Preparation of Stable F-Doped SiO2Thin Films from Si(NCO)4/SiF4/O2Gas Mixtures Using a Conventional Capacitively Coupled RF Plasma Source
1997 ◽
Vol 36
(Part 1, No. 7B)
◽
pp. 4911-4916
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2017 ◽
Vol 12
(11)
◽
pp. P11024-P11024
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2005 ◽
Vol 544
(1-2)
◽
pp. 436-440
◽
Keyword(s):
Keyword(s):
2007 ◽
Vol 4
(7)
◽
pp. 2326-2329
◽
2003 ◽
Vol 10
(02n03)
◽
pp. 405-411
◽
Keyword(s):
Keyword(s):