Automatic dose optimization system for resist cross-sectional profile in a electron beam lithography
Automatic Dose Optimization System for Resist Cross-Sectional Profile in a Electron Beam Lithography
2000 ◽
Vol 39
(Part 1, No. 12B)
◽
pp. 6831-6835
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1977 ◽
Vol 35
◽
pp. 136-137
1973 ◽
Vol 15
(5)
◽
pp. 351-356
Keyword(s):
1970 ◽
Vol 12
(2)
◽
pp. 130-134
◽
1972 ◽
Vol 52
(1)
◽
pp. 105-116
◽
2014 ◽
pp. 187-187