High density 3D integration using CMOS foundry technologies for 28 nm node and beyond

Author(s):  
J.C. Lin ◽  
W.C. Chiou ◽  
K.F Yang ◽  
H.B. Chang ◽  
Y.C. Lin ◽  
...  
Keyword(s):  
2012 ◽  
Vol 2012 (1) ◽  
pp. 000018-000022
Author(s):  
S.Q. Gu ◽  
D.W. King ◽  
V. Ramachandran ◽  
B. Henderson ◽  
U. Ray ◽  
...  

Wide IO memory has higher IO–count (up to 16×) than typical low power DDR memory, which could enable higher system bandwidth at low power. Wide IO DRAM can be stacked as Micro Pillar Grid Array (MPGA) cubes [1], which will provide high memory density for the system. With the high number (∼1200) of connections to the MPGA, a direct face to back stack (3D) to logic chip with high density TSV is the most efficient approach. To utilize the extra large bandwidth, the logic chip containing high speed processors requires logic chip fabrication in advanced node devices. In this paper, we report the–demonstration of a 2-memory chip JEDEC standard wide IO MPGA stacking on logic chip through a fabless supplier chain. A successful integration of via middle through Si via (TSV) to 28 nm logic process has been demonstrated with minimum impact to logic devices. The final package showed good TSV and ubump integrity. The wide IO memory is functional post stacking. In addition, the early reliability data for TSV and ubump showed no detrimental impact through temperature cycle and high temperature storage.


Author(s):  
Akihiro Horibe ◽  
Kuniaki Sueoka ◽  
Katsuyuki Sakuma ◽  
Sayuri Kohara ◽  
Keiji Matsumoto ◽  
...  
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2016 ◽  
Vol 37 (1) ◽  
pp. 81-83 ◽  
Author(s):  
Kangwook Lee ◽  
Jichel Bea ◽  
Takafumi Fukushima ◽  
Suresh Ramalingam ◽  
Xin Wu ◽  
...  

2015 ◽  
Vol 62 (1) ◽  
pp. 121-127 ◽  
Author(s):  
Woan Yun Hsiao ◽  
Ping Chun Peng ◽  
Tzong-Sheng Chang ◽  
Yu-Der Chih ◽  
Wu-Chin Tsai ◽  
...  
Keyword(s):  

2014 ◽  
Vol 2014 (DPC) ◽  
pp. 001208-001237
Author(s):  
Catherine Bunel ◽  
Florent Lallemand

TSV is one of the key technologies for 3D integration . TSVs co-integrated with passives including high density capacitors enable highly integrated heterogeneous solutions required because of the smaller size of the electronic modules . Even if there is still a lot to do , significant progress has already been done on the process , on the testability , on the performances of these smart interposers .The major progress is in the adoption of the technology .In this paper we'll expose some examples where the adoption was driven by cost, performances & miniaturization. Emphasis will be placed on the performances of the new generation of 3D Silicon capacitors, using key enabling technology like ALD and amazing architecture that allow impressive capacitance density increase.


Author(s):  
Alberto Annovi ◽  
Giovanni Calderini ◽  
Francesco Crescioli ◽  
Francesco De Canio ◽  
Luca Frontini ◽  
...  

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