  
Small Deformation ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Pressure Chemical

AbstractThe present work proposes a novel microbridge testing method to simultaneously evaluate the Young's modulus, residual stress of thin films under small deformation. Theoretic analysis and finite element calculation are conducted on microbridge deformation to provide a closed formula of deflection versus load, considering both substrate deformation and residual stress in the film. Silicon nitride films fabricated by low pressure chemical vapor deposition on silicon substrates are tested to demonstrate the proposed method. The results show that the Young's modulus and residual stress for the annealed silicon nitride film are respectively 202 GPa and 334.9 MPa.

Investigation on the composition and structure of silicon nitride film prepared by ECR-PECVD

1994 ◽  
Vol 3 (9) ◽  
pp. 682-689 ◽  
Author(s):  
Chen Jun-fang ◽  
Cheng Shao-yu ◽  
Ren Zhao-xing ◽  
Zhang Su-qing ◽  
Ning Zhao-yuan ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Composition And Structure
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