Investigation of defects in structures based on BP/Si heterojunction
2021 ◽
Vol 2103
(1)
◽
pp. 012088
Keyword(s):
Abstract In this work the properties of the BP/Si heterojunction interface were investigated by capacitance methods, the deep levels transient spectroscopy method and admittance spectroscopy. Admittance spectroscopy did not detect any defects, but the deep level transient spectroscopy showed response with activation energy of 0.33 eV and capture cross-section σn=(1-10)·10-19 cm2 and defect concentration (NT) is in the order of 1013 cm-3. This defect level is a trap for electron with position of 0.33 eV below the conduction band in region near the BP/Si interface.
2021 ◽
Vol 21
(3)
◽
pp. 1904-1908
2017 ◽
Vol 897
◽
pp. 279-282
◽
2010 ◽
Vol 645-648
◽
pp. 499-502
◽
Keyword(s):
2013 ◽
Vol 740-742
◽
pp. 377-380
◽