Comparison of Radio Frequency and Microwave Plasma Treatments on LED Chip Bond Pad for Wire Bond Application

Author(s):  
Hui Yuen Peng ◽  
Mutharasu Devarajan ◽  
Teik Toon Lee ◽  
David Lacey
Author(s):  
V. V. Azharonok ◽  
I. I. Filatova ◽  
A. P. Dostanko ◽  
S. V. Bordusov ◽  
Yu. S. Shynkevich

2015 ◽  
Vol 27 (4) ◽  
pp. 129-136 ◽  
Author(s):  
Hui Yuen Peng ◽  
Mutharasu Devarajan ◽  
Teik Toon Lee ◽  
David Lacey

Purpose – The purpose of this paper is to investigate the efficiencies of argon (Ar), oxygen (O2) and O2 followed by Ar (O2→Ar) plasma treatments in terms of contaminant removal and wire bond interfacial adhesion improvement. The aim of this study is to resolve the “lifted ball bond” issue, which is one of the critical reliability checkpoints for light emitting diodes (LEDs) in automotive applications. Design/methodology/approach – Ar, O2 and O2→Ar plasma treatments were applied to LED chip bond pad prior to wire bonding process with different treatment durations. Various surface characterization methods and contact angle measurement were then used to characterize the surface properties of these chip bond pads. To validate the improvements of Ar, O2 and O2→Ar plasma treatments to the wire bond interfacial adhesion, the chip bond pads were wire bonded and examined with a ball shear test. Moreover, the contact resistance of the wire bond interfaces was also measured by using four-point probe electrical measurements to complement the interfacial adhesion validation. Findings – Surface characterization results show that O2→Ar plasma treatment was able to remove the contaminant while maintaining relatively low oxygen impurity content on the bond pad surface after the treatment and was more effective as compared with the O2 and Ar plasma treatments. However, O2→Ar plasma treatment also simultaneously reduced high-polarity bonds on the chip bond pad, leading to a lower surface free energy than that with the O2 plasma treatment. Ball shear test and contact resistance results showed that wire bond interfacial adhesion improvement after the O2→Ar plasma treatment is lower than that with the O2 plasma treatment, although it has the highest efficiency in surface contaminant removal. Originality/value – To resolve “lifted ball bond” issue, optimization of plasma gas composition ratios and parameters for respective Ar and O2 plasma treatments has been widely reported in many literatures; however, the O2→Ar plasma treatment is still rarely focused. Moreover, the observation that wire bond interfacial adhesion improvement after O2→Ar plasma treatment is lower than that with the O2 plasma treatment although it has the highest efficiency in surface contaminant removal also has not been reported on similar studies elsewhere.


2008 ◽  
Vol 4 (6) ◽  
pp. 1953-1962 ◽  
Author(s):  
M.A. Lopez-Heredia ◽  
G. Legeay ◽  
C. Gaillard ◽  
P. Layrolle

Materials ◽  
2017 ◽  
Vol 10 (11) ◽  
pp. 1223 ◽  
Author(s):  
Wan-Ching Chou ◽  
Rex Wang ◽  
Cheng Liu ◽  
Chyun-Yu Yang ◽  
Tzer-Min Lee

2010 ◽  
Vol 24 (15n16) ◽  
pp. 2688-2693
Author(s):  
JONG-HYOUNG KIM ◽  
ISAMI NITTA ◽  
NORITSUGU UMEHARA ◽  
HIROYUKI KOUSAKA ◽  
MAMORU SHIMADA ◽  
...  

The adhesion force between a chloride-isobutene-isoprene rubber (CIIR) and stainless steel ball was studied. To decrease the adhesion force, the CIIR rubber was treated with high-density microwave plasma employing oxygen and argon gases. The experimental results showed that the adhesion force decreases with increasing the time of oxygen and argon plasma treatments. In addition, the contact microscope measurements revealed different surface structure with two gases. The real contact area also decreased with treatment time and dramatic changes were observed after 5 min treatment of CIIR rubber. The field emission scanning electron microscope image also showed that the subsurface of CIIR rubber pattern has changed with various plasma treatments. These results imply change in the morphology of CIIR rubber surface by plasma treatment is one reason for the decrease in adhesion forces.


1990 ◽  
Author(s):  
Juergen Otto ◽  
Volker Paquet ◽  
Ralf T. Kersten ◽  
Heinz-Werner Etzkorn ◽  
Raymond M. Brusasco ◽  
...  

2017 ◽  
Vol 325 ◽  
pp. 299-307 ◽  
Author(s):  
Emmanuel J. Ekoi ◽  
Charlie Stallard ◽  
Ian Reid ◽  
Denis P. Dowling

1998 ◽  
Vol 544 ◽  
Author(s):  
R. Wilken ◽  
A. Hollander ◽  
J. Behnisch

AbstractThe flux of vacuum ultraviolet (VUV) and ultraviolet (UV) photons from a hydrogen plasma was detected by fluorescence measurements of sodium salicylate sheets with and without a MgF2 window. In order to expose the samples to the same photon flux in all experiments, the power input to the microwave plasma source was adjusted. Polyethylene (PE), polypropylene (PP), and polystyrene (PS) were treated with VUV radiation or with a remote hydrogen plasma. The mass loss and the CH-absorption loss were recorded by in situ quartz crystal micro balance and by in situ IR reflection absorption spectroscopy, respectively. The VUV irradiation and plasma treatment caused similar effects in the case of PE, PP showed an increased polymer ablation in plasma treatments, and for PS a negligible loss in mass and CH absorption was detected in plasma and VUV treatments.


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