A new approach to high fidelity e-beam and ion-beam lithography based on an in situ global-fiducial grid

Author(s):  
Henry I. Smith
2006 ◽  
Vol 983 ◽  
Author(s):  
Todd Simpson ◽  
Ian V Mitchell

AbstractAperture arrays were fabricated in 1.0µm thick gold films supported on 20nm thick silicon nitride membranes. Lithographic milling strategies in gold were evaluated through the use of in-situ sectioning and high resolution SEM imaging with the UWO CrossBeam FIB/SEM. A successful strategy for producing a 250nm diameter hole with sidewalls approaching vertical is summarized.


eLife ◽  
2019 ◽  
Vol 8 ◽  
Author(s):  
Sergey Gorelick ◽  
Genevieve Buckley ◽  
Gediminas Gervinskas ◽  
Travis K Johnson ◽  
Ava Handley ◽  
...  

Cryo-electron tomography (cryo-ET) is emerging as a revolutionary method for resolving the structure of macromolecular complexes in situ. However, sample preparation for in situ Cryo-ET is labour-intensive and can require both cryo-lamella preparation through cryo-focused ion beam (FIB) milling and correlative light microscopy to ensure that the event of interest is present in the lamella. Here, we present an integrated cryo-FIB and light microscope setup called the Photon Ion Electron microscope (PIE-scope) that enables direct and rapid isolation of cellular regions containing protein complexes of interest. Specifically, we demonstrate the versatility of PIE-scope by preparing targeted cryo-lamellae from subcellular compartments of neurons from transgenic Caenorhabditis elegans and Drosophila melanogaster expressing fluorescent proteins. We designed PIE-scope to enable retrofitting of existing microscopes, which will increase the throughput and accuracy on projects requiring correlative microscopy to target protein complexes. This new approach will make cryo-correlative workflow safer and more accessible.


MRS Bulletin ◽  
2007 ◽  
Vol 32 (5) ◽  
pp. 417-423 ◽  
Author(s):  
Richard M. Langford ◽  
Philipp M. Nellen ◽  
Jacques Gierak ◽  
Yongqi Fu

AbstractThis article discusses applications of focused ion beam micro- and nanofabrication. Emphasis is placed on illustrating the versatility of focused ion beam and dual-platform systems and how they complement conventional processing techniques. The article is divided into four parts: maskless milling, ion beam lithography, ion implantation, and techniques such as in situ micromanipulation.


1996 ◽  
Vol 227 (1-4) ◽  
pp. 264-267 ◽  
Author(s):  
G.A.C. Jones ◽  
P.D. Rose ◽  
E.H. Linfield ◽  
D.A. Ritchie

2001 ◽  
Vol 705 ◽  
Author(s):  
Kenneth E. Gonsalves ◽  
Wei He ◽  
David B. Poker ◽  
Nikola Batina ◽  
Lhadi Merhari

AbstractWe describe a new approach for biomaterial patterning, viz, masked ion beam lithography. Poly (methyl methacrylate) (PMMA) film was used as a model system and subjected to Ca+ and P+ ion implantations through masks. Ca+ ion implantation was performed at an energy of 85 keV with a fluence of 1×1014 ions/cm2. P+ ion implantation was done at an energy of 85 keV with fluences of 1×1015 and 1×1016 ions/cm2. Arrays of holes were generated during these processes. AFM showed that the depth of the holes is in the nanoscale region. The surface hydrophobicity of the exposed PMMA films was investigated by contact angle measurement. The results indicated that ion implantation changed the surface hydrophobicity.


1996 ◽  
Vol 68 (6) ◽  
pp. 826-828 ◽  
Author(s):  
B. Kardynal/ ◽  
E. H. Linfield ◽  
D. A. Ritchie ◽  
K. M. Brown ◽  
C. H. W. Barnes ◽  
...  

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