Pulsed Laser Deposition of Thin Metallic Multilayers and Amorphous Films

1992 ◽  
Vol 285 ◽  
Author(s):  
Hans-Ulrich Krebs ◽  
Olaf Bremert
Keyword(s):  
Ablation Threshold ◽  
Pulsed Laser ◽  
Film Surface ◽  
The Other ◽  
Laser Deposition ◽  
Metallic Multilayers ◽  
Amorphous Films ◽  
Deposition Rates ◽  
Excimer Laser Ablation ◽  
Explosive Evaporation

ABSTRACTThe method of pulsed excimer laser ablation using KrF radiation was applied for the deposition of thin metallic elementary multilayers. Above an ablation threshold of about 5 J/cm2 an ‘explosive’ evaporation of the metallic targets occurs leading to high deposition rates of up to 5 nm/s. For different metals, the ablation threshold slightly varies leading at the same laser fluence to different growth rates as shown for Ag, Fe, Zr and Nb. By using two elementary targets and adjusting the dwelling times on both targets, Fe/Ag, Fe/Zr and Fe/Nb multilayers of different bilayer thicknesses were deposited. While Fe/Ag superstructures show crystalline phases down to a periodicity of 1 nm, Fe/Zr and Fe/Nb films are amorphous at such wavelengths. On the other side, Fe/Nb multilayers can also be amorphized by a solid state interdiffusion reaction of the elementary multilayers. The surfaces of the grown films are smooth except for a small number of droplets on the film surface.

Post-Processing of Pulsed Laser-Deposited Pzt Thin Films

1991 ◽  
Vol 243 ◽  
Author(s):  
C. K. Chiang ◽  
W. Wong-Ng ◽  
L. P. Cook ◽  
P. K. Schenck ◽  
H. M. Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Amorphous Material ◽  
Ferroelectric Properties ◽  
Pulsed Laser ◽  
Linear Shrinkage ◽  
Laser Deposition ◽  
Amorphous Films ◽  
Pzt Thin Films ◽  
Si Substrates ◽  
Pzt Thin Film

AbstractPZT thin films were prepared by pulsed laser deposition on unheated Ptcoated Si substrates. As deposited, the films were amorphous. Films crystallized at 550 - 600 °C to produce predominantly crystalline ferroelectric PZT. Crystallization of the amorphous material was accompanied by a linear shrinkage of ∼2 %, as manifested in development of cracks in the film. Spacing, width and morphology of larger cracks followed a regular progression with decreasing film thickness. For film thicknesses less than 500 runm, much of the shrinkage was taken up by small, closely-spaced cracks of local extent. Implications for measurement of PZT thin film ferroelectric properties and processing are discussed.

Epitaxial Pd-Doped LaFeO3 Films Grown on (100) SrTiO3 by Pulsed Laser Deposition

2014 ◽  
Vol 936 ◽  
pp. 282-286
Author(s):  
Ying Wen Duan
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Film Surface ◽  
Laser Deposition ◽  
Structural Quality ◽  
Deposition Technique ◽  
X Ray Diffraction ◽  
Orientation Relationships ◽  
X Ray ◽  
Transmission Electron

Single-crystalline, epitaxial LaFeO3 films with 5 at. % substitution of Pd on the Fe site are grown on (100) SrTiO3 substrate by pulsed-laser deposition technique. The epitaxial orientation relationships are (110)[001]LFPO||(100)[001]STO. X-ray diffraction and transmission electron microscopy reveal that the LFPO films have high structural quality and an atomically sharp LFPO/STO interface. After reduction treatments of as-grown LFPO films, very little Pd escaped the LFPO lattice onto the film surface, the formed Pd (100) particles are oriented epitaxially, and parallel to the LFPO films surface.

Texture Studies on Borocarbide Thin Films

2005 ◽  
Vol 495-497 ◽  
pp. 1425-1430 ◽  
Author(s):  
K. Subba Rao ◽  
R. Tamm ◽  
S.C. Wimbush ◽  
G.H. Cao ◽  
C.G. Oertel ◽  
...  
Keyword(s):  
Thin Films ◽  
Buffer Layer ◽  
Pulsed Laser ◽  
The Other ◽  
Laser Deposition ◽  
Epitaxial Thin Films ◽  
Secondary Phases ◽  
Superconducting Properties ◽  
Phase Purity ◽  
Y2o3 Buffer Layer

Epitaxial thin films of the superconducting borocarbide compound YNi2B2C were grown on single crystal MgO (100) substrates without and with Y2O3 buffer layer using pulsed laser deposition (PLD). In both cases YNi2B2C grows with [001] normal to the substrate. However, the in-plane texture depends on the starting condition. For samples without buffer layer, oxygen from the substrate diffuses into the film and forms an Y2O3 reaction layer at the interface. As a consequence, a deficiency of Y is generated giving rise to the formation of secondary phases. On the other hand, using an artificial Y2O3 buffer layer secondary phases are suppressed. The texture of the Y2O3 layers determines the texture of the YNi2B2C film. The superconducting properties of the borocarbide films are discussed with respect to texture and phase purity.

scholarly journals Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films

2018 ◽  
Vol 9 ◽  
pp. 686-692 ◽  
Author(s):  
Daiki Katsube ◽  
Hayato Yamashita ◽  
Satoshi Abo ◽  
Masayuki Abe
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Metal Oxide ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Film Surface ◽  
Laser Deposition ◽  
Combined System ◽  
Force Microscopy ◽  
Atomic Force

We have designed and developed a combined system of pulsed laser deposition (PLD) and non-contact atomic force microscopy (NC-AFM) for observations of insulator metal oxide surfaces. With this system, the long-period iterations of sputtering and annealing used in conventional methods for preparing a metal oxide film surface are not required. The performance of the combined system is demonstrated for the preparation and high-resolution NC-AFM imaging of atomically flat thin films of anatase TiO2(001) and LaAlO3(100).

Characterization of AgAsS and AgSbS amorphous films prepared by pulsed laser deposition

2004 ◽  
Vol 36 (8) ◽  
pp. 1140-1143 ◽  
Author(s):  
T. Wagner ◽  
M. Krbal ◽  
J. Gutwirth ◽  
P. Nemec ◽  
Mir. Vlcek ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Amorphous Films

THE TARGET MORPHOLOGY DURING PULSED LASER DEPOSITION OF HYDROXYAPATITE THIN FILMS

2005 ◽  
Vol 12 (04) ◽  
pp. 539-543 ◽  
Author(s):  
QUANHE BAO ◽  
CHUANZHONG CHEN ◽  
LUBIN CHEN ◽  
DIANGANG WANG ◽  
TINGQUAN LEI ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
The Other ◽  
Laser Deposition ◽  
Grain Structure ◽  
Before And After ◽  
Modified Surface ◽  
Modified Surface Layer

A modified surface layer of hydroxyapatite (HA) target was observed before and after pulsed laser deposition. Two types of HA targets were used for laser ablation. We observed that the surface morphology of the target has a very fine compacted grain structure and presents many irregularities with some microroughness and microporosity before laser ablation. The laser ablated regions can be divided into two areas: one area is porous and rough but the other is dense and smooth. The percentage of particles in the films was high for the films produced with targets that were sintered at 1200°C.

UV EMISSION OF TETRAGONAL ZrO2 NANOCRYSTALS EMBEDDED IN ZrSiO4 AMORPHOUS MATRIX

2010 ◽  
Vol 24 (24) ◽  
pp. 2477-2483 ◽  
Author(s):  
ZHONGYANG GE ◽  
YUE ZHOU ◽  
JIANG YIN ◽  
YOUPIN GONG ◽  
SHICHENG LV ◽  
...  
Keyword(s):  
Room Temperature ◽  
Electronic Excitation ◽  
Amorphous Matrix ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Deposition Technique ◽  
Amorphous Films ◽  
Optical Absorbance ◽  
Uv Emission ◽  
Quartz Substrates

Amorphous films Zr 0.8 Si 0.2 O 2 were deposited on quartz substrates at room temperature, by using pulsed laser deposition technique. After annealing at high temperature, Zr 0.8 Si 0.2 O 2 films suffer a phase separation to precipitate tetragonal ZrO 2 nanocrystals in ZrSiO 4 amorphous matrix. Their crystal structure, microstructure, optical absorbance and photoluminescence have been systematically investigated. Tetragonal ZrO 2 nanocrystals show intense UV emission around 392 nm under photonic excitation with a wavelength of 250 nm. The corresponding models of electronic excitation and transition related to UV emission also have been proposed.

X-Ray Diffraction Study of Clusters in a-tC Films

1994 ◽  
Vol 358 ◽  
Author(s):  
L. J. Martínez-Miranda ◽  
T. A. Friedmann ◽  
J. P. Sullivan ◽  
M. P. Siegal ◽  
T. W. Mercer ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Diffraction Study ◽  
Laser Energy ◽  
Pulsed Laser ◽  
Film Surface ◽  
Laser Deposition ◽  
Basic Unit ◽  
Unit Size ◽  
X Ray Diffraction ◽  
X Ray

ABSTRACTWe performed an X-ray diffraction study of amorphous-tetrahedrally-coordinated carbon (a-tC) films prepared by pulsed laser deposition (PLD). The samples' properties were analyzed as a function of laser energy and thickness. For all thicknesses and laser energies, films were made up of clusters with a basic unit size of 7 -11 nm. Thicker films, as well as films prepared at higher laser densities exhibit larger clusters, in the tens of nanometers. The clusters are not readily observable by AFM, which may indicate the presence of a flat (graphitized) top film surface.

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