Solving Nongray Boltzmann Transport Equation in Gallium Nitride

2017 ◽  
Vol 139 (10) ◽  
Author(s):  
Ajit K. Vallabhaneni ◽  
Liang Chen ◽  
Man P. Gupta ◽  
Satish Kumar

Several studies have validated that diffusive Fourier model is inadequate to model thermal transport at submicron length scales. Hence, Boltzmann transport equation (BTE) is being utilized to improve thermal predictions in electronic devices, where ballistic effects dominate. In this work, we investigated the steady-state thermal transport in a gallium nitride (GaN) film using the BTE. The phonon properties of GaN for BTE simulations are calculated from first principles—density functional theory (DFT). Despite parallelization, solving the BTE is quite expensive and requires significant computational resources. Here, we propose two methods to accelerate the process of solving the BTE without significant loss of accuracy in temperature prediction. The first one is to use the Fourier model away from the hot-spot in the device where ballistic effects can be neglected and then couple it with a BTE model for the region close to hot-spot. The second method is to accelerate the BTE model itself by using an adaptive model which is faster to solve as BTE for phonon modes with low Knudsen number is replaced with a Fourier like equation. Both these methods involve choosing a cutoff parameter based on the phonon mean free path (mfp). For a GaN-based device considered in the present work, the first method decreases the computational time by about 70%, whereas the adaptive method reduces it by 60% compared to the case where full BTE is solved across the entire domain. Using both the methods together reduces the overall computational time by more than 85%. The methods proposed here are general and can be used for any material. These approaches are quite valuable for multiscale thermal modeling in solving device level problems at a faster pace without a significant loss of accuracy.

Author(s):  
Keivan Etessam-Yazdani ◽  
Sadegh M. Sadeghipour ◽  
Mehdi Asheghi

The performance and reliability of sub-micron semiconductor transistors demands accurate modeling of electron and phonon transport at nanoscales. The continued downscaling of the critical dimensions, introduces hotspots, inside transistors, with dimensions much smaller than phonon mean free path. This phenomenon, known as localized heating effect, results in a relatively high temperature at the hotspot that cannot be predicted using heat diffusion equation. While the contribution of the localized heating effect to the total device thermal resistance is significant during the normal operation of transistors, it has even greater implications for the thermoelectrical behavior of the device during an electrostatic discharge (ESD) event. The Boltzmann transport equation (BTE) can be used to capture the ballistic phonon transport in the vicinity of a hot spot but many of the existing solutions are limited to the one-dimensional and simple geometry configurations. We report our initial progress in solving the two dimensional Boltzmann transport equation for a hot spot in an infinite media (silicon) with constant temperature boundary condition and uniform heat generation configuration.


2012 ◽  
Vol 134 (8) ◽  
Author(s):  
Chunjian Ni ◽  
Jayathi Y. Murthy

A sub-micron thermal transport model based on the phonon Boltzmann transport equation (BTE) is developed using anisotropic relaxation times. A previously-published model, the full-scattering model, developed by Wang, directly computes three-phonon scattering interactions by enforcing energy and momentum conservation. However, it is computationally very expensive because it requires the evaluation of millions of scattering interactions during the iterative numerical solution procedure. The anisotropic relaxation time model employs a single-mode relaxation time, but the relaxation time is derived from detailed consideration of three-phonon interactions satisfying conservation rules, and is a function of wave vector. The resulting model is significantly less expensive than the full-scattering model, but incorporates directional and dispersion behavior. A critical issue in the model development is the role of three-phonon normal (N) scattering processes. Following Callaway, the overall relaxation rate is modified to include the shift in the phonon distribution function due to N processes. The relaxation times so obtained are compared with the data extracted from equilibrium molecular dynamics simulations by Henry and Chen. The anisotropic relaxation time phonon BTE model is validated by comparing the predicted thermal conductivities of bulk silicon and silicon thin films with experimental measurements. The model is then used for simulating thermal transport in a silicon metal-oxide-semiconductor field effect transistor (MOSFET) and leads to results close to the full-scattering model, but uses much less computation time.


Author(s):  
Syed A. Ali ◽  
Gautham Kollu ◽  
Sandip Mazumder ◽  
P. Sadayappan

Non-equilibrium heat conduction, as occurring in modern-day sub-micron semiconductor devices, can be predicted effectively using the Boltzmann Transport Equation (BTE) for phonons. In this article, strategies and algorithms for large-scale parallel computation of the phonon BTE are presented. An unstructured finite volume method for spatial discretization is coupled with the control angle discrete ordinates method for angular discretization. The single-time relaxation approximation is used to treat phonon-phonon scattering. Both dispersion and polarization of the phonons are accounted for. Three different parallelization strategies are explored: (a) band-based, (b) direction-based, and (c) hybrid band/cell-based. Subsequent to validation studies in which silicon thin-film thermal conductivity was successfully predicted, transient simulations of non-equilibrium thermal transport were conducted in a three-dimensional device-like silicon structure, discretized using 604,054 tetrahedral cells. The angular space was discretized using 400 angles, and the spectral space was discretized into 40 spectral intervals (bands). This resulted in ∼9.7×109 unknowns, which are approximately 3 orders of magnitude larger than previously reported computations in this area. Studies showed that direction-based and hybrid band/cell-based parallelization strategies resulted in similar total computational time. However, the parallel efficiency of the hybrid band/cell-based strategy — about 88% — was found to be superior to that of the direction-based strategy, and is recommended as the preferred strategy for even larger scale computations.


2015 ◽  
Vol 137 (1) ◽  
Author(s):  
James M. Loy ◽  
Sanjay R. Mathur ◽  
Jayathi Y. Murthy

Sequential numerical solution methods are commonly used for solving the phonon Boltzmann transport equation (BTE) because of simplicity of implementation and low storage requirements. However, they exhibit poor convergence for low Knudsen numbers. This is because sequential solution procedures couple the phonon BTEs in physical space efficiently but the coupling is inefficient in wave vector (K) space. As the Knudsen number decreases, coupling in K space becomes dominant and convergence rates fall. Since materials like silicon have K-resolved Knudsen numbers that span two to five orders of magnitude at room temperature, diffuse-limit solutions are not feasible for all K vectors. Consequently, nongray solutions of the BTE experience extremely slow convergence. In this paper, we develop a coupled-ordinates method for numerically solving the phonon BTE in the relaxation time approximation. Here, interequation coupling is treated implicitly through a point-coupled direct solution of the K-resolved BTEs at each control volume. This implicit solution is used as a relaxation sweep in a geometric multigrid method which promotes coupling in physical space. The solution procedure is benchmarked against a traditional sequential solution procedure for thermal transport in silicon. Significant acceleration in computational time, between 10 and 300 times, over the sequential procedure is found for heat conduction problems.


Author(s):  
Nitish Kumar ◽  
Matthew Barry ◽  
Satish Kumar

Abstract Phonon transport  in β-Ga2O3 thin films and metal–oxide field effect transistors (MESFETs) are investigated using non-gray Boltzmann transport equations (BTE) to decipher the effect of  ballistic-diffusive phonon transport. The effects of domain size, and  energy dissipation to various phonon modes and subsequent phonon-phonon energy exchange on the thermal transport and temperature distribution is investigated using non-gray BTE. Our analysis deciphered that domain size plays a major role in thermal transport in β-Ga2O3 but energy dissipation to various phonon modes and subsequent phonon-phonon energy exchange does not affect the temperature field significantly.   Phonon transport in β-Ga2O3 MESFETs on diamond substrate is investigated using coupled non-gray BTE and Fourier model. It is established that the ballistic effects need to be considered for devices with β-Ga2O3 layer thickness less than 1 µm. A non-gray phonon BTE model should be used near hotspot in the thin β-Ga2O3 layer as the Fourier model may not give accurate temperature distribution. The results from this work will help in understanding the mechanism of phonon transport in the β-Ga2O3 thin films and energy efficient design of its FETs.


2013 ◽  
Vol 24 (09) ◽  
pp. 1350064 ◽  
Author(s):  
R. S. SAMIAN ◽  
A. ABBASSI ◽  
J. GHAZANFARIAN

The thermal performance of two-dimensional (2D) field-effect transistors (FET) is investigated frequently by solving the Fourier heat diffusion law and the Boltzmann transport equation (BTE). With the introduction of the new generation of 3D FETs in which their thickness is less than the phonon mean-free-path it is necessary to carefully simulate the thermal performance of such devices. This paper numerically integrates the BTE in common 2D transistors including planar single layer and Silicon-On-Insulator (SOI) transistor, and the new generation of 3D transistors including FinFET and Tri-Gate devices. In order to decrease the directional dependency of results in 3D simulations; the Legendre equal-weight (PN-EW) quadrature set has been employed. It is found that if similar switching time is assumed for 3D and 2D FETs while the new generation of 3D FETs has less net energy consumption, they have higher hot-spot temperature. The results show continuous heat flux distribution normal to the silicon/oxide interface while the temperature jump is seen at the interface in double layer transistors.


2012 ◽  
Vol 135 (1) ◽  
Author(s):  
James M. Loy ◽  
Jayathi Y. Murthy ◽  
Dhruv Singh

Nongray phonon transport solvers based on the Boltzmann transport equation (BTE) are being increasingly employed to simulate submicron thermal transport in semiconductors and dielectrics. Typical sequential solution schemes encounter numerical difficulties because of the large spread in scattering rates. For frequency bands with very low Knudsen numbers, strong coupling between other BTE bands result in slow convergence of sequential solution procedures. This is due to the explicit treatment of the scattering kernel. In this paper, we present a hybrid BTE-Fourier model which addresses this issue. By establishing a phonon group cutoff Knc, phonon bands with low Knudsen numbers are solved using a modified Fourier equation which includes a scattering term as well as corrections to account for boundary temperature slip. Phonon bands with high Knudsen numbers are solved using the BTE. A low-memory iterative solution procedure employing a block-coupled solution of the modified Fourier equations and a sequential solution of BTEs is developed. The hybrid solver is shown to produce solutions well within 1% of an all-BTE solver (using Knc = 0.1), but with far less computational effort. Speedup factors between 2 and 200 are obtained for a range of steady-state heat transfer problems. The hybrid solver enables efficient and accurate simulation of thermal transport in semiconductors and dielectrics across the range of length scales from submicron to the macroscale.


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