Post-Processing of Pulsed Laser-Deposited Pzt Thin Films
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AbstractPZT thin films were prepared by pulsed laser deposition on unheated Ptcoated Si substrates. As deposited, the films were amorphous. Films crystallized at 550 - 600 °C to produce predominantly crystalline ferroelectric PZT. Crystallization of the amorphous material was accompanied by a linear shrinkage of ∼2 %, as manifested in development of cracks in the film. Spacing, width and morphology of larger cracks followed a regular progression with decreasing film thickness. For film thicknesses less than 500 runm, much of the shrinkage was taken up by small, closely-spaced cracks of local extent. Implications for measurement of PZT thin film ferroelectric properties and processing are discussed.
2013 ◽
Vol 760-762
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pp. 714-718
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1998 ◽
Vol 08
(PR9)
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pp. Pr9-121-Pr9-124
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2003 ◽
Vol 217
(1-4)
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pp. 108-117
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2004 ◽
Vol 227
(1-4)
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pp. 187-192
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