Laser Assisted Deposition of Carbon Nitride Coatings

1998 ◽  
Vol 555 ◽  
Author(s):  
Ashok Kumar ◽  
R. Alexandrescu
Keyword(s):  
Vapor Deposition ◽  
Carbon Nitride ◽  
Pyrolytic Graphite ◽  
Pulsed Laser ◽  
Chemical Vapor ◽  
Nitrogen Atmosphere ◽  
Laser Deposition ◽  
Laser Chemical Vapor Deposition ◽  
Graphite Target ◽  
Nitride Coatings

AbstractWe have investigated the growth of carbon nitride (CNx) coatings on various substrates using laser assisted methods such as pulsed laser deposition (PLD) and laser chemical vapor deposition (LCVD). It has been shown that the both techniques produce good quality thin films of CNx. In PLD, a laser beam (λ= 248 nm) has been used to ablate the pyrolytic graphite target in nitrogen atmosphere, where as CO2 laser was used to irradiate carbon-nitrogen containing mixtures such as C2H2/N20/NH3 in LCVD method. A comparative analysis will be presented in terms of structural properties of CNx films prepared by both techniques.

Deposition and Characterization of Carbon Nitride Films by Laser Processed Methods

1998 ◽  
Vol 526 ◽  
Author(s):  
Ashok Kumar ◽  
R. Alexandrescu ◽  
Michael A. George
Keyword(s):  
Thin Films ◽  
Comparative Analysis ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Carbon Nitride ◽  
Pyrolytic Graphite ◽  
Chemical Vapor ◽  
Nitrogen Atmosphere ◽  
Graphite Target

AbstractLaser assisted methods such as laser physical vapor deposition (LPVD) and laser induced chemical vapor deposition (LCVD) have been utilized to grow carbon nitride (CNx) films on various substrates. It has been shown that the both techniques produce good quality thin films of CNx. In LPVD, a laser beam (λ= 248 nm) has been used to ablate the pyrolytic graphite target in nitrogen atmosphere, where as CO2 laser was to irradiate carbon-nitrogen containing mixtures such as C2H2/N2O/NH3 in LCVD method. A comparative analysis will be presented in terms of structural properties of CNx films prepared by both techniques.

Fractal growth mechanism of sp3-bonded 5H-BN microcones by plasma-assisted pulsed-laser chemical vapor deposition

2006 ◽  
Vol 125 (8) ◽  
pp. 084701 ◽  
Author(s):  
Shojiro Komatsu ◽  
Daisuke Kazami ◽  
Hironori Tanaka ◽  
Yusuke Moriyoshi ◽  
Masaharu Shiratani ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Growth Mechanism ◽  
Vapor Deposition ◽  
Pulsed Laser ◽  
Chemical Vapor ◽  
Laser Chemical Vapor Deposition ◽  
Fractal Growth

Properties of TiAl/TiAlN/TiAlCN Films Deposited by Arc Ion Plating on GCr15 Rings

2014 ◽  
Vol 789 ◽  
pp. 449-454 ◽  
Author(s):  
Li Jun Yang ◽  
Ze Hui Zhang ◽  
Xin An Dang ◽  
Lin Li
Keyword(s):  
Wear Resistance ◽  
Vapor Deposition ◽  
Pulsed Laser ◽  
Chemical Vapor ◽  
Laser Deposition ◽  
Vacuum Arc ◽  
Large Area ◽  
Arc Ion Plating ◽  
Ion Plating ◽  
Tin Film

Ring is one of the major textile spinning machine consumable part, it has an important influence on yarn quality and cost. Ring of domestic cotton spinning enterprises generally has poor hardness, bad accuracy, not durable and difficult to guarantee the quality of the yarn, foreign ring has excellent performance, but it is too expensive, so it is difficult to widely used in China[1]. Vacuum arc ion plating technology has a wide range of applications in the aerospace, automobile, mold, tool, electronics and other fields [2-3]. TiN film which is prepared by arc ion plating technology has been widely used because of the TiN film has poor oxidation resistance and wear resistance at high temperatures, so the ternary films are developed on TiN film, such as TiAlN [4], TiCN etc. Traveller circle in the ring on the slide to produce large amounts of heat, it makes the ring surface temperature reach 400°C. When higher than 400°C, the TiCN film failure, therefore, ring should not be plated on the TiCN films. While TiAlN film oxidation temperature reaches 800°C. In HSS twist drill, depositing of TiAlN film can improve the service life more than four times [5]. Studies [6-8] have found that using pulsed laser deposition and chemical vapor deposition technique to prepare TiAlCN film, its wear resistance, high temperature stability is better. Pulsed laser deposition is mainly used in laboratory research. It is difficult to deposit a large area uniform film. Chemical vapor deposition of deposition rate is less than the arc ion plating, and produces lots of waste gas, leading to the environment is polluted. Arc ion plating technology can deposit the uniform films of large area with high deposition rate and deposition with no environmental pollution, therefore, this study, by means of vacuum arc ion plating technology to prepare high-precision, long-life and low-cost domestic cotton spinning ring. In order to obtain the best film process parameters, the performance of film is investigated at different bias and arc current.

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