High Mobility a-Si:H TFT Fabricated by Hot Wire Chemical Vapor Deposition

2010 ◽  
Vol 1245 ◽  
Author(s):  
Chun-Yuan Hsueh ◽  
Chieh-Hung Yang ◽  
Si-Chen Lee
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Field Effect ◽  
High Mobility ◽  
Chemical Vapor ◽  
Field Effect Mobility ◽  
Hot Wire ◽  
Low Threshold ◽  
Hydrogenated Amorphous ◽  
Very High

AbstractThe hydrogenated amorphous silicon (a-Si:H) thin film transistors (TFTs) having a very high field-effect mobility of 1.76 cm2/V-s and a low threshold voltage of 2.43 V have been fabricated successfully using the hot wire chemical vapor deposition (HWCVD).

High mobility top gated field-effect transistors and integrated circuits based on chemical vapor deposition-derived monolayer MoS2

2016 ◽  
Vol 6 (2) ◽  
pp. 198-204 ◽  
Author(s):  
Dianzhong Wu ◽  
Zhiyong Zhang ◽  
Danhui Lv ◽  
Guoli Yin ◽  
Zhijian Peng ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Integrated Circuits ◽  
Vapor Deposition ◽  
Field Effect ◽  
Field Effect Transistors ◽  
High Mobility ◽  
Chemical Vapor

High Field Effect Mobility in Si Face 4H-SiC MOSFET Made on Sublimation Grown Epitaxial Material

2005 ◽  
Vol 483-485 ◽  
pp. 841-844 ◽  
Author(s):  
Einar Ö. Sveinbjörnsson ◽  
H.Ö. Ólafsson ◽  
G. Gudjónsson ◽  
Fredrik Allerstam ◽  
Per Åke Nilsson ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Surface Morphology ◽  
Vapor Deposition ◽  
Field Effect ◽  
High Field ◽  
Chemical Vapor ◽  
Field Effect Mobility ◽  
Fabrication And Characterization ◽  
Peak Field

We report on fabrication and characterization of n-channel Si face 4H-SiC MOSFETs made using sublimation grown epitaxial material. Transistors made on this material exhibit record-high peak field effect mobility of 208 cm2/Vs while reference transistors made on a commercial epitaxial material grown by chemical vapor deposition (CVD) show field effect mobility of 125 cm2/Vs. The mobility enhancement is attributed to better surface morphology of the sublimation grown epitaxial layer.

Efficient 18 Å/s Solar Cells with All Silicon Layers Deposited by Hot-Wire Chemical Vapor Deposition

2000 ◽  
Vol 609 ◽  
Author(s):  
Qi Wang ◽  
Eugene Iwaniczko ◽  
Yueqin Xu ◽  
Wei Gao ◽  
Brent P. Nelson ◽  
...  
Keyword(s):  
Solar Cells ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Deposition Time ◽  
Chemical Vapor ◽  
Open Circuit ◽  
Hot Wire ◽  
Edge Layer ◽  
Hydrogenated Amorphous ◽  
Sun Light

ABSTRACTEfficient hydrogenated amorphous silicon (a-Si:H) n-i-p solar cells have been fabricated with all doped and undoped a-Si:H layers deposited by hot-wire chemical vapor deposition (HWCVD). The total deposition time of all layers, except the top ITO-contact, is less than 4 minutes. On an untextured stainless steel (SS) substrate, an initial efficiency of 7.12% is reached, with a stable efficiency of 5.4% after 1000 hours 1 sun light soaking. This initial efficiency is reached by incorporating into the p/i interface about 60 Å of intrinsic a-Si:H “edge” material grown under conditions near the transition to microcrystallinity. This edge layer increases the cell's fill factor from 0.60 to 0.68 and the best open-circuit voltage is about 0.88 V. Using textured Ag/ZnOcoated SS supplied by United Solar Corporation, preliminary results of an all-HWCVD solar cell give an initial efficiency of 8.7 %.

Hydrogenated Amorphous Silicon Germanium Alloys Grown by the Hot-Wire Chemical Vapor Deposition Technique

1998 ◽  
Vol 507 ◽  
Author(s):  
Brent P. Nelson ◽  
Yueqin Xu ◽  
D.L. Williamson ◽  
Bolko Von Roedern ◽  
Alice Mason ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Germanium ◽  
Hydrogenated Amorphous Silicon ◽  
Chemical Vapor ◽  
Hot Wire ◽  
Germanium Content ◽  
Amorphous Silicon Germanium ◽  
Hydrogenated Amorphous ◽  
Gas Ratio

ABSTRACTWe successfully grow high-quality hydrogenated amorphous-silicon-germanium alloys (a-SiGe:H) by the hot-wire chemical-vapor deposition (HWCVD) technique using silane and germane gas mixtures. These alloys display electronic properties as good as those grown by the plasma-enhanced chemical-vapor deposition (PECVD) technique, when comparing materials with the same optical bandgaps. However, we grow materials with good electrical properties at high deposition rates—up to 40 Å/s, compared to 1–4 Å/s for PECVD materials. Our alloys exhibit similar trends with increasing Ge content to alloys grown by PECVD. The defect density, the dark conductivity, and the degree of nanostructural heterogeneity (as measured by small-angle X-ray scattering) all increase with increasing germanium content in the alloy. The nanostructural heterogeneity displays a sharp transition between 9 at.% and 14 at.% germanium. PECVD- grown a-SiGe:H alloys exhibit a similar transition at 20 at.% Ge. The photoconductivity and the ambipolar diffusion length of the alloys decrease with increasing germanium content. For a fixed silane-to-germane gas ratio, all material properties improve substantially when increasing substrate temperature (Tsub) from 220°C to 375°C. Increasing Tsub also narrows the optical bandgap and lowers the hydrogen content in the alloys for the same germane-to-silane gas ratio.

Effects of the Selenium Precursor on the Growth of ZnSe by Metalorganic Chemical Vapor Deposition

1988 ◽  
Vol 131 ◽  
Author(s):  
Konstantinos P. Giapis ◽  
Lu Da-Cheng ◽  
Klavs F. Jensen
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
High Mobility ◽  
Chemical Vapor ◽  
Gaas Substrates ◽  
Downflow Reactor ◽  
Very High ◽  
Metalorganic Chemical

ABSTRACTThe growth of ZnSe on GaAs substrates by metalorganic chemical vapor deposition was investigated in a specially designed vertical downflow reactor. Dimethylzinc was used as the Zn source while different Se source compounds (hydrogen selenide (H2Se), diethylselenide and methylallylselenide) were employed to determine the effect of different source combinations on morphology, thickness uniformity, growth rate, electrical properties and photoluminescence (PL) characteristics of the grown ZnSe films. The H2Se was produced in situ by reaction of H2 and Se followed by distillation to control the amount of H2Se entering the reaction zone. H2Se produced very high mobility films with good PL spectra but poor surface morphology. Diethylselenide led to layers of good morphology and PL characteristics but the films were highly resistive. Unusual surface features were observed for methylallylselenide.

Dependence of Field-Effect Mobility of Graphene Grown by Thermal Chemical Vapor Deposition on Its Grain Size

2013 ◽  
Vol 52 (11R) ◽  
pp. 110106 ◽  
Author(s):  
Katsunori Yagi ◽  
Ayaka Yamada ◽  
Kenjiro Hayashi ◽  
Naoki Harada ◽  
Shintaro Sato ◽  
...  
Keyword(s):  
Grain Size ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Field Effect ◽  
Chemical Vapor ◽  
Field Effect Mobility ◽  
Thermal Chemical Vapor Deposition
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