scholarly journals Deuterium ion beam formation in a vacuum arc discharge system with a deuterated cathode

2019 ◽  
Vol 1393 ◽  
pp. 012050
Author(s):  
A G Nikolaev ◽  
V P Frolova ◽  
E M Oks ◽  
K P Savkin ◽  
M V Shandrikov ◽  
...  
Keyword(s):  
Arc Discharge ◽  
Ion Beam ◽  
Vacuum Arc ◽  
Discharge System ◽  
Beam Formation

Preparation and characterization of thin films of carbon nitride

1995 ◽  
Vol 53 ◽  
pp. 104-105
Author(s):  
L. Wan ◽  
R. F. Egerton
Keyword(s):  
Carbon Nitride ◽  
Arc Discharge ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Reactive Sputtering ◽  
Vacuum Arc ◽  
Specimen Preparation ◽  
Bonding Structure ◽  
Electron Energy Loss

INTRODUCTION Recently, a new compound carbon nitride (CNx) has captured the attention of materials scientists, resulting from the prediction of a metastable crystal structure β-C3N4. Calculations showed that the mechanical properties of β-C3N4 are close to those of diamond. Various methods, including high pressure synthesis, ion beam deposition, chemical vapor deposition, plasma enhanced evaporation, and reactive sputtering, have been used in an attempt to make this compound. In this paper, we present the results of electron energy loss spectroscopy (EELS) analysis of composition and bonding structure of CNX films deposited by two different methods.SPECIMEN PREPARATION Specimens were prepared by arc-discharge evaporation and reactive sputtering. The apparatus for evaporation is similar to the traditional setup of vacuum arc-discharge evaporation, but working in a 0.05 torr ambient of nitrogen or ammonia. A bias was applied between the carbon source and the substrate in order to generate more ions and electrons and change their energy. During deposition, this bias causes a secondary discharge between the source and the substrate.

Fabrication of graphene from graphite by a thermal assisted vacuum arc discharge system

2017 ◽  
Vol 104 ◽  
pp. 258-265 ◽  
Author(s):  
Guo-Wei Cheng ◽  
Kevin Chu ◽  
Jeng Shiung Chen ◽  
Jeff T.H. Tsai
Keyword(s):  
Arc Discharge ◽  
Vacuum Arc ◽  
Discharge System

scholarly journals Вольт-амперные характеристики начальной стадии дугового разряда в высоковольтном вакуумном диоде

2019 ◽  
Vol 45 (12) ◽  
pp. 33
Author(s):  
С.Г. Давыдов ◽  
А.Н. Долгов ◽  
А.В. Корнеев ◽  
Р.Х. Якубов
Keyword(s):  
Electron Beam ◽  
High Voltage ◽  
Arc Discharge ◽  
Ion Beam ◽  
Vacuum Diode ◽  
Vacuum Arc ◽  
Ion Acceleration ◽  
Plasma Cloud ◽  
Initial Stage ◽  
Instability Development

AbstractThe process of electron instability development and propagation of a cathode electron beam and anomalous ion beam, followed by outburst of current in the initial stage of arc discharge was observed in rarefied plasma cloud of high-voltage vacuum diode. These events are consistent with the model of anomalous ion acceleration in interelectrode plasma at the spark stage of vacuum arc discharge.

A mechanism of current noise reduction in systems of ion beam formation from vacuum arc plasma

2003 ◽  
Vol 29 (7) ◽  
pp. 572-574 ◽  
Author(s):  
V. A. Shklyaev ◽  
S. Ya. Belomyttsev ◽  
V. V. Ryzhov ◽  
I. Yu. Turchanovskii
Keyword(s):  
Noise Reduction ◽  
Ion Beam ◽  
Current Noise ◽  
Vacuum Arc ◽  
Arc Plasma ◽  
Beam Formation

scholarly journals Formation of catalytic and corrosion protective layers with use of ion beam assisted deposition of metals from vacuum arc discharge plasma

2021 ◽  
Vol 2064 (1) ◽  
pp. 012054
Author(s):  
V V Poplavsky ◽  
A V Dorozhko ◽  
V G Matys
Keyword(s):  
Discharge Plasma ◽  
Arc Discharge ◽  
Ion Beam ◽  
Substrate Surface ◽  
Ion Source ◽  
Vacuum Arc ◽  
Corrosion Properties ◽  
Ion Beam Assisted Deposition ◽  
Deposited Metal ◽  
Catalytically Active

Abstract This paper presents a brief overview of our studies on the modification of materials using ion beam assisted deposition (IBAD) of metals from vacuum arc discharge plasma in order to form catalytically active and corrosion-resistant layers on the surface. Deposition of metals on different materials with simultaneous mixing of the deposited layer with the substrate surface by accelerated ions of the deposited metal was carried out in an experimental setup with a pulsed electric arc ion source. Catalytic and corrosion properties of the materials with the obtained layers were studied using electrochemical voltammetric measurements. The microstructure and composition of the resulting layers were studied using the SEM, EDX, WD-XRF, XPS, EBSD, and RBS methods.

Defect Healing of Carbon Nanotubes by Rapid Vacuum Arc Annealing

2007 ◽  
Vol 1057 ◽  
Author(s):  
Jeff Tsung-Hui Tsai ◽  
Jason Li ◽  
Andy Tseng
Keyword(s):  
Carbon Nanotubes ◽  
Rapid Heating ◽  
Arc Discharge ◽  
Chemical Vapor ◽  
Vacuum Arc ◽  
Discharge System ◽  
Graphitic Structure ◽  
Defect Healing ◽  
Heating And Cooling ◽  
Multi Walled Carbon Nanotubes

ABSTRACTA rapid thermal annealing process is demonstrated for healing the defects in carbon nanotubes using a DC vacuum arc discharge system. Multi-walled carbon nanotubes (MWCNTs) grown by chemical vapor deposition at a relatively low temperature (∼650 °C) showed structural imperfections inside the tubes which are known as "bamboo-like" defects. These defects can be thermally annealed to reconstruct the graphitic structure. A vacuum arc discharge system was used to generate high temperatures (∼1800 °C) followed by rapid cooling. The MWCNTs can be rapidly annealed in such a system by several heating and cooling cycles. The annealed samples were characterized by Raman spectroscopy and transmission electron microscopy. The defects were found to be healed when the environment contained water vapor, indicating that oxygen may play an important role in breaking the imperfect graphitic structure and removing the weakly bonded defects during the rapid heating cycles. After breaking the “bamboo” segment, the graphene shell was then reconstructed during the cooling process to produce multi-shell perfection. This method produces effective defect healing and bamboo structure removal from MWCNTs.

Very Broad Metal Ion Beam Source for Ion Implantation and Coating Deposition Technologies

2014 ◽  
Vol 880 ◽  
pp. 288-291
Author(s):  
Igor Stepanov ◽  
Alexander Ryabchikov ◽  
Denis Sivin
Keyword(s):  
Magnetic Field ◽  
Field Strength ◽  
Magnetic Field Strength ◽  
Metal Ion ◽  
Cathode Surface ◽  
Arc Discharge ◽  
Ion Beam ◽  
Vacuum Arc ◽  
Arc Plasma ◽  
Ion Emission

The paper describes high broad metal ion source based on dc macroparticle filtered vacuum arc plasma generation with the dc ion-beam extraction. The possibility of formation of pseudo ribbon beam of metal ions with the parameters: ion beam length 0.6 m, ion current up to 0.2 A, accelerating voltage 40 kV, and ion energy up to 160 kV has been demonstrated. The pseudo ribbon ion beam is formed from dc driven vacuum arc plasma. The results of investigation of the vacuum arc evaporator ion-emission properties are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ion-emission properties of vacuum-arc discharge for different cathode materials are determined. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 Gs on the cathode surface.

scholarly journals Generation of a Metal Ion Beam Using a Vacuum Magnetron Discharge

Plasma ◽  
2021 ◽  
Vol 4 (2) ◽  
pp. 222-229
Author(s):  
Alexey V. Vizir ◽  
Efim M. Oks ◽  
Maxim V. Shandrikov ◽  
Georgy Yu. Yushkov
Keyword(s):  
Metal Ion ◽  
Arc Discharge ◽  
Ion Beam ◽  
Target Material ◽  
Ion Source ◽  
Vacuum Arc ◽  
Residual Pressure ◽  
Collector Current ◽  
Magnetron Discharge ◽  
Singly Charged

We have designed, fabricated and characterized an ion source based on a vacuum magnetron discharge. The magnetron discharge is initiated by a vacuum arc discharge, the plasma of which flows onto the magnetron sputtering target working surface. The vacuum arc material is usually the same as that of the magnetron target. The discharges operate at a residual pressure of 3 × 10−6 Torr without working gas feed. Pulses of vacuum arc (30 μs) and magnetron discharge (up to 300 μs) are applied simultaneously. After ignition by the vacuum arc, the magnetron discharge runs in a self-sustained mode. Cu–Cu, Ag–Ag, Zn–Zn, and Pb–Pb pairs of magnetron target material and vacuum arc cathode material were tested, as well as mixed pairs; for example, Cu vacuum arc cathode and Pb magnetron target. An ion beam was extracted from the discharge plasma by applying an accelerating voltage of up to 20 kV between the plasma expander and grounded electrodes. The ion beam collector current reached 80 mA. The ion beam composition, analyzed by a time-of-flight spectrometer, shows that the beam consists mainly of singly-charged (about 90%) and doubly-charged (about 10% current fraction) magnetron target material ions. The ion beam radial current density non-uniformity was as low as ±5% over a diameter of 6.6 cm, which is the diameter of the source output aperture.

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