CHARACTERIZATION OF CdZnTe CRYSTALS BY RESISTIVITY MEASUREMENTS AND CHEMICAL ETCHING
Keyword(s):
CdZnTe crystals grown by the vertical Bridgman method were characterized by measuring their resistivity and chemical etching in the well-known Nakagawa etchant (3HF:2H2O2:2H2O, vol./vol.). It was found that the resistivity of the CdZnTe crystals was between 4.33 × 103 and 8.50 × 106 Ωcm. Defect densities were much higher around the periphery of some CdZnTe samples due to the influence of mechanical stress caused by contact with the crucible walls during the CdZnTe crystal growth. The sizes of the high defect density region ranged from 1.8 to 2.8 mm. Such high defect density region should be eliminated in order to make high-quality radiation detectors or prepare the substrates for the epitaxial growth of HgCdTe.
2008 ◽
Vol 23
(2)
◽
pp. 551-555
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2019 ◽
Vol 19
(11)
◽
pp. 6218-6223
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Keyword(s):
2008 ◽
Vol 492
(1-2)
◽
pp. 460-467
◽
Growth and Characterization of High Quality Epitaxial GaN on ZnO(0001) by Reactive Molecular Epitaxy
1998 ◽
Vol 264-268
◽
pp. 1201-1204
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