Continuous and Precise Work Function Adjustment for Integratable Dual Metal Gate CMOS Technology Using Hf–Mo Binary Alloys

2005 ◽  
Vol 52 (6) ◽  
pp. 1172-1179 ◽  
Author(s):  
T.-L. Li ◽  
C.-H. Hu ◽  
W.-L. Ho ◽  
H.C.-H. Wang ◽  
C.-Y. Chang
Keyword(s):  
Work Function ◽  
Binary Alloys ◽  
Cmos Technology ◽  
Metal Gate ◽  
Dual Metal

Work function and thermal stability of Ti1−xAlxNy for dual metal gate electrodes

2002 ◽  
Vol 81 (22) ◽  
pp. 4192-4194 ◽  
Author(s):  
Tae-Ho Cha ◽  
Dae-Gyu Park ◽  
Tae-Kyun Kim ◽  
Se-Aug Jang ◽  
In-Seok Yeo ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Work Function ◽  
Metal Gate Electrodes ◽  
Metal Gate ◽  
Gate Electrodes ◽  
Dual Metal ◽  
Thermal Stability Of

A dual-metal gate CMOS technology using nitrogen-concentration-controlled TiNx film

2001 ◽  
Vol 48 (10) ◽  
pp. 2363-2369 ◽  
Author(s):  
H. Wakabayashi ◽  
Y. Saito ◽  
K. Takeuchi ◽  
T. Mogami ◽  
T. Kunio
Keyword(s):  
Nitrogen Concentration ◽  
Cmos Technology ◽  
Metal Gate ◽  
Dual Metal

Dual work function metal gate CMOS technology using metal interdiffusion

2001 ◽  
Vol 22 (9) ◽  
pp. 444-446 ◽  
Author(s):  
I. Polishchuk ◽  
P. Ranade ◽  
Tsu-Jae King ◽  
Chenming Hu
Keyword(s):  
Work Function ◽  
Cmos Technology ◽  
Metal Gate

Tungsten work function engineering for dual metal gate nano-CMOS

2005 ◽  
Vol 16 (7) ◽  
pp. 433-436 ◽  
Author(s):  
J. K. Efavi ◽  
T. Mollenhauer ◽  
T. Wahlbrink ◽  
H. D. B. Gottlob ◽  
M. C. Lemme ◽  
...  
Keyword(s):  
Work Function ◽  
Metal Gate ◽  
Dual Metal

Dual-Metal-Gate Transistors with Symmetrical Threshold Voltages Using Work-Function-Tuned Ta/Mo Bilayer Metal Gates

2008 ◽  
Vol 47 (4) ◽  
pp. 2428-2432 ◽  
Author(s):  
Takashi Matsukawa ◽  
Yongxun Liu ◽  
Kazuhiko Endo ◽  
Meishoku Masahara ◽  
Yuki Ishikawa ◽  
...  
Keyword(s):  
Work Function ◽  
Metal Gate ◽  
Metal Gates ◽  
Threshold Voltages ◽  
Dual Metal

Dual Metal Gate MOSFETs with Symmetrical Threshold Voltages Using Work Function Tuned Ta/Mo Bi-layer Metal Gates

2007 ◽  
Author(s):  
T. Matsukawa ◽  
Y. X. Liu ◽  
K. Endo ◽  
M. Masahara ◽  
Y. Ishikawa ◽  
...  
Keyword(s):  
Work Function ◽  
Metal Gate ◽  
Metal Gates ◽  
Threshold Voltages ◽  
Dual Metal
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