Substrate bias effects during R-F sputtering of Y-Ba-Cu-O films
1990 ◽
Vol 5
(4)
◽
pp. 677-679
◽
Keyword(s):
Y-Ba-Cu-O films were made by R-F diode sputtering using a single oxide target. It was found that if a small negative bias is applied to the substrate, the etching associated with reactive sputtering is significantly reduced. This results in better composition control and uniformity, which are quite important for the formation of superconducting thin films. Films deposited on strontium titanate, when annealed in oxygen, become superconducting with zero resistance at 89 K.
1992 ◽
Vol 06
(08)
◽
pp. 477-483
◽
1988 ◽
Vol 3
(4)
◽
pp. 613-618
◽
2000 ◽
Vol 14
(25n27)
◽
pp. 2731-2736
◽
1987 ◽
Vol 01
(02)
◽
pp. 579-582
1990 ◽
Vol 04
(07)
◽
pp. 479-483
◽