Optical characterization of TiAlON-based film used for solar energy

Optical characterization of TiAlON film applied in solar energy is presented in this paper. TiAlON -based films with different thicknesses have been deposited by magnetron sputtering. The spectrophotometer and spectroscopic ellipsometry (GES5) have been used to study the samples. Surface morphology and component of the films were investigated using scanning electron microscope (SEM), X-ray diffraction (XRD), atomic force microscope (AFM) and X-ray photoelectron spectroscopy (XPS). The optical constants and film thicknesses of TiAlON films with different thicknesses have been obtained by theoretical modeling analysis fitting (Cauchy model) and point-to-point analysis fitting. Results show that the refraction coefficient and extinction coefficient change with the film thickness increased. Those optical properties are useful for selecting the layers with adequate optical constants and thickness to design a solar selective absorber.

Download Full-text

Influence of the Microstructure and Optical Constants on Plasmonic Properties of Copper Nanolayers

Materials ◽

10.3390/ma14237292 ◽

2021 ◽

Vol 14 (23) ◽

pp. 7292

Author(s):

Tomasz Rerek ◽

Beata Derkowska-Zielinska ◽

Marek Trzcinski ◽

Robert Szczesny ◽

Mieczyslaw K. Naparty ◽

...

Keyword(s):

Surface Plasmon ◽

Photoelectron Spectroscopy ◽

Surface Plasmon Polariton ◽

Optical Constants ◽

Localized Surface Plasmon ◽

Silicon Substrates ◽

X Ray ◽

Force Microscopy ◽

Atomic Force ◽

Plasmon Polariton

Copper layers with thicknesses of 12, 25, and 35 nm were thermally evaporated on silicon substrates (Si(100)) with two different deposition rates 0.5 and 5.0 Å/s. The microstructure of produced coatings was studied using atomic force microscopy (AFM) and powder X-ray diffractometer (XRD). Ellipsometric measurements were used to determine the effective dielectric functions <ε˜> as well as the quality indicators of the localized surface plasmon (LSP) and the surface plasmon polariton (SPP). The composition and purity of the produced films were analysed using X-ray photoelectron spectroscopy (XPS).

Download Full-text

Characterization of Multiple Functional Solid Line of Graphite Ink Surface Printed by Micro-Flexographic

Applied Mechanics and Materials ◽

10.4028/www.scientific.net/amm.752-753.1379 ◽

2015 ◽

Vol 752-753 ◽

pp. 1379-1383

Author(s):

M.I. Maksud ◽

Mohd Sallehuddin Yusof ◽

Zaidi Embong

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Photoelectron Spectroscopy ◽

Printing Plate ◽

X Ray ◽

Force Microscopy ◽

Atomic Force ◽

Flexographic Printing ◽

Scanning Electron

The purpose of this paper is to study a ink surface morphology, quantify the chemical composition involved in processing of graphite ink printed by flexographic printing. The methodology is to use surface sensitive technique, X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) and Field Emission Scanning Electron Microscopy (FESEM). As a finding we successfully achieved 25 micron lines array using PDMS printing plate. The Originality and value of this work is surface sensitive techniques like XPS, AFM and FESEM were exclusively used in order to characterize graphite inks printed by flexographic method, using PDMS printing plate.

Download Full-text

Synthesis and Characterization of Strontium Titanate Nanoparticles as Potential High Temperature Oxygen Sensor Material

Journal of Nanomaterials ◽

10.1155/jnm/2006/63154 ◽

2006 ◽

Vol 2006 ◽

pp. 1-6 ◽

Cited By ~ 12

Author(s):

Florian Voigts ◽

Tanja Damjanovic ◽

Günter Borchardt ◽

Christos Argirusis ◽

Wolfgang Maus-Friedrichs

Keyword(s):

High Temperature ◽

Strontium Titanate ◽

Photoelectron Spectroscopy ◽

Oxygen Sensor ◽

Ambient Conditions ◽

X Ray ◽

Sensor Material ◽

Force Microscopy ◽

Atomic Force

We present a simple and highly reproductive method for the preparation of thin films consisting of strontium titanate nanoparticles. The films are produced by spin coating of a sol on silicon targets and subsequent annealing under ambient conditions. Analysis by atomic force microscopy shows particles with typical sizes between 10 nm and 50 nm. X-ray photoelectron spectroscopy displays a stoichiometry of the films as anticipated from preliminary experiments with strontium titanate single crystals. Metastable-induced electron spectroscopy and ultraviolet photoelectron spectroscopy are used as tools to give evidence to the similar electronic properties of nanoparticle film and single crystal. These results support the prospect for an application of the nanoparticle films as high temperature oxygen sensor with superior properties.

Download Full-text

CHARACTERIZATION OF ALUMINUM SURFACES AFTER DIFFERENT PRETREATMENTS AND EXPOSURE TO SILANE COUPLING AGENTS

Surface Review and Letters ◽

10.1142/s0218625x01000938 ◽

2001 ◽

Vol 08 (01n02) ◽

pp. 43-50 ◽

Cited By ~ 14

Author(s):

M. KONO ◽

X. SUN ◽

R. LI ◽

K. C. WONG ◽

K. A. R. MITCHELL ◽

...

Keyword(s):

Photoelectron Spectroscopy ◽

Coupling Agents ◽

Chemical Compositions ◽

Silane Coupling Agents ◽

Oh Groups ◽

X Ray ◽

Force Microscopy ◽

Atomic Force ◽

Aluminum Surfaces

X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and scanning electron microscopy (SEM) have been used to characterize surfaces of aluminum which have been pretreated by mechanical polishing, acid etching and alkaline etching, as well as given subsequent exposures to air and water. These surfaces can differ markedly with regard to their chemical compositions and topographical structures. Characterizations of these surfaces after exposures to three organosilanes, γ-GPS, BTSE and γ-APS, indicate that the amount of silane adsorbed in each case shows a tendency to increase both with the number of OH groups detected at the oxidized aluminum and with the surface roughness. The XPS data are consistent with the adhesion of γ-APS occurring through H bonding, especially via NH3+ groups.

Download Full-text

Surface Characterization of Electrochemically Fabricated CuO Doped ZnO Thin Film

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.277-279.972 ◽

2005 ◽

Vol 277-279 ◽

pp. 972-976

Author(s):

Jang Hee Yoon ◽

Yoon Bo Shim ◽

Chae Ryong Cho ◽

Mi Sook Won

Keyword(s):

Photoelectron Spectroscopy ◽

Surface Characterization ◽

Reference Electrode ◽

Cathodic Current ◽

X Ray ◽

Force Microscopy ◽

Atomic Force ◽

Zn Concentration ◽

Solution Doping

In this study, ZnO and CuO doped zinc oxide thin films were cathodically deposited in aqueous zinc chloride solutions in the presence of oxygen on a Pt/Ti/SiO2/Si substrate through an electrochemical reaction. A mercurous sulfate electrode was used as a reference electrode and the counter electrode was a Pt spiral wire. Deposition was carried out in solutions containing Zn2+ ions introduced as ZnCl2 salt at concentrations ranging from 5.0 x 10-4 to 5.0 x 10-2 M. The bath temperatures were controlled from 65°C to 80°C. The oxygen gas was introduced from argon/oxygen mixtures allowing its partial pressure to be fixed along with its concentration in the solution. Doping of CuO was carried out in cupric nitrate or a cupric chloride/0.1M KCl solution. The influence of the Cu/Zn concentration, deposition temperature of a solution, applied cathodic potential and deposition time were optimized. After the potential was applied, the cathodic current reached a steady state within 5 min. The composition, and the characterization of the surface of the films were investigated through X-ray diffractometry, X-ray photoelectron spectroscopy, atomic force microscopy and scanning electron microscopy.

Download Full-text

The Novel Polishing Characteristics for GaAs Based Diode Lasers Wafer

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.871.221 ◽

2013 ◽

Vol 871 ◽

pp. 221-225

Author(s):

Zai Jin Li ◽

Xiao Gang Zheng ◽

Te Li ◽

Yi Qu ◽

Bao Xue Bo ◽

...

Keyword(s):

Photoelectron Spectroscopy ◽

Diode Lasers ◽

Side Surface ◽

Polished Surface ◽

The Novel ◽

Oxide Layers ◽

X Ray ◽

Atomic Force ◽

Wafer Polishing

A novel polishing technology for the GaAs based diode lasers wafer is presented. Designed for technological simplicity and minimum damage generated within the GaAs based diode lasers wafer. It combines GaAs based diode lasers wafer polishing with three conditions consisting of (1) removal of thermodynamically unstable species and (2) surface oxide layers must be completely removed after thermal cleaning, and (3) a smooth surface must be provide. Revolving ultrasonic atomization technology is adopted in the polishing process. At first impurity removal is achieved by organic solvents, second NH4OH:H2O2:H2O=1:1:10 solution and HCl:H2O2:H2O=1:1:20 solution in succession to etch a very thin layer, the goal of the step is removing contaminants and forming a very thin oxidation layer on the GaAs based diode lasers wafer, NH4OH:H2O=1:5 solution is used as the removed oxide layers in the end. The effectiveness of the process is demonstrated by operation of GaAs based diode lasers wafer, characterization of the oxide composition was carried out by X-ray photoelectron spectroscopy,and surface morphology was observed by total reflection X-ray fluorescence spectroscopy and atomic force microscope. The research results show that the polished surface without contamination, and the n-side surface are very smooth.

Download Full-text

Atomic force microscopy and X-ray photoelectron spectroscopy characterization of low-energy ion sputtered mica

Surface Science ◽

10.1016/j.susc.2006.12.056 ◽

2007 ◽

Vol 601 (13) ◽

pp. 2735-2739 ◽

Cited By ~ 10

Author(s):

Renato Buzio ◽

Andrea Toma ◽

Andrea Chincarini ◽

Francesco Buatier de Mongeot ◽

Corrado Boragno ◽

...

Keyword(s):

Atomic Force Microscopy ◽

Photoelectron Spectroscopy ◽

Low Energy ◽

X Ray ◽

Force Microscopy ◽

Atomic Force

Download Full-text

Structure and Oligonucleotide Binding Efficiency of Differently Prepared Click Chemistry-Type DNA Microarray Slides Based on 3-Azidopropyltrimethoxysilane

Materials ◽

10.3390/ma14112855 ◽

2021 ◽

Vol 14 (11) ◽

pp. 2855

Author(s):

Emilia Frydrych-Tomczak ◽

Tomasz Ratajczak ◽

Łukasz Kościński ◽

Agnieszka Ranecka ◽

Natalia Michalak ◽

...

Keyword(s):

Photoelectron Spectroscopy ◽

Dna Microarrays ◽

Structural Characteristics ◽

X Ray ◽

Force Microscopy ◽

Atomic Force ◽

Glass Slides ◽

Surface Modified ◽

Oligonucleotide Binding

The structural characterization of glass slides surface-modified with 3-azidopropyltrimethoxysilane and used for anchoring nucleic acids, resulting in the so-called DNA microarrays, is presented. Depending on the silanization conditions, the slides were found to show different oligonucleotide binding efficiency, thus, an attempt was made to correlate this efficiency with the structural characteristics of the silane layers. Atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and X-ray reflectometry (XRR) measurements provided information on the surface topography, chemical composition and thickness of the silane films, respectively. The surface for which the best oligonucleotides binding efficiency is observed, has been found to consist of a densely-packed silane layer, decorated with a high-number of additional clusters that are believed to host exposed azide groups.

Download Full-text