scholarly journals Trading off Cache Capacity for Reliability to Enable Low Voltage Operation

Author(s):  
Chris Wilkerson ◽  
Hongliang Gao ◽  
Alaa R. Alameldeen ◽  
Zeshan Chishti ◽  
Muhammad Khellah ◽  
...  
2008 ◽  
Vol 36 (3) ◽  
pp. 203-214 ◽  
Author(s):  
Chris Wilkerson ◽  
Hongliang Gao ◽  
Alaa R. Alameldeen ◽  
Zeshan Chishti ◽  
Muhammad Khellah ◽  
...  

IEEE Micro ◽  
2009 ◽  
Vol 29 (1) ◽  
pp. 96-103 ◽  
Author(s):  
Chris Wilkerson ◽  
Hongliang Gao ◽  
Alaa R. Alameldeen ◽  
Zeshan Chishti ◽  
Muhammad Khellah ◽  
...  

Author(s):  
Klaus-Ruediger Peters

A new generation of high performance field emission scanning electron microscopes (FSEM) is now commercially available (JEOL 890, Hitachi S 900, ISI OS 130-F) characterized by an "in lens" position of the specimen where probe diameters are reduced and signal collection improved. Additionally, low voltage operation is extended to 1 kV. Compared to the first generation of FSEM (JE0L JSM 30, Hitachi S 800), which utilized a specimen position below the final lens, specimen size had to be reduced but useful magnification could be impressively increased in both low (1-4 kV) and high (5-40 kV) voltage operation, i.e. from 50,000 to 200,000 and 250,000 to 1,000,000 x respectively.At high accelerating voltage and magnification, contrasts on biological specimens are well characterized1 and are produced by the entering probe electrons in the outmost surface layer within -vl nm depth. Backscattered electrons produce only a background signal. Under these conditions (FIG. 1) image quality is similar to conventional TEM (FIG. 2) and only limited at magnifications >1,000,000 x by probe size (0.5 nm) or non-localization effects (%0.5 nm).


Author(s):  
Arthur V. Jones

With the introduction of field-emission sources and “immersion-type” objective lenses, the resolution obtainable with modern scanning electron microscopes is approaching that obtainable in STEM and TEM-but only with specific types of specimens. Bulk specimens still suffer from the restrictions imposed by internal scattering and the need to be conducting. Advances in coating techniques have largely overcome these problems but for a sizeable body of specimens, the restrictions imposed by coating are unacceptable.For such specimens, low voltage operation, with its low beam penetration and freedom from charging artifacts, is the method of choice.Unfortunately the technical dificulties in producing an electron beam sufficiently small and of sufficient intensity are considerably greater at low beam energies — so much so that a radical reevaluation of convential design concepts is needed.The probe diameter is usually given by


2003 ◽  
Author(s):  
Toshihide Kamata ◽  
Manabu Yoshida ◽  
Sei Uemura ◽  
Satoshi Hoshino ◽  
Noriyuki Takada ◽  
...  

Author(s):  
H. Kuriyama ◽  
Y. Ishigaki ◽  
Y. Fujii ◽  
S. Maegawa ◽  
S. Maeda ◽  
...  

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