Hypertrophic cell treatment for apoptosis incucement by remote plasma

2010 ◽  
Author(s):  
Dae Hoon Lee ◽  
Young-Hoon Song ◽  
Hyun Hyang Park ◽  
Seung. S. Lee
Keyword(s):  
Remote Plasma ◽  
Hypertrophic Cell

GaN heteroepitaxy by remote plasma MOCVD : Real time monitoring by laser reflectance interferometry

2001 ◽  
Vol 11 (PR3) ◽  
pp. Pr3-1175-Pr3-1182 ◽  
Author(s):  
M. Losurdo ◽  
A. Grimaldi ◽  
M. Giangregorio ◽  
P. Capezzuto ◽  
G. Bruno
Keyword(s):  
Real Time ◽  
Real Time Monitoring ◽  
Remote Plasma ◽  
Laser Reflectance

scholarly journals Low temperature silicon oxide deposition on polymer powders in a fluidized bed coupled to a cold remote plasma

2012 ◽  
Vol 206 (23) ◽  
pp. 4814-4821 ◽  
Author(s):  
H. Caquineau ◽  
L. Aiche ◽  
H. Vergnes ◽  
B. Despax ◽  
B. Caussat
Keyword(s):  
Low Temperature ◽  
Fluidized Bed ◽  
Silicon Oxide ◽  
Remote Plasma ◽  
Oxide Deposition ◽  
Polymer Powders

Effects of N[sub 2] RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO[sub 2] Films

2006 ◽  
Vol 9 (3) ◽  
pp. F13 ◽  
Author(s):  
Jihoon Choi ◽  
Seokhoon Kim ◽  
Hyunseok Kang ◽  
Hyeongtag Jeon ◽  
Choelhwyi Bae
Keyword(s):  
Atomic Layer ◽  
Electrical Characteristics ◽  
Remote Plasma

Temperature dependence of the etch rate and selectivity of silicon nitride over silicon dioxide in remote plasma NF3/Cl2

1995 ◽  
Vol 67 (13) ◽  
pp. 1902-1904 ◽  
Author(s):  
J. Staffa ◽  
D. Hwang ◽  
B. Luther ◽  
J. Ruzyllo ◽  
R. Grant
Keyword(s):  
Silicon Nitride ◽  
Silicon Dioxide ◽  
Temperature Dependence ◽  
Etch Rate ◽  
Remote Plasma

Enhancement and stabilization of porous silicon photoluminescence by oxygen incorporation with a remote‐plasma treatment

1993 ◽  
Vol 62 (10) ◽  
pp. 1152-1154 ◽  
Author(s):  
Y. Xiao ◽  
M. J. Heben ◽  
J. M. McCullough ◽  
Y. S. Tsuo ◽  
J. I. Pankove ◽  
...  
Keyword(s):  
Porous Silicon ◽  
Plasma Treatment ◽  
Remote Plasma ◽  
Oxygen Incorporation
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