scholarly journals Realization of Ultraflat Plastic Film Using Dressed-Photon-Phonon-Assisted Selective Etching of Nanoscale Structures

2015 ◽  
Vol 2015 ◽  
pp. 1-5 ◽  
Author(s):  
Takashi Yatsui ◽  
Wataru Nomura ◽  
Motoichi Ohtsu
Keyword(s):  
Continuous Wave ◽  
Wavelength Dependence ◽  
Selective Etching ◽  
Pmma Substrate ◽  
Height Difference ◽  
Nanoscale Structures ◽  
Photochemical Etching ◽  
Atomic Force ◽  
Difference Function ◽  
Scale Structures

We compared dressed-photon-phonon (DPP) etching to conventional photochemical etching and, using a numerical analysis of topographic images of the resultant etched polymethyl methacrylate (PMMA) substrate, we determined that the DPP etching resulted in the selective etching of smaller scale structures in comparison with the conventional photochemical etching. We investigated the wavelength dependence of the PMMA substrate etching using an O2 gas. As the dissociation energy of O2 is 5.12 eV, we applied a continuous-wave (CW) He-Cd laser (λ= 325 nm, 3.81 eV) for the DPP etching and a 5th-harmonic Nd:YAG laser (λ= 213 nm, 5.82 eV) for the conventional photochemical etching. From the obtained atomic force microscope images, we confirmed a reduction in surface roughness, Ra, in both cases. However, based on calculations involving the standard deviation of the height difference function, we confirmed that the conventional photochemical etching method etched the larger scale structures only, while the DPP etching process selectively etched the smaller scale features.

Mold Pattern Fabrication by Nanoscratching

2013 ◽  
Vol 7 (6) ◽  
pp. 686-693 ◽  
Author(s):  
Jun Shimizu ◽  
◽  
Libo Zhou ◽  
Takeyuki Yamamoto ◽  
Hirotaka Ojima ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Single Layer ◽  
Silicon Substrates ◽  
Nanoscale Structures ◽  
Multistage Processes ◽  
Atomic Force ◽  
Layer Structures ◽  
Long Time ◽  
Scale Structures ◽  
Alternative Solutions

MEMS technologies for various nano/micro-devices often requires special facilities and complicated,multistage processes. The fabrication cost is thus extremely high. Consequently, alternative solutions have been sought, and NanoImprint Lithography (NIL) is one of the potential solutions. To date, the nano/micromolds for NIL are mainly fabricated using photolithography or focused ion beams. However, such beam methods generally make use of special instruments and require a long time to draw precise patterns. Thus, this study aims to fabricate nanoscale structures on monocrystalline silicon substrates using nanoscratching, which can potentially be used to fabricate nano/micro-molds for NIL. This paper discusses how various nano/micro-scale structures such as lineand-space, single-layer, and multiple-layer structures were fabricated on a silicon substrate using nanoscratching by an atomic force microscope equipped with a sharp probe made of monocrystalline diamond. Subsequent chemical etching was also conducted on the fabricated groove patterns to enlarge the depth of the fabricated groove patterns. The results confirmed that the groove was deepened several times, with only a slight increase in its width. A nanoimprint experiment was also carried out, and the line-and-space patterns were duplicated successfully on a polycarbonate resin film.

ELECTROSPINNING OF CONTINUOUS CARBON NAONOFIBER-FILLED COMPOSITE FIBERS

2012 ◽  
Vol 05 ◽  
pp. 545-550
Author(s):  
Seyed Hamed Aboutalebi ◽  
Zahra Gholamvand ◽  
Mansoor Keyanpour-Rad
Keyword(s):  
Carbon Nanofibers ◽  
Polymer Fibers ◽  
Composite Fibers ◽  
Force Microscopy ◽  
Atomic Force ◽  
Macro Scale ◽  
Electrospinning Method ◽  
Scale Structures ◽  
Filled Composite ◽  
Pan Fibers

In order to translate the superior properties of carbon nanofibers (CNFs) to macro-scale structures, an electrospinning route capable of placing CNFs into a continuous nano-scale composite fibril is introduced. In this work, composite fibers were produced by electrospinning solution of polyacrylonitrile ( PAN ) with carbon nanofibers dispersed in dimethylformamide ( DMF ), which is an effective solvent for carbon nanofibers. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) demonstrated rough and globular surfaces on the CNF containing fibers. Raman spectra confirmed the presence of CNFs in the polymer fibers prepared employing the electrospinning method. Raman observation served as the direct evidence of successful filling of PAN fibers with CNFs and complemented the results obtained by SEM and AFM studies.

scholarly journals Molecular-scale structures of the surface and hydration shell of bioinert mixed-charged self-assembled monolayers investigated by frequency modulation atomic force microscopy

RSC Advances ◽  
2018 ◽  
Vol 8 (43) ◽  
pp. 24660-24664
Author(s):  
Yuki Araki ◽  
Taito Sekine ◽  
Ryongsok Chang ◽  
Tomohiro Hayashi ◽  
Hiroshi Onishi
Keyword(s):  
Hydration Shell ◽  
Self Assembled Monolayers ◽  
Water Molecules ◽  
Self Assembled Monolayer ◽  
Force Microscopy ◽  
Atomic Force ◽  
Molecular Scale ◽  
Assembled Monolayers ◽  
Scale Structures ◽  
Self Assembled

Water molecules above a bioinert mixed-charged self-assembled monolayer (MC-SAM) surface are highly structured compared to those of bioactive SAM surfaces.

Fabrication of nanometer‐scale structures using atomic force microscope with conducting probe

1994 ◽  
Vol 12 (4) ◽  
pp. 2586-2590 ◽  
Author(s):  
Takeo Hattori ◽  
Yasunori Ejiri ◽  
Kenji Saito ◽  
Masatoshi Yasutake
Keyword(s):  
Atomic Force Microscope ◽  
Nanometer Scale ◽  
Atomic Force ◽  
Scale Structures

Fabrication of Semiconductor Nanostructures With an Atomic Force Microscope

1995 ◽  
Vol 380 ◽  
Author(s):  
E. S. Snow ◽  
P. M. Campbell
Keyword(s):  
Electric Field ◽  
Atomic Force Microscope ◽  
Semiconductor Nanostructures ◽  
Selective Etching ◽  
Device Fabrication ◽  
Fabrication Process ◽  
Local Electric Field ◽  
Nanometer Scale ◽  
Atomic Force ◽  
Resolution Limits

ABSTRACTAn AFM-based nanolithography process is described. We employ the local electric field of a metal-coated AFM tip which is operated in air to selectively oxidize regions of a H-passivated Si surface. The resulting oxide, ∼ 3 nm thick, is used as a mask for selective etching of the unoxidized regions of Si. This AFM-based fabrication process is fast, reliable, simple to perform and is well suited for device fabrication. We apply this technique to the fabrication of Si and GaAs nanostructures, as well as to the fabrication of a nanometer-scale Si side-gated transistor. In addition, we discuss the ultimate resolution limits of the technique.

scholarly journals Лазерно-индуцированный графен на полиимидной пленке: наблюдение эффекта увлечения

2020 ◽  
Vol 46 (9) ◽  
pp. 51
Author(s):  
К.Г. Михеев ◽  
Р.Г. Зонов ◽  
Д.Л. Булатов ◽  
А.Е. Фатеев ◽  
Г.М. Михеев
Keyword(s):  
Continuous Wave ◽  
Graphene Film ◽  
Laser Pulses ◽  
Wavelength Dependence ◽  
Polyimide Film ◽  
Film Structure ◽  
Laser Generation ◽  
Nanosecond Laser ◽  
Nanosecond Pulses ◽  
Wide Range

Porous graphene film structures were produced by irradiation of polyimide film with focused continuous wave CO2 laser. Generation of nanosecond pulses of photocurrent was observed in the obtained structures upon excitation by nanosecond laser pulses in a wide range of wavelengths. It is shown that the photocurrent linearly increases with pulsed laser power and its dependence on the angle of light incidence on the film structure is symmetric about the origin. Wavelength dependence of light-to-photocurrent conversion coefficient was measured. The obtained results are explained by photon-drag effect photocurrent generation.

Nanostructuring Curved Surfaces Using a Flexible Stamp

2009 ◽  
Author(s):  
Bahador Farshchian ◽  
JaeJong Lee ◽  
Sunggook Park
Keyword(s):  
Hot Embossing ◽  
Curved Surface ◽  
Curved Surfaces ◽  
Pmma Substrate ◽  
Pdms Stamp ◽  
Flat Surfaces ◽  
Force Microscopy ◽  
Atomic Force ◽  
Metallic Object ◽  
Planar Substrates

We report on a simple and effective process that allows direct imprinting of micro- and nanostructures on non-flat surfaces. A thin polydimethylsiloxane (PDMS) stamp having micro/nanogratings was placed between a metallic bar with a trapezoidal cross section or a metallic pellet and a flat polymethyl methacrylate (PMMA) substrate, followed by hot embossing at 200°C. During the hot embossing process, the metallic bar/pellet is pushed into the PMMA sheet forming a millimeter scale channel or a curved surface. Due to the presence of the PDMS stamp between the metallic object and the substrate, micro/nanostructures are produced into the channel or over the curved surface. With this method, we have successfully demonstrated micro- and nanostructures down to 300 nm wide gratings on non-flat substrates, as confirmed by scanning electron microscopy and atomic force microscopy. The process so developed will fill the gap in current micro- and nanofabrication technologies in that most of the technologies allow for patterning only on planar substrates.

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