Investigation of Diblock Copolymer thin film Morphology for Nanolithography

1996 ◽  
Vol 461 ◽  
Author(s):  
Miri Park ◽  
Christopher Harrison ◽  
Paul M. Chaikin ◽  
Richard A. Register ◽  
Douglas Adamson ◽  
...  
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Diblock Copolymer ◽  
Diblock Copolymers ◽  
Microphase Separation ◽  
Large Area ◽  
Etching Technique ◽  
Copolymer Films ◽  
Self Assembled ◽  
Self Assembled Layer

ABSTRACTThe microphase separated morphology of diblock copolymers can be used to generate well-ordered nanometer scale patterns over a large area. To achieve this goal, it is important to understand and control the behavior of diblock copolymer thin films on substrates, which can differ from the bulk behavior. We have investigated the morphologies and ordering in thin polystyrene-polybutadiene (PS-PB) diblock copolymer films on bare silicon and silicon nitride substrates, and also on polymethylmethacrylate (PMMA) coated substrates. The PS-PB copolymers are synthesized to form, in bulk, PB cylinders or spheres in a PS matrix. In thin films (10–60 nm thick), prepared by spin-coating, we observe that the morphology and ordering of the microdomains are affected by strong wetting constraints and a reduced chain mobility on the substrate. The thinnest self-assembled layer of the copolymer films shows no in-plane microphase separation on both types of substrates. The PS blocks wet the PMMA substrates whereas the PB blocks wet the bare substrates as well as the air interface. Hence, different film thicknesses are necessary on the two types of substrates to obtain a uniform film of the first self-assembled cylindrical or spherical microdomain layer. The first layer of the cylindrical copolymer can vary from cylindrical to spherical morphology with a few nanometer decrease in film thickness. In the case of spherical PS-PB diblock copolymer films, we observe that the ordering of the microdomains is improved in the films on the PMMA substrates, compared to those on the bare substrates. We also demonstrate a successful transfer of the microdomain patterns to silicon nitride substrates by a reactive ion etching technique.

Block Copolymer Thin Films Above and Below the Order-Disorder Transition Temperature

2000 ◽  
Vol 629 ◽  
Author(s):  
Ratchana Limary ◽  
Peter F. Green
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Molecular Weight ◽  
Transition Temperature ◽  
Block Copolymer ◽  
Film Thickness ◽  
Diblock Copolymer ◽  
Diblock Copolymers ◽  
Microphase Separation ◽  
Disorder Transition Temperature

ABSTRACTSymmetric diblock copolymers undergo a disorder to order transition below a microphase separation transition temperature. In this temperature range the structure is characterized by alternating lamellae of thickness L. In thin film geometries, the lamellae are oriented normal to the substrate if there is a preferential interaction between either of the block constituents and the substrate/copolymer or copolymer/vacuum interfaces. Depending on the relation between the film thickness and L, the topography of the film might comprise of holes, islands or spinodal-like structures. We show that in a polystyrene-b-poly(methyl methacrylate) diblock copolymer of molecular weight 20, 000 g/mol, above the microphase separation transition temperature, the topography of the film depends on the thickness. A heirarchy of bicontinuous patterns and holes is observed with increasing film thickness for films thinner than 35 nm.

Temperature Dependence of the Morphology of Thin Diblock Copolymer Films as Revealed by Neutron Reflectivity

1989 ◽  
Vol 166 ◽  
Author(s):  
T. P. Russell ◽  
S. H. Anastasiadis ◽  
S. K. Satija ◽  
C. F. Majkrzak
Keyword(s):  
Thin Films ◽  
Temperature Dependence ◽  
Density Profile ◽  
Diblock Copolymer ◽  
Diblock Copolymers ◽  
Decay Length ◽  
Neutron Reflectivity ◽  
Copolymer Films ◽  
Lamellar Morphology ◽  
Oriented Parallel

ABSTRACTThe order-disorder transition in thin films of symmetric diblock copolymers of polystyrene and polymethylmethacrylate has been investigated by neutron reflectivity. At temperatures above the order-disorder temperature, TMST, a surface induced oscillatory segment density profile with an exponential decay length, χ, is observed. The inverse of decay length 1/≤ TMST a lamellar morphology oriented parallel to the surface propagates through the entire specimen.

Tem Studies of Single and Double Microdomain Layers of Block Copolymer

1998 ◽  
Vol 4 (S2) ◽  
pp. 818-819
Author(s):  
N. Yao ◽  
M. Park ◽  
C. Harrison ◽  
D. H. Adamson ◽  
P. M. Chaikin ◽  
...  
Keyword(s):  
Thin Films ◽  
Glass Transition ◽  
Block Copolymer ◽  
Diblock Copolymers ◽  
Microphase Separation ◽  
Covalent Bond ◽  
Inorganic Materials ◽  
Polymer Chains ◽  
Copolymer Films ◽  
Cylinders And Spheres

Diblock copolymers consist of two chemically different polymer chains (or blocks) joined by a covalent bond. Because of the incompatibility between the two blocks and connectivity constraints, diblock copolymers spontaneously self-assemble into microphase-separated nanometer size domains that exhibit ordered morphologies at equilibrium. Commonly observed microdomain morphologies in bulk samples are periodic arrangements of lamellae, cylinders, and spheres. Recent studies show that the thin films of such block copolymers are of great potential for many nanoapplications including nanolithography and template synthesis for inorganic materials. Here, we report TEM studies of osmylated and ozonated thin diblock copolymer films.An asymmetric block copolymer was synthesized with a composition of 36 kg/mol for the poly(styrene)(PS) block and 11 kg/mole for the poly (butadiene)(PB) block such that the microphase separation produces PB cylinders in a matrix of PS. The films were spin-coated from solution onto thin silicon nitride windows and annealed above the glass transition temperature in vacuum.

Nanoporous Thin Films Formed from Photocleavable Diblock Copolymers on Gold Substrates Modified with Thiolate Self-Assembled Monolayers

Langmuir ◽  
2020 ◽  
Vol 36 (31) ◽  
pp. 9259-9268 ◽  
Author(s):  
Takashi Ito ◽  
Herman Coceancigh ◽  
Yi Yi ◽  
Jay N. Sharma ◽  
Fred C. Parks ◽  
...  
Keyword(s):  
Thin Films ◽  
Diblock Copolymers ◽  
Self Assembled Monolayers ◽  
Gold Substrates ◽  
Assembled Monolayers ◽  
Self Assembled

Silicon Nitride Optimisation for A-Si:H Tfts Used in Projection LC-TVS

1994 ◽  
Vol 336 ◽  
Author(s):  
I. D. French ◽  
C. J. Curling ◽  
A.L. Goodyear
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Electrical Performance ◽  
Storage Capacitor ◽  
Electrical Characteristics ◽  
Large Area ◽  
Step Coverage ◽  
Minimum Number ◽  
Physical Shape ◽  
Nitride Layers

ABSTRACTMulti-layer devices based on thin films in Large Area Electronics have different intrinsic and extrinsic properties that must be optimised to produce the correct physical shape of the device, in addition to having acceptable electrical characteristics. For instance it is quite easy to produce individual layers optimised for electrical performance that will physically “pull off’ underlying films, or result in poor step coverage. The factors that must be considered include mechanical stress, etching rates and profiles, thickness and stoichiometry uniformity, and thermal budgets, as well as electrical characteristics. This paper gives an example of silicon nitride optimisation for use in a-Si:H TFT projection displays. Three different silicon nitride layers were included to give a storage capacitor, together with controlled etch profiles for step coverage. The layers were optimised with respect to several different parameters in the minimum number of depositions by the use of experimental design techniques.

Nanostructured organic radical cathodes from self-assembled nitroxide-containing block copolymer thin films

2015 ◽  
Vol 3 (38) ◽  
pp. 19575-19581 ◽  
Author(s):  
G. Hauffman ◽  
A. Vlad ◽  
T. Janoschka ◽  
U. S. Schubert ◽  
J.-F. Gohy
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Block Copolymer ◽  
Diblock Copolymers ◽  
Organic Radical ◽  
Nanostructured Thin Film ◽  
Self Assembled

Nanostructured thin film organic radical cathodes have been prepared from poly(styrene)-block-poly(2,2,6,6-tetramethylpiperidinyloxy-4-yl methacrylate) diblock copolymers.

Vertical Conducting Nanodomains Self-Assembled from Poly(3-hexyl thiophene)-Based Diblock Copolymer Thin Films

2011 ◽  
Vol 115 (10) ◽  
pp. 4228-4234 ◽  
Author(s):  
Yun Jae Lee ◽  
Se Hyun Kim ◽  
Hoichang Yang ◽  
Mi Jang ◽  
Seung Sang Hwang ◽  
...  
Keyword(s):  
Thin Films ◽  
Diblock Copolymer ◽  
Self Assembled

Phase Coherence and Microphase Separation Transitions in Diblock Copolymer Thin Films

1999 ◽  
Vol 32 (15) ◽  
pp. 4832-4837 ◽  
Author(s):  
P. Mansky ◽  
O. K. C. Tsui ◽  
T. P. Russell ◽  
Y. Gallot
Keyword(s):  
Thin Films ◽  
Diblock Copolymer ◽  
Microphase Separation ◽  
Phase Coherence

Synthesis of Self-Assembled Metal-Oxide Nanostructures in a Diblock Copolymer Matrix and Integration onto Semiconductor Surfaces

2000 ◽  
Vol 642 ◽  
Author(s):  
Robert F. Mulligan ◽  
Agis A. Iliadis ◽  
U. Lee ◽  
Peter Kofinas
Keyword(s):  
Block Copolymer ◽  
Diblock Copolymer ◽  
Photoelectron Spectroscopy ◽  
Ring Opening ◽  
Diblock Copolymers ◽  
X Ray ◽  
Oxide Nanostructures ◽  
Metal Oxide Nanostructures ◽  
Self Assembled ◽  
Zno Nanoclusters

ABSTRACTThe synthesis of self-assembled ZnO nanostructures at room temperature using a microphase separated diblock copolymer as a template is reported. Poly(norbornene) / poly(norbornene-dicarboxylic acid) diblock copolymers were synthesized using Ring Opening Metathesis Polymerization (ROMP). The polymers were dissolved and the solutions were doped with ZnCl2. Films were formed from this solution, and subsequently reacted with NH4OH. This converted the ZnCl2 into ZnO contained within the microphase-separated nanodomains of the block copolymer. Fourier Transform Infrared Spectroscopy verified the association of the metal to the second block of the polymer, and X-ray Photoelectron Spectroscopy verified the conversion of the salt to ZnO nanoclusters. The development of such ZnO - block copolymer nanocomposites is targeting the functionalization of nanostructures into device technologies.

Silicon Nitride Optimisation for a-Si:H TFTs Used in Projection LC-TVs

1994 ◽  
Vol 345 ◽  
Author(s):  
I. D. French ◽  
C. J. Curling ◽  
A. L. Goodyear
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Electrical Performance ◽  
Storage Capacitor ◽  
Electrical Characteristics ◽  
Large Area ◽  
Step Coverage ◽  
Minimum Number ◽  
Physical Shape ◽  
Nitride Layers

AbstractMulti-layer devices based on thin films in Large Area Electronics have different intrinsic and extrinsic properties that must be optimised to produce the correct physical shape of the device, in addition to having acceptable electrical characteristics. For instance it is quite easyto produce individual layers optimised for electrical performance that will physically “pull off” underlying films, or result in poor step coverage. The factors that must be considered include mechanical stress, etching rates and profiles, thickness and stoichiometry uniformity, and thermal budgets, as well as electrical characteristics. This paper gives an example of silicon nitride optimisation for use in a-Si:H TFT projection displays. Three different silicon nitride layers were included to give a storage capacitor, together with controlled etch profiles for step coverage. The layers were optimised with respect to several different parameters in the minimum number of depositions by the use of experimental design techniques.

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