Pulsed Laser Deposition of Thin Silicon Nitride Films
Keyword(s):
Ft Ir
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ABSTRACTABSTRACTPulsed laser deposition of compressed Si3N4 powder has been used to grow thin SiNx films on a variety of substrates at substrate temperatures ranging from room temperature to 350°C. Film composition was analyzed by Auger electron spectroscopy. The SiN0.33 films have a band gap of 5.60 eV as measured by UV absorption. The FT-IR spectrum shows an absorption characteristic of Si-N. The Si/N ratio in the deposited films corresponding to various substrate temperatures has also been determined.
2018 ◽
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pp. 1850053
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Vol 37
(6)
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pp. 061401
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2005 ◽
Vol 19
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pp. 1775-1782
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Vol 75
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pp. 202-207
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2004 ◽
Vol 36
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pp. 403-408
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