High-Resolution Transmission Electron Microscope Analysis of Tungsten Carbide Thin Films

1998 ◽  
Vol 520 ◽  
Author(s):  
Wentao Qin ◽  
W. Shih ◽  
J. Lib ◽  
W. James ◽  
H. Siriwardaneane ◽  
...  

ABSTRACTElectron diffraction patterns and high-resolution transmission electron microscope (HREM) images show that the dominant phase in tungsten carbide thin films grown by plasma enhanced chemical vapor deposition is WC(1−x). The f.c.c crystal structure and the unit cell size of WC(1−x) have been determined via electron powder diffraction. The two largest and most dominant spacings in HREM images are the {111} and {002} spacings of WC(1−x). Cross lattice fringes along the two most densely populated zones of WC(1−x) are seen. The sizes and aspect ratios of nano-crystals have been measured from HREM images. Stereo analysis of individual nano-crystals has been done. Confirmation of the 3-D structure of WC(1−x) via spacings larger than 0.15 nm will require a tilt larger than 35° between images.

Author(s):  
J.C. Barry ◽  
R.S. Timsit ◽  
D. Landheer

Tantalum-aluminium thin films have assumed considerable technological importance since the discovery in the late 1960's that the films are useful in the fabrication of thin film resistors and capacitors. It is generally claimed that these films, when prepared by co-sputtering Ta and Al, are amorphous over a range of Ta concentrations extending approximately from 15 to 75 at%, and are crystalline beyond this range. Diffuse electron diffraction patterns and ‘mottle pattern’ transmission electron micrographs are typical characteristics of the amorphous phase. In this present study we have attempted to identify any atomic short range order in the amorphous Ta-Al films and to follow the changes in this order as the Ta concentration increases across the amorphous/crystalline transition. The co-sputtered Ta-Al films of ≈100A thickness were examined in a high resolution 4000EX electron microscope (top entry, ±15°(x,y) tilt, Cs = 1.0mm ) at 400kV.


2013 ◽  
Vol 19 (3) ◽  
pp. 693-697 ◽  
Author(s):  
M. Galceran ◽  
A. Albou ◽  
K. Renard ◽  
M. Coulombier ◽  
P.J. Jacques ◽  
...  

AbstractA new automated crystallographic orientation mapping tool in a transmission electron microscope technique, which is based on pattern matching between every acquired electron diffraction pattern and precalculated templates, has been used for the microstructural characterization of nondeformed and deformed aluminum thin films and twinning-induced plasticity steels. The increased spatial resolution and the use of electron diffraction patterns rather than Kikuchi lines make this tool very appropriate to characterize fine grained and deformed microstructures.


2000 ◽  
Vol 618 ◽  
Author(s):  
X. J. Guo ◽  
C.-Y. Wen ◽  
J. H. Huang ◽  
H. C. Shih

ABSTRACTWe proposed a concise and novel scheme to determine the crystallographic misorientation of heteroepitaxial structures. In addition to subtle high-resolution transmission electron microscope images, the information revealed from selected-area diffraction patterns at the interfaces offers another path to determine the angles of misorientations. The principle is to extract the basically three-dimensional misorientation information from a two-dimensional selected-area diffraction pattern through the employment of the Laue circle


Author(s):  
H. Tochigi ◽  
H. Uchida ◽  
S. Shirai ◽  
K. Akashi ◽  
D. J. Evins ◽  
...  

A New High Excitation Objective Lens (Second-Zone Objective Lens) was discussed at Twenty-Sixth Annual EMSA Meeting. A new commercially available Transmission Electron Microscope incorporating this new lens has been completed.Major advantages of the new instrument allow an extremely small beam to be produced on the specimen plane which minimizes specimen beam damages, reduces contamination and drift.


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