Study on Low Temperature Deposition of TiN Films and their Tribological Properties
2011 ◽
Vol 189-193
◽
pp. 925-930
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Keyword(s):
The low temperature deposition principle of magnetron sputtering was discussed. Reactive magnetron sputtering technique was used to gain titanium nitride (TiN) thin films on W18Cr4V high-speed steel substrates at low temperature. A series of experiments had been conducted to study the properties of TiN films. The experimental results showed that at the low temperature(<140 °C), magnetic sputtering can be used for the deposition of TiN film with compact, uniform and high nano-hardness, and their tribological properties were excellent, which co-determined by the film structure of low temperature magnetron sputtering and the counter-parts of rubbing pairs.
1999 ◽
Vol 146
(2)
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pp. 691-696
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2005 ◽
Vol 190
(2-3)
◽
pp. 321-330
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2015 ◽
Vol 642
◽
pp. 24-29
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2015 ◽
Vol 13
(1)
◽
pp. 134-146
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Keyword(s):
1996 ◽
Vol 14
(6)
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pp. 3100-3107
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1980 ◽
Vol 19
(5)
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pp. 1001-1002
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2010 ◽
Vol 256
(6)
◽
pp. 1774-1777
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