High-resolution Imaging of Nanoparticles in Wide-field Interferometric Scattering Microscopy

2019 ◽  
Author(s):  
Celalettin Yurdakul ◽  
Oguzhan Avci ◽  
Alex Matlock ◽  
Lei Tian ◽  
Ekmel Ozbay ◽  
...  
Keyword(s):  
High Resolution ◽  
Wide Field ◽  
High Resolution Imaging ◽  
Resolution Imaging

Design of Airborne Multi-Scale Wide-Field-of-View and High-Resolution Imaging System

2021 ◽  
Vol 41 (2) ◽  
pp. 0208002
Author(s):  
李江勇 Li Jiangyong ◽  
冯位欣 Feng Weixin ◽  
刘飞 Liu Fei ◽  
魏雅喆 Wei Yazhe ◽  
邵晓鹏 Shao Xiaopeng
Keyword(s):  
High Resolution ◽  
Imaging System ◽  
Field Of View ◽  
Wide Field ◽  
High Resolution Imaging ◽  
Multi Scale ◽  
Wide Field Of View ◽  
Resolution Imaging

scholarly journals Structural and Morphological Properties of Ultraluminous Infrared Galaxies at 1 < z < 3

2015 ◽  
Vol 24 (3) ◽  
Author(s):  
Guanwen Fang ◽  
Zhongyang Ma ◽  
Yang Chen ◽  
Xu Kong
Keyword(s):  
High Resolution ◽  
Near Infrared ◽  
Hubble Space Telescope ◽  
Morphological Properties ◽  
Wide Field ◽  
High Resolution Imaging ◽  
Infrared Galaxies ◽  
Morphology And Structure ◽  
Ultraluminous Infrared Galaxies ◽  
Resolution Imaging

AbstractUsing the Hubble Space Telescope (HST)/Wide Field Camera 3 (WFC3) near-infrared high-resolution imaging from the 3D-HST survey, we analyze the morphology and structure of 502 ultraluminous infrared galaxies (ULIRGs;

scholarly journals A New Type of Atmospheric Dispersion Corrector Suitable for Wide-Field High-Resolution Imaging and Spectroscopy on Large Telescopes

2021 ◽  
Vol 11 (14) ◽  
pp. 6261
Author(s):  
Andrew Rakich
Keyword(s):  
High Resolution ◽  
Atmospheric Dispersion ◽  
Wide Field ◽  
High Resolution Imaging ◽  
Dispersion Correction ◽  
Atmospheric Effect ◽  
New Type ◽  
Resolution Imaging ◽  
Imaging And Spectroscopy ◽  
Large Telescopes

Atmospheric dispersion produces spectral elongation in images formed by land-based astronomical telescopes, and this elongation increases as the telescope points away from the zenith. Atmospheric Dispersion Correctors (ADCs) produce compensating dispersion that can be adjusted to best cancel out the atmospheric effect. These correctors are generally of two basic types: Rotating Atmospheric Dispersion Correctors (R-ADCs), and Linear Atmospheric Dispersion Correctors (L-ADCs). Lately, a third type, the “Compensating Lateral ADC” (CL-ADC) has been proposed. None of these design approaches allow for large corrector systems (with elements greater than 1 m in diameter), in which the secondary spectrum is corrected to small residuals, of the order of tens’ of milliarcseconds. This paper describes a new type of large corrector (>1 m diameter elements), which can achieve the correction of the secondary spectrum to the order of 10 milliarcseconds. This correction is achieved by combining the R-ADC and CL-ADC approaches to dispersion correction. Only glass types readily available in metre diameters are required.

Alternative approaches to ultra-high resolution imaging

1991 ◽  
Vol 49 ◽  
pp. 650-651
Author(s):  
J.M. Cowley
Keyword(s):  
High Resolution ◽  
High Voltage ◽  
High Resolution Electron Microscopy ◽  
Crystal Defects ◽  
High Resolution Imaging ◽  
General Applicability ◽  
Resolution Electron ◽  
Radiation Resistant ◽  
Resolution Imaging ◽  
Alternative Approaches

By extrapolation of past experience, it would seem that the future of ultra-high resolution electron microscopy rests with the advances of electron optical engineering that are improving the instrumental stability of high voltage microscopes to achieve the theoretical resolutions of 1Å or better at 1MeV or higher energies. While these high voltage instruments will undoubtedly produce valuable results on chosen specimens, their general applicability has been questioned on the basis of the excessive radiation damage effects which may significantly modify the detailed structures of crystal defects within even the most radiation resistant materials in a period of a few seconds. Other considerations such as those of cost and convenience of use add to the inducement to consider seriously the possibilities for alternative approaches to the achievement of comparable resolutions.

Principle and practice of high-resolution imaging with a field-emission TEM

1992 ◽  
Vol 50 (1) ◽  
pp. 138-139
Author(s):  
Max T. Otten ◽  
Wim M.J. Coene
Keyword(s):  
High Resolution ◽  
Field Emission ◽  
Incidence Angle ◽  
Temporal Coherence ◽  
Energy Spread ◽  
High Resolution Imaging ◽  
Major Improvement ◽  
High Resolution Images ◽  
Resolution Imaging

High-resolution imaging with a LaB6 instrument is limited by the spatial and temporal coherence, with little contrast remaining beyond the point resolution. A Field Emission Gun (FEG) reduces the incidence angle by a factor 5 to 10 and the energy spread by 2 to 3. Since the incidence angle is the dominant limitation for LaB6 the FEG provides a major improvement in contrast transfer, reducing the information limit to roughly one half of the point resolution. The strong improvement, predicted from high-resolution theory, can be seen readily in diffractograms (Fig. 1) and high-resolution images (Fig. 2). Even if the information in the image is limited deliberately to the point resolution by using an objective aperture, the improved contrast transfer close to the point resolution (Fig. 1) is already worthwhile.

Imaging of ferroelectric domain walls by electron holography

1992 ◽  
Vol 50 (1) ◽  
pp. 246-247
Author(s):  
Xiao Zhang
Keyword(s):  
Magnetic Field ◽  
High Resolution ◽  
Domain Walls ◽  
Ferroelectric Domain ◽  
Object Wave ◽  
Electron Holography ◽  
High Resolution Imaging ◽  
Quantitative Measurements ◽  
Resolution Imaging ◽  
Electron Microscopes

Electron holography has recently been available to modern electron microscopy labs with the development of field emission electron microscopes. The unique advantage of recording both amplitude and phase of the object wave makes electron holography a effective tool to study electron optical phase objects. The visibility of the phase shifts of the object wave makes it possible to directly image the distributions of an electric or a magnetic field at high resolution. This work presents preliminary results of first high resolution imaging of ferroelectric domain walls by electron holography in BaTiO3 and quantitative measurements of electrostatic field distribution across domain walls.

The method of replication affects metal film granularity and resolution

1989 ◽  
Vol 47 ◽  
pp. 708-709
Author(s):  
George C. Ruben
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Film Thickness ◽  
Single Molecule ◽  
Metal Film ◽  
Vertical Surface ◽  
High Resolution Imaging ◽  
Controllable Factors ◽  
Resolution Imaging

Single molecule resolution in electron beam sensitive, uncoated, noncrystalline materials has been impossible except in thin Pt-C replicas ≤ 150Å) which are resistant to the electron beam destruction. Previously the granularity of metal film replicas limited their resolution to ≥ 20Å. This paper demonstrates that Pt-C film granularity and resolution are a function of the method of replication and other controllable factors. Low angle 20° rotary , 45° unidirectional and vertical 9.7±1 Å Pt-C films deposited on mica under the same conditions were compared in Fig. 1. Vertical replication had a 5A granularity (Fig. 1c), the highest resolution (table), and coated the whole surface. 45° replication had a 9Å granulartiy (Fig. 1b), a slightly poorer resolution (table) and did not coat the whole surface. 20° rotary replication was unsuitable for high resolution imaging with 20-25Å granularity (Fig. 1a) and resolution 2-3 times poorer (table). Resolution is defined here as the greatest distance for which the metal coat on two opposing faces just grow together, that is, two times the apparent film thickness on a single vertical surface.

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