Optical properties of "diamondlike" carbon films: An ellipsometric study

1983 ◽  
Vol 28 (12) ◽  
pp. 7229-7235 ◽  
Author(s):  
A. Azim Khan ◽  
David Mathine ◽  
John A. Woollam ◽  
Y. Chung
Keyword(s):  
Optical Properties ◽  
Carbon Films ◽  
Diamondlike Carbon ◽  
Ellipsometric Study

Spectroscopic ellipsometric study of tetrahedral amorphous carbon films: optical properties and modelling

2001 ◽  
Vol 10 (3-7) ◽  
pp. 1132-1136 ◽  
Author(s):  
A. Canillas ◽  
M.C. Polo ◽  
J.L. Andújar ◽  
J. Sancho ◽  
S. Bosch ◽  
...  
Keyword(s):  
Optical Properties ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Amorphous Carbon Films ◽  
Tetrahedral Amorphous Carbon ◽  
Ellipsometric Study

Using Molecular-Beam Mass Spectrometry to Study the Pecvd of Diamondlike Carbon Films

1993 ◽  
Vol 334 ◽  
Author(s):  
I.B. Graff ◽  
R.A. Pugliese ◽  
P.R. Westmoreland
Keyword(s):  
Mass Spectrometry ◽  
Vapor Deposition ◽  
Molecular Beam ◽  
Film Growth ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Total Flow ◽  
Measured Concentration ◽  
Molecular Beam Mass Spectrometry ◽  
Diamondlike Carbon

AbstractMolecular-beam mass spectrometry has been used to study plasma-enhanced chemical vapor deposition (PECVD) of diamondlike carbon films. A threshold-ionization technique was used to identify and quantify species in the plasma. Mole fractions of H, H2, CH4, C2H2, C2H6 and Ar were measured in an 83.3% CH4/Ar mixture at a pressure of 0.1 torr and a total flow of 30 sccm. Comparisons were made between mole fractions measured at plasma powers of 25W and 50W. These results were compared to measured concentration profiles and to film growth rates.

Influence of RF PACVD process parameters of diamond-like carbon films on optical properties and nano-hardness of the films

2008 ◽  
Vol 17 (7-10) ◽  
pp. 1655-1659 ◽  
Author(s):  
M. Smietana ◽  
J. Szmidt ◽  
M.L. Korwin-Pawlowski ◽  
N. Miller ◽  
A.A. Elmustafa
Keyword(s):  
Optical Properties ◽  
Process Parameters ◽  
Carbon Films ◽  
Diamond Like Carbon

THE OPTICAL PROPERTIES OF NITROGENATED AMORPHOUS CARBON FILMS GROWN BY A NOVEL SURFACE WAVE MICROWAVE PLASMA CVD METHOD

2004 ◽  
Vol 18 (18) ◽  
pp. 987-1001 ◽  
Author(s):  
M. RUSOP ◽  
S. ADHIKARI ◽  
A. M. M. OMER ◽  
S. ADHIKARY ◽  
H. UCHIDA ◽  
...  
Keyword(s):  
Optical Properties ◽  
Surface Wave ◽  
Amorphous Carbon ◽  
Annealing Temperature ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Cvd Method ◽  
Wide Range ◽  
Bonding Properties

The effects of annealing temperature on the optical properties of nitrogenated amorphous carbon (a-C:N) films grown on quartz substrates by a novel surface wave microwave plasma chemical vapor deposition (SWMP-CVD) method are reported. The thickness, optical, structural and bonding properties of the as-grown and anneal-treated a-C:N films were measured and compared. The film thickness decreased rapidly with increasing annealing temperature above 350°C. A wide range of optical absorption characteristics is observed, depending on the annealing temperature. The optical band gap of as-grown a-C:N films is approximately 2.8 eV, gradually decreasing to 2.5 eV for the films anneal-treated at 300°C, and beyond that decreasing rapidly down to 0.9 eV at 500°C. The Raman and FTIR spectroscopy measurements have shown that the structural and composition of the films can be tuned by optimizing the annealing temperature. The change of optical, structural and bonding properties of SWMP-CVD-grown a-C:N films with higher annealing temperature was attributed to the fundamental changes in the bonding and band structures of the films.

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