A Simulation Model of Resistive Switching in Electrochemical Metallization Memory Cells (ECM)

2009 ◽  
Vol 1160 ◽  
Author(s):  
Stephan Menzel ◽  
Bart Klopstra ◽  
Carsten Kügeler ◽  
Ulrich Böttger ◽  
Georgi Staikov ◽  
...  

AbstractThe storage principal of the Electrochemical Metallization Memory Cell is based on change of cell resistance induced by electro-chemical driven growth and rupture of a cupric or silver filament in an insulating matrix. This kind of switching was found in several materials as AgGeSe, CuGeS, silicon oxide or tungsten oxide [1].During write operation copper or silver is oxidized at the corresponding electrode and copper or silver ions are driven out of the copper or silver anode into the insulating matrix due to the applied field, whereas the insulating matrix serves as solid electrolyte. The silver or copper ions migrate towards the cathode. At the cathode electrochemical reduction occurs, and deposition of metallic copper or silver takes place. Fast diffusion paths in the solid electrolyte matrix or preferred nucleation sites (seeds) at the boundary lead to filamentary growth. This growing cupric or silver dendrite finally reaches the anode and switches the device to a low resistance state.Based on this switching mechanism a FEM simulation model was set up. To simplify the model space charges due to silver or copper migration are neglected. It is further assumed, that the conductivity in the solid electrolyte is only ionic. Hence, it is sufficient to solve the well-known Laplace equation to address the electric properties as well as ion migration. A “Level Set” method is used to track the boundary of the growing filament. The velocity of this boundary is proportional to the ionic current density calculated by Laplace equation. Based on this model simulations are applied to cell structures with multiple fast diffusion paths and seeds. Simulation results show that just one filament reaches the anode.In a second step, Butler-Vollmer boundary conditions are introduced. This nonlinearity leads to an exponential dependence between switching time and switching voltage. As switching voltage increases, switching time decreases.A simulation model capable of simulating ECM memory cells is presented. The model enables to simulate the behaviour of different cell geometries or different materials as solid electrolyte. Furthermore it gives deeper insight into the switching mechanism.This work was supported by the European project EMMA “Emerging Materials for Mass storage Architectures” (FP6-033751).

2012 ◽  
Vol 09 ◽  
pp. 488-494
Author(s):  
WAN NOR MUNIRAH ARIFFIN ◽  
SHAZALINA MAT ZIN ◽  
SHAHARUDDIN SALLEH

Switching is a technique to route data and instructions between pairs of source-destination nodes or among multiple nodes for broadcast communication. We realized that the shortest path problem has a wide application in the design of networks. Therefore, in this paper, we present a mesh network as our switching mechanism for computing the shortest path between the source and destination in our simulation model, developed using C++ on the Windows environment. The Floyd-Warshall algorithm is applied in finding the shortest path in all-pairs nodes.


1992 ◽  
Vol 7 (2) ◽  
pp. 444-449 ◽  
Author(s):  
Zdenek Hrabe ◽  
Sridhar Komarneni ◽  
Ladislav Pach ◽  
Rustum Roy

Boehmite compacts and boehmite gels (seeded and unseeded) were annealed at various temperatures in nitrogen and 1 atm water vapor to determine the influence of water vapor on boehmite transformation to new phases, changes in porosity, and morphology. Water vapor was found to accelerate the phase transformations markedly compared to dry N2 treatment. The catalyzing effect of water vapor may be due to its interactions on grain surfaces and generation of fast diffusion paths, resulting in nucleation and growth of new phases. This result shows that control of the furnace atmosphere is a useful variable in thermally activated processes.


2011 ◽  
Vol 151 (2) ◽  
pp. 148-150
Author(s):  
X.F. Liang ◽  
X.H. Kong ◽  
S.T. Zhang ◽  
W. Yang

2005 ◽  
Author(s):  
N. Banno ◽  
T. Sakamoto ◽  
T. Hasegawa ◽  
K. Terabe ◽  
M. Aono

2010 ◽  
Vol 13 (3) ◽  
pp. H87 ◽  
Author(s):  
X. B. Yan ◽  
K. Li ◽  
J. Yin ◽  
Y. D. Xia ◽  
H. X. Guo ◽  
...  

Crystals ◽  
2020 ◽  
Vol 10 (6) ◽  
pp. 540 ◽  
Author(s):  
Po-Hsien Sung ◽  
Tei-Chen Chen

Due to the rapid increase in current density encountered in new chips, the phenomena of thermomigration and electromigration in the solder bump become a serious reliability issue. Currently, Ni or TiN, as a barrier layer, is widely academically studied and industrially accepted to inhibit rapid copper diffusion in interconnect structures. Unfortunately, these barrier layers are polycrystalline and provide inadequate protection because grain boundaries may presumably serve as fast diffusion paths for copper and could react to form Cu–Sn intermetallic compounds (IMCs). Amorphous metallic films, however, have the potential to be the most effective barrier layer for Cu metallization due to the absence of grain boundaries and immiscibility with copper. In this article, the diffusion properties, the strength of the interface between polycrystalline and amorphous ZrCuNiAl thin film, and the effects of quenching rate on the internal microstructures of amorphous metal films were individually investigated by molecular dynamics (MD) simulation. Moreover, experimental data of the diffusion process for three different cases, i.e., without barrier layer, with an Ni barrier layer, and with a Zr53Cu30Ni9Al8 thin film metallic glass (TFMG) barrier layer, were individually depicted. The simulation results show that, for ZrCuNiAl alloy, more than 99% of the amorphous phase at a quenching rate between 0.25 K/ps and 25 K/ps can be obtained, indicating that this alloy has superior glass-forming ability. The simulation of diffusion behavior indicated that a higher amorphous ratio resulted in better barrier performance. Moreover, a very small and uniformly distributed strain appears in the ZrCuNiAl layer in the simulation of the interfacial tension test; however, almost all the voids are initiated and propagated in the Cu layer. These phenomena indicate that the strength of the ZrCuNiAl/Cu interface and ZrCuNiAl layer is greater than polycrystalline Cu. Experimental results show that the Zr53Cu30Ni9Al8 TFMG layer exhibits a superior barrier effect. Almost no IMCs appear in this TFMG barrier layer even after aging at 125 °C for 500 h.


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