Low‐temperature deposition of cubic BN:C films by unbalanced direct current magnetron sputtering of a B4C target

1996 ◽  
Vol 14 (6) ◽  
pp. 3100-3107 ◽  
Author(s):  
M. P. Johansson ◽  
I. Ivanov ◽  
L. Hultman ◽  
E. P. Münger ◽  
A. Schütze
Keyword(s):  
Low Temperature ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Low Temperature Deposition ◽  
Direct Current Magnetron Sputtering ◽  
Temperature Deposition

The mechanism of low temperature deposition of crystalline anatase by reactive DC magnetron sputtering

2005 ◽  
Vol 190 (2-3) ◽  
pp. 321-330 ◽  
Author(s):  
Mark C. Barnes ◽  
Sunil Kumar ◽  
Len Green ◽  
Nong-Moon Hwang ◽  
Andrea R. Gerson
Keyword(s):  
Low Temperature ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Low Temperature Deposition ◽  
Temperature Deposition

Study on Low Temperature Deposition of TiN Films and their Tribological Properties

2011 ◽  
Vol 189-193 ◽  
pp. 925-930 ◽  
Author(s):  
Xiu Qin Bai ◽  
Jian Li
Keyword(s):  
Low Temperature ◽  
Magnetron Sputtering ◽  
Tribological Properties ◽  
High Speed ◽  
High Speed Steel ◽  
Film Structure ◽  
Tin Films ◽  
Low Temperature Deposition ◽  
Tin Thin Films ◽  
Temperature Deposition

The low temperature deposition principle of magnetron sputtering was discussed. Reactive magnetron sputtering technique was used to gain titanium nitride (TiN) thin films on W18Cr4V high-speed steel substrates at low temperature. A series of experiments had been conducted to study the properties of TiN films. The experimental results showed that at the low temperature(<140 °C), magnetic sputtering can be used for the deposition of TiN film with compact, uniform and high nano-hardness, and their tribological properties were excellent, which co-determined by the film structure of low temperature magnetron sputtering and the counter-parts of rubbing pairs.

scholarly journals Low‐temperature deposition of polycrystalline germanium on silicon by magnetron sputtering

2018 ◽  
Vol 54 (17) ◽  
pp. 1043-1045
Author(s):  
N. Korivi ◽  
N. Nujhat ◽  
S. Ahmed ◽  
L. Jiang ◽  
K. Das
Keyword(s):  
Low Temperature ◽  
Magnetron Sputtering ◽  
Low Temperature Deposition ◽  
Temperature Deposition

Development and utility of a new 3-D magnetron source for high rate deposition of highly conductive ITO thin films near room temperature

2018 ◽  
Vol 20 (7) ◽  
pp. 4818-4830 ◽  
Author(s):  
Long Wen ◽  
Bibhuti Bhusan Sahu ◽  
Jeon Geon Han
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Magnetron Sputtering ◽  
Room Temperature ◽  
High Rate ◽  
High Quality ◽  
Low Temperature Deposition ◽  
Ito Thin Films ◽  
Temperature Deposition ◽  
Ito Films

This study reports the high rate and low-temperature deposition of high-quality ITO films using a new 3-D confined magnetron sputtering method.

Sign in / Sign up

Export Citation Format

Share Document