Generation of uniform low-temperature plasma in a pulsed non-self-sustained glow discharge with a large-area hollow cathode

2017 ◽  
Vol 43 (1) ◽  
pp. 67-74 ◽  
Author(s):  
Yu. H. Akhmadeev ◽  
V. V. Denisov ◽  
N. N. Koval ◽  
S. S. Kovalsky ◽  
I. V. Lopatin ◽  
...  
Keyword(s):  
Low Temperature ◽  
Glow Discharge ◽  
Hollow Cathode ◽  
Low Temperature Plasma ◽  
Large Area ◽  
Temperature Plasma

Design of Plasma Discharge Structure for Surface Treatment of PP Film

2016 ◽  
Vol 693 ◽  
pp. 77-83 ◽  
Author(s):  
Yi Fang Wen ◽  
Tai Yong Wang ◽  
Hong Wei Wang
Keyword(s):  
Low Temperature ◽  
Hollow Cathode ◽  
Plasma Discharge ◽  
High Energy ◽  
Environment Pollution ◽  
Low Temperature Plasma ◽  
Cathode Plasma ◽  
Temperature Plasma ◽  
Discharge Structure ◽  
Before And After

Low temperature plasma, compared to liquid phase treatment, can effectively overcome the environment pollution, high energy loss and high cost as its high activity. The low temperature plasma, which is not only fairly friendly to the environment but also of less resource consumption, also can realize the cleaning, activating and grafting treatment for materials surface. Based on the numerical model of CRFHCP (Capacitive Radio Frequency Hollow Cathode Plasma) hollow cathode plasma discharge, the key point to affect plasma discharge was analyzed and the morphology of PP film before and after hollow cathode plasma discharge was analyzed. The results showed that the structure of plasma hollow cathode discharge can effectively improved the chemical behaviors of PP film.

Low-Temperature Plasma-Processed Microcrystalline Silicon Thin Films for Large-Area Electronics

2001 ◽  
Vol 80-81 ◽  
pp. 361-366 ◽  
Author(s):  
Pere Roca i Cabarrocas ◽  
Surendra Kumar ◽  
V. Tripathi ◽  
P. Bulkin ◽  
R. Brenot ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Low Temperature Plasma ◽  
Microcrystalline Silicon ◽  
Large Area ◽  
Temperature Plasma ◽  
Silicon Thin Films ◽  
Large Area Electronics

Advances in the Application of the Low Temperature Plasma Technology in Wastewater Treatment

2015 ◽  
Vol 737 ◽  
pp. 528-532
Author(s):  
Shuo Han ◽  
Qi Hui Xu ◽  
Rui Ping Zhang ◽  
Guo Qing Jiang ◽  
Jian Dong Ding ◽  
...  
Keyword(s):  
Wastewater Treatment ◽  
Low Temperature ◽  
Glow Discharge ◽  
High Voltage ◽  
Barrier Discharge ◽  
Low Temperature Plasma ◽  
Pulsed Discharge ◽  
Plasma Technology ◽  
Temperature Plasma ◽  
Dielectric Barrier

The low-temperature plasma technology has the comprehensive action of high-energy electron, ultraviolet light, ozone etc. The technology that integrates light, electronic and chemical oxidation into one process has a good development prospect in wastewater treatment. In this paper, the research status and development trend of high-voltage pulsed discharge, dielectric barrier discharge, glow discharge for organic wastewater treatment at home and abroad are summarized. The current main existing problems include single treatment object oriented. In the future, the study about this technique should be focused on the optimization process, the reduction of the processing cost and energy consumption, so that this technology can be applied to practical wastewater treatment as soon as possible.Key words: Low temperature plasma technology; High-voltage pulsed discharge; Glow discharge; Dielectric barrier discharge; Wastewater

Low-temperature plasma enhanced atomic layer deposition of large area HfS2 nanocrystal thin films

2020 ◽  
Vol 29 (3) ◽  
pp. 038102 ◽  
Author(s):  
Ailing Chang ◽  
Yichen Mao ◽  
Zhiwei Huang ◽  
Haiyang Hong ◽  
Jianfang Xu ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Large Area ◽  
Temperature Plasma ◽  
Layer Deposition

scholarly journals Plasma Modification of Carbon Coating Produced by RF CVD on Oxidized NiTi Shape Memory Alloy under Glow-Discharge Conditions

Materials ◽  
2021 ◽  
Vol 14 (17) ◽  
pp. 4842
Author(s):  
Justyna Witkowska ◽  
Michał Tarnowski ◽  
Emilia Choińska ◽  
Marek Kulpa ◽  
Jacek Szade ◽  
...  
Keyword(s):  
Low Temperature ◽  
Glow Discharge ◽  
Amorphous Carbon ◽  
Carbon Coating ◽  
Chemical Vapour ◽  
Contact Angles ◽  
Plasma Modification ◽  
Low Temperature Plasma ◽  
Short Term ◽  
Temperature Plasma

Our previous work has shown that for cardiac applications, combining low-temperature plasma oxidation with an amorphous carbon coating (a-C:N:H type) constitutes a prospective solution. In this study, a short-term modification by low-temperature oxygen plasma is proposed as an example and a method for shaping the topography and surface energy of the outer amorphous carbon coating, produced via the Radio-Frequency Chemical Vapour Deposition (RFCVD) method on NiTi alloy oxidized under glow-discharge conditions. This treatment alters the chemical composition of the outer zone of the surface layer. A slight increase is also noted in the surface roughness at the nanoscale. The contact angles were shown to increase by about 20% for water and 30% for diiodomethane, while the surface free energy decreased by ca. 11%. The obtained results indicate that even short-term contact with low-temperature plasma can shape the surface properties of the carbon coating, an outcome which shows potential in terms of its use in medical applications.

scholarly journals ACOUSTIC INTENSIFICATION OF PROCESSES IN THE PLASMA OF THE GLOW DISCHARGE FOR TECHNOLOGICAL PROCESSES

2022 ◽  
Vol 1 (1) ◽  
pp. 3-13
Author(s):  
Sergei Fadeev ◽  
Linar Shaidullin ◽  
Anvar Kadirmetov
Keyword(s):  
Low Temperature ◽  
Glow Discharge ◽  
Mutual Influence ◽  
Excitation Frequency ◽  
Resonant Excitation ◽  
Experimental Methodology ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Acoustic Impact ◽  
Plasma Coatings

In order to technological use in the preparation and application of plasma coatings, the mutual influence of acoustic impact on low-temperature plasma was conducted, the experimental methodology and the results of the study in the pipe at the resonant excitation frequency are given. The nonlinearity of sound oscillations was found and their amplification by increasing the pressure, which can be used to intensify the processes of plasma coatings.

Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology

Nanoscale ◽  
2018 ◽  
Vol 10 (18) ◽  
pp. 8615-8627 ◽  
Author(s):  
Akhil Sharma ◽  
Marcel A. Verheijen ◽  
Longfei Wu ◽  
Saurabh Karwal ◽  
Vincent Vandalon ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Low Temperature Plasma ◽  
Large Area ◽  
High Quality ◽  
Temperature Plasma ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

A low-temperature plasma enhanced atomic layer deposition process is demonstrated to synthesize high quality 2-D MoS2 films with tuneable morphology.

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