Piezoelectric Fiber Coatings and Micro-Tubes

1994 ◽  
Vol 360 ◽  
Author(s):  
G.R. Fox ◽  
D. Damjanovic ◽  
P.A. Danai ◽  
N. Setter ◽  
H.G. Limberger ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Structural Properties ◽  
Optical Fibers ◽  
Piezoelectric Response ◽  
Phase Modulator ◽  
Axially Symmetric ◽  
Dc Magnetron Sputtering ◽  
Polyester Fibers ◽  
Piezoelectric Fiber ◽  
Fiber Coatings

AbstractAxially symmetric coatings of ZnO and PZT have been deposited onto fiber substrates by reactive dc magnetron sputtering. Multi-layer Cr/Au/ZnO/Cr/Au coating structures on optical fibers have been used to make integrated phase modulator devices. An analysis of the structural properties and piezoelectric response of the phase modulator devices will be presented. Microtubes of ZnO and Pt/ZnO/Pt multi-layers have been prepared by coating polyester fibers that act as a fugitive phase. After burning away the polyester fiber, up to 3 cm long micro-tubes with a 23 μm inside diameter and 3 to 9 μm wall thickness were obtained.

Electrical and structural properties of ultrathin polycrystalline and epitaxial TiN films grown by reactive dc magnetron sputtering

2009 ◽  
Vol 1156 ◽  
Author(s):  
Fridrik Magnus ◽  
Arni Sigurdur Ingason ◽  
Sveinn Olafsson ◽  
Jon Tomas Gudmundsson
Keyword(s):  
Magnetron Sputtering ◽  
Structural Properties ◽  
Dc Magnetron Sputtering ◽  
Single Crystalline ◽  
Tin Films ◽  
X Ray

AbstractUltrathin TiN films were grown by reactive dc magnetron sputtering on amorphous SiO2 substrates and single-crystalline MgO substrates at 600°C. The resistance of the films was monitored in-situ during growth to determine the coalescence and continuity thicknesses. TiN films grown on SiO2 are polycrystalline and have coalescence and continuity thicknesses of 8 Å and 19 Å, respectively. TiN films grow epitaxially on the MgO substrates and the coalescence thickness is 2 Å and the thickness where the film becomes continuous cannot be resolved from the coalescence thickness. X-ray reflection measurements indicate a significantly higher density and lower roughness of the epitaxial TiN films.

scholarly journals The Effects of Annealing Temperature on the Structural Properties of ZrB2 Films Deposited via Pulsed DC Magnetron Sputtering

Coatings ◽  
2019 ◽  
Vol 9 (4) ◽  
pp. 253 ◽  
Author(s):  
Wei-Chun Chen ◽  
Chao-Te Lee ◽  
James Su ◽  
Hung-Pin Chen
Keyword(s):  
Electron Microscopy ◽  
Magnetron Sputtering ◽  
Structural Properties ◽  
Photoelectron Spectroscopy ◽  
Annealing Temperature ◽  
High Vacuum ◽  
Film Structure ◽  
Dc Magnetron Sputtering ◽  
Cross Sectional ◽  
X Ray

Zirconium diboride (ZrB2) thin films were deposited on a Si(100) substrate using pulsed direct current (dc) magnetron sputtering and then annealed in high vacuum. In addition, we discussed the effects of the vacuum annealing temperature in the range of 750 to 870 °C with flowing N2 on the physical properties of ZrB2 films. The structural properties of ZrB2 films were investigated with X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The XRD patterns indicated that the ZrB2 films annealed at various temperatures exhibited a highly preferred orientation along the [0001] direction and that the residual stress could be relaxed by increasing the annealing temperature at 870 °C in a vacuum. The surface morphology was smooth, and the surface roughness slightly decreased with increasing annealing temperature. Cross-sectional TEM images of the ZrB2/Si(100) film annealed at 870 °C reveals the films were highly oriented in the direction of the c-axis of the Si substrate and the film structure was nearly stoichiometric in composition. The XPS results show the film surfaces slightly contain oxygen, which corresponds to the binding energy of Zr–O. Therefore, the obtained ZrB2 film seems to be quite suitable as a buffer layer for III-nitride growth.

Characterization of the Piezoelectric Response of Aluminum Nitride Grown by dc Magnetron Sputtering for Applications in Thin-Film Resonators

1996 ◽  
Vol 444 ◽  
Author(s):  
Rajan S. Naik ◽  
Joseph J. Lutsky ◽  
Rafael Reif ◽  
Charles G. Sodini
Keyword(s):  
Thin Film ◽  
Aluminum Nitride ◽  
Magnetron Sputtering ◽  
Parameter Extraction ◽  
Bulk Acoustic Wave ◽  
Piezoelectric Response ◽  
Device Performance ◽  
Coupling Coefficients ◽  
Dc Magnetron Sputtering ◽  
Device Structure

AbstractAluminum nitride is a promising material for use in thin-film bulk acoustic wave resonators for applications in RF bandpass filters. This paper discusses the requirements needed for a dc magnetron sputtering system to grow piezoelectrically active films with x-ray diffraction rocking curves of 3.3° on silicon substrates, 5° on aluminum substrates and oxygen concentrations of l at.%. For applications in integrated resonators, a materials characterization is insufficient in predicting the subsequent device performance. A simple acoustic device structure which allows a quick measurement of the device performance is used to extract maximum effective coupling coefficients keff2 of 0.009% at 3.4GHz and 0.002% at 2.4GHz for two different films with rocking curves of 5.7° and 9.0° respectively. This parameter extraction technique may be used to make relative comparisons between films grown under different deposition conditions.

Diamond-Like Films Obtained by Sputtering from a Glassy Carbon Target

1989 ◽  
Vol 152 ◽  
Author(s):  
E. Niemann ◽  
R. Herkert ◽  
D. Leidich
Keyword(s):  
Magnetron Sputtering ◽  
Structural Properties ◽  
Glassy Carbon ◽  
Target Material ◽  
Hydrogen Atmosphere ◽  
Antireflection Coatings ◽  
Dc Magnetron Sputtering ◽  
Carbon Target ◽  
First Time

ABSTRACTDiamond-like a-C:H films were obtained by reactive dc-magnetron sputtering from a glassy carbon target in an argon-hydrogen atmosphere. To our knowledge, this is the first time that glassy carbon is used as target material. The a-C:H films are transparent and hard. The a-C:H films can be used as protection and antireflection coatings on a-Si:H photoreceptors. The electrical, optical and structural properties of the a-C:H films are examined.

scholarly journals ZnO microtubes

1994 ◽  
Vol 9 (11) ◽  
pp. 2737-2740 ◽  
Author(s):  
G.R. Fox ◽  
P.A. Danai
Keyword(s):  
Magnetron Sputtering ◽  
Polyester Fiber ◽  
Dc Magnetron Sputtering ◽  
Inside Diameter ◽  
Polyester Fibers ◽  
Sputter Coating

Microtubes of ZnO have been produced using sputter coating and a fugitive phase technique. ZnO was sputtered onto polyester fibers by dc magnetron sputtering, and the polyester fiber fugitive phase was subsequently burned out by annealing in air or oxygen. Tubes with an inside diameter of 23 μm and a length of 3 cm were obtained. The 3 to 6 μm thick walls of the tubes exhibited a [002] radial texture.

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