2D Magnetic Texture Analysis of Co–Cu Films

2017 ◽  
Vol 72 (5) ◽  
pp. 449-455 ◽  
Author(s):  
Mehmet Bayirli ◽  
Oznur Karaagac ◽  
Hakan Kockar ◽  
Mursel Alper
Keyword(s):  
Fourier Series ◽  
Texture Analysis ◽  
Easy Axis ◽  
Hysteresis Loops ◽  
X Ray Diffraction ◽  
Axis Orientation ◽  
Magnetic Texture ◽  
X Ray ◽  
Cu Films ◽  
Magnetic Easy Axis

AbstractThe magnetic textures for the produced magnetic materials are important concepts in accordance with technical applications. Therefore, the aim of this article is to determine 2D magnetic textures of electrodeposited Co–Cu films by the measurement of hysteresis loops at the incremented angles. For that, Co–Cu films were deposited with different Co2+ in the electrolyte. In addition, the easy-axis orientation in the films from the squareness values of the angles, Mp(β) obtained by the hysteresis loops have been numerically studied using the Fourier series analysis. The differences observed in the magnetic easy-axis distributions were attributed to changes of the incorporation of Co in the films with the change of Co2+ in the electrolyte. The coefficients of Fourier series (A0 and A2n ) were also computed for 2D films. It is seen that a systematic and small decrease in A0 and an obvious decrease in A2n (n=1) were observed with increasing incorporated Co in the films. Results imply that interactions cause slightly demagnetization effect accordance with higher incorporation of Co in the films. Furthermore, the crystal structure of the Co–Cu films analysed by X-ray diffraction revealed that the films have dominantly face-centred cubic structure. Film contents analysed by energy-dispersive X-ray spectroscopy and film morphologies observed by scanning electron microscope also support the magnetic texture analysis results found by numerical computation.

Determination of Texture Orientation Related Magnetic Properties of Nickel-Cobalt Films

2010 ◽  
Vol 65 (4) ◽  
pp. 342-346 ◽  
Author(s):  
Mehmet Bayirli ◽  
Hakan Kockar ◽  
Mursel Alper ◽  
Emrah Cokturen
Keyword(s):  
Easy Axis ◽  
Hysteresis Loops ◽  
Face Centered Cubic ◽  
Axis Orientation ◽  
X Ray ◽  
A Value ◽  
Nickel Cobalt ◽  
Magnetic Easy Axis ◽  
Face Centered

The determination of texture effects in nickel-cobalt (Ni-Co) films with different thickness, which were obtained by electrodeposition, has been investigated by the measurement of hysteresis loops at different angles. Easy-axis distribution measurements were performed as a function of the squareness Mp(β ) and the correlations were established among the different thicknesses. The composition of Ni- Co films was determined by energy dispersive X-ray spectroscopy. The structural analysis made by X-ray diffraction revealed that all films have a polycrystalline face-centered cubic structure but their texture degrees vary depending on the film thickness. The determination of the easy-axis orientation in 2-D films from the Mp(β ) obtained by the hystersis loops was studied using Fourier series analyses. The coefficient A0 have a value of less then unity while A2 is inversely proportional to the width of the distribution function which may cause the change in the texture preferential orientations. Therefore, the differences observed in the magnetic easy-axis distributions were attributed to the changes in texture orientations caused by the compositional differences at different thicknesses of the polycrystalline films.

Magnetic Anisotropy in Electrodeposited CO Films and spin-valves on Gaas Substrates

1999 ◽  
Vol 562 ◽  
Author(s):  
K. Attenborough ◽  
M. Cerisier ◽  
H. Boeve ◽  
J. De Boeck ◽  
G. Borghs ◽  
...  
Keyword(s):  
Magnetic Anisotropy ◽  
Buffer Layer ◽  
Structural Properties ◽  
Easy Axis ◽  
Spin Valve ◽  
X Ray Diffraction ◽  
X Ray ◽  
Cu Films ◽  
Gaas Substrates ◽  
Unique Spin

ABSTRACTWe have studied the magnetic and structural properties of thin electrodeposited Co and Cu layers grown directly onto (100) n-GaAs and have investigated the influence of a buffer layer. A dominant fourfold anisotropy with a uniaxial contribution is observed in 10 nm Co electrodeposited films on GaAs. An easy axis is observed in the [001] GaAs direction with two hard axes of differing coercivities parallel to the [011] and [011] directions. For thicker films the easy axes in the [001] direction becomes less pronounced and the fourfold anisotropy becomes less dominant. Co films of similar thicknesses deposited onto an electrodeposited Cu buffer layer were nearly isotropic. From X-ray diffraction 21 nm Co layers on GaAs were found to be hcp with the c-axis tending to be in the plane of the film. The anisotropy is ascribed to the Co/GaAs interface and is held responsible for the unique spin-valve properties seen recently in electrodeposited Co/Cu films.

Structural and Magnetic Properties of XMnSb/PtMnSb Clb Heusler Alloy Superlattices (X=Ni,Cu)

1997 ◽  
Vol 475 ◽  
Author(s):  
J.F. Bobo ◽  
K. Bessho ◽  
F.B. Mancoff ◽  
P.R. Johnson ◽  
M.C. Kautzky ◽  
...  
Keyword(s):  
Easy Axis ◽  
Heusler Alloys ◽  
Single Layer ◽  
Interlayer Coupling ◽  
Perpendicular Anisotropy ◽  
X Ray Diffraction ◽  
Ordered Structures ◽  
X Ray ◽  
Magnetic Easy Axis

ABSTRACTWe have grown superlattices based on the Clb Heusler alloys PtMnSb, CuMnSb and NiMnSb between 200–500°C on A12O3 (0001). X-ray diffraction (XRD) indicates (111) oriented ordered structures for growth at 300°C. Higher deposition temperature leads to interdiffusion, loss of the multilayer structure and appearance of extra phases. Growth at 200°C slightly reduces the intermixing but also reduces the quality of the crystal structure. For PtMnSb/CuMnSb, we found an enhancement of the saturation magnetization compared to equivalent PtMnSb single layer films and a CuMnSb spacer thickness dependence of the squareness of the M(H) 100ps suggestive of interlayer coupling. Short periodicity NiMnSb/PtMnSb superlattices show an in-plane magnetic easy axis, but correction for shape anisotropy indicates a tendency for perpendicular anisotropy.

BARIUM HEXAFERRITE THICK FILMS BY HOT PRESS SINTERING

2010 ◽  
Vol 24 (06) ◽  
pp. 561-566 ◽  
Author(s):  
H. C. JIANG ◽  
W. L. ZHANG ◽  
Y. HE ◽  
B. PENG ◽  
W. X. ZHANG
Keyword(s):  
Easy Axis ◽  
Thick Films ◽  
Barium Hexaferrite ◽  
Film Plane ◽  
Hot Press ◽  
X Ray Diffraction ◽  
X Ray ◽  
Remanence Ratio ◽  
Magnetic Easy Axis ◽  
Hot Press Sintering

BaFe 12 O 19 ferrite thick films were screen-printed and sintered at 1150°C under pressure (hot press sintering). The effects of the hot press sintering on the properties of barium hexaferrite thick films were investigated. The X-ray diffraction pattern shows improvement of the (00l) texture under pressure. The porosity size of the hot press sintering samples decreases obviously and the surface compactness is improved as the pressure is increased. The films are quite anisotropic with magnetic easy axis perpendicular to the film plane. The largest remanence ratio achieved is 0.75 under the highest pressure of 4 MPa.

scholarly journals Spatially Resolved Forming Mechanisms Detection in Single Point Incremental Forming Using Synchrotron Based Texture Analysis

2021 ◽  
Author(s):  
Mateus Dobecki ◽  
Alexander Poeche ◽  
Walter Reimers
Keyword(s):  
Texture Analysis ◽  
Incremental Forming ◽  
Single Point ◽  
High Energy ◽  
X Ray Diffraction ◽  
X Ray ◽  
Forming Mechanism ◽  
Spatially Resolved ◽  
Step Down ◽  
Stress States

AbstractDespite the ongoing success of understanding the deformation states in sheets manufactured by single-point incremental forming (SPIF), the unawareness of the spatially resolved influence of the forming mechanisms on the residual stress states of incrementally formed sheet metal parts impedes their application-optimized use. In this study, a well-founded experimental proof of the occurring forming mechanisms shear, bending and stretching is presented using spatially resolved, high-energy synchrotron x-ray diffraction-based texture analysis in transmission mode. The measuring method allows even near-surface areas to be examined without any impairment of microstructural influences due to tribological reactions. The depth-resolved texture evolution for different sets of forming parameters offers insights into the forming mechanisms acting in SPIF. Therefore, the forming mechanisms are triggered explicitly by adjusting the vertical step-down increment Δz for groove, plate and truncated cone geometries. The texture analysis reveals that the process parameters and the specimen geometries used lead to characteristic changes in the crystallites’ orientation distribution in the formed parts due to plastic deformation. These forming-induced reorientations of the crystallites could be assigned to the forming mechanisms by means of defined reference states. It was found that for groove, plate and truncated cone geometries, a decreasing magnitude of step-down increments leads to a more pronounced shear deformation, which causes an increasing work hardening especially at the tool contact area of the formed parts. Larger step-down increments, on the other hand, induce a greater bending deformation. The plastic deformation by bending leads to a complex stress field that involves alternating residual tensile stresses on the tool and residual compressive stresses on the tool-averted side incrementally formed sheets. The present study demonstrates the potential of high-energy synchrotron x-ray diffraction for the spatially resolved forming mechanism research in SPIF. Controlling the residual stress states by optimizing the process parameters necessitates knowledge of the fundamental forming mechanism action.

The Microstructure and Electrical Property of Porous Cu Film on Soft PVDF Substrate

2012 ◽  
Vol 472-475 ◽  
pp. 1451-1454
Author(s):  
Xue Hui Wang ◽  
Wu Tang ◽  
Ji Jun Yang
Keyword(s):  
Electrical Properties ◽  
Film Surface ◽  
X Ray Diffraction ◽  
Si Substrate ◽  
X Ray ◽  
Cu Films ◽  
Cu Film ◽  
Diffraction Peaks ◽  
Sputtering Pressure ◽  
Effect Method

The porous Cu film was deposited on soft PVDF substrate by magnetron sputtering at different sputtering pressure. The microstructure and electrical properties of Cu films were investigated as a function of sputtering pressure by X-ray diffraction XRD and Hall effect method. The results show that the surface morphology of Cu film is porous, and the XRD revealed that there are Cu diffraction peaks with highly textured having a Cu-(220) or a mixture of Cu-(111) and Cu-(220) at sputtering pressure 0.5 Pa. The electrical properties are also severely influenced by sputtering pressure, the resistivity of the porous Cu film is much larger than that fabricated on Si substrate. Furthermore, the resistivity increases simultaneously with the increasing of Cu film surface aperture, but the resistivity of Cu film still decreases with the increasing grain size. It can be concluded that the crystal structure is still the most important factor for the porous Cu film resistivity.

Structural and Electrical Properties of Colossal Magnetoresistive LSMO Thin Films Prepared by KrF Laser Ablation Method

2001 ◽  
Vol 666 ◽  
Author(s):  
Fumiaki Mitsugi ◽  
Tomoaki Ikegami ◽  
Kenji Ebihara ◽  
Jagdish Narayan ◽  
Alexander M. Grishin
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Electrical Properties ◽  
Lattice Mismatch ◽  
X Ray Diffraction ◽  
Axis Orientation ◽  
X Ray ◽  
Colossal Magnetoresistive ◽  
Laser Ablation Method ◽  
Structural And Electrical Properties

ABSTRACTWe prepared colossal magnetoresistive La0.8Sr0.2MnO3 thin films on the MgO, SrTiO3 and LaAlO3 single crystal substrates using KrF excimer pulsed laser ablation technique. The structural and electrical properties of the La0.8Sr0.2MnO3 thin films which were strained by the lattice mismatch are reported. The in-plane lattice mismatch between the La0.8Sr0.2MnO3 and MgO, SrTiO3 and LaAlO3 substrates are -7.8 %, -0.5 % and +2.3 %, respectively. The X-ray diffraction spectra of the films exhibited c-axis orientation. In the case of the La0.8Sr0.2MnO3 / LaAlO3 thin films with thickness over 100 nm, the divided (00l) peaks were observed. The surface morphology and transport property of the strongly stressed La0.8Sr0.2MnO3 / LaAlO3 were different from those of La0.8Sr0.2MnO3 / MgO and La0.8Sr0.2MnO3 / SrTiO3thin films.

Properties of Nano-ZnO Films Deposited by RF Magnetron Sputtering for SAW Biosensors

2011 ◽  
Vol 418-420 ◽  
pp. 293-296
Author(s):  
Qiu Yun Fu ◽  
Peng Cheng Yi ◽  
Dong Xiang Zhou ◽  
Wei Luo ◽  
Jian Feng Deng
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Time ◽  
Rf Magnetron Sputtering ◽  
Zno Films ◽  
X Ray Diffraction ◽  
Zno Film ◽  
Nano Zno ◽  
Axis Orientation ◽  
X Ray

Abstract. In this article, nano-ZnO films were deposited on SiO2/Si (100) substrates by RF (radio frequency) magnetron sputtering using high purity (99.99%) ZnO target. The effects of deposition time and annealing temperature have been investigated. XRD (X-ray diffraction) and FSEM (Field Emission Scanning Electron Microscopy) were employed to characterize the quality of the films. The results show that the ZnO film with thickness of 600nm annealed at 900°C has higher quality of both C-axis orientation and crystallization. And for the Zone film with thickness of 300nm annealed at 850°C, the quality of both C-axis orientation and crystallization is higher than that annealed at 900°C and 950°C.

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