Role of Layer Thickness and Field-Effect Mobility on Photoresponsivity of Indium Selenide (InSe) Based Phototransistors
Abstract Understanding and optimizing the properties of photoactive two-dimensional (2D) Van der Waals solids is crucial for developing optoelectronics applications. The main goal of this work is to present a detailed investigation of layer dependent photoconductive behavior of InSe based field-effect transistors (FETs). InSe based FETs with five different channel thicknesses (t, 20nm < t < 100nm) were investigated with a continuous laser source of λ = 658 nm (1.88 eV) over a wide range of illumination power (P) of 22.8 nW < P < 1.29 μW. All the devices studied showed signatures of photogating; however, our investigations suggest that the photoresponsivities are strongly dependent on the thickness of the conductive channel. A correlation between the field-effect mobility (µFE) values (as a function of channel thickness, t) and photoresponsivity (R) indicates that in general R increases with increasing µFE (decreasing t) and vice versa. Maximum responsivities of ∼ 7.84 A/W and ∼ 0.59 A/W were obtained the devices with t = 20nm and t = 100nm, respectively. These values could substantially increase under the application of a gate voltage. The structure-property correlation-based studies presented here indicate the possibility of tuning the optical properties of InSe based photo-FETs for a variety of applications related to photodetector and/or active layers in solar cells.