Fabrication of (ZnO)x: (Cu)1-x/PSi Solar Cell Using Laser Induced Plasma Technique

Fabrication of PSi is generated successfully depending upon photo-electrochemical etching process. The purpose is to differentiate the characterization of the PSi monolayer based on c-silicon solar cell compared to the bulk silicon alone. The surface of ordinary p-n solar cell has been reconstructed on the n-type region of (100) orientation with resistivity (3.2.cm) in hydrofluoric (HF) acid at a concentration of 2 ml was used to in order to enhance the conversion efficiency with 10-minute etching time and current density of 50 mA/cm2, The morphological properties (AFM) as well as the electrical properties have been investigated (J-V). The atomic force microscopy investigation reveals a rugged silicon surface with porous structure nucleating during the etching process (etching time), resulting in an expansion in depth and an average diameter of (40.1 nm). As a result, the surface roughness increases. The electrical properties of prepared PS, namely current density-voltage characteristics in the dark, reveal that porous silicon has a sponge-like structure and that the pore diameter increases with increasing etching current density and the number of shots increasing this led that the solar cell efficiency was in the range of (1-2%), resulting in improved solar cell performance.