Relation Between Macro- and Microstress in Thin Metallic Layers

1999 ◽  
Vol 594 ◽  
Author(s):  
Léon J. Seijbel ◽  
Rob Delhez
Keyword(s):  
Dislocation Density ◽  
Grain Growth ◽  
Elastic Constants ◽  
Elastic Interaction ◽  
Growth Stress ◽  
X Ray Diffraction ◽  
X Ray ◽  
Nickel Films ◽  
Thin Nickel ◽  
Annealing Experiments

AbstractX-ray diffraction has been used to measure the stress in thin nickel films. In addition to the stress value, information is obtained about the elastic interaction between grains. Various models exist to calculate the stress from the strain. A model that uses the mechanical elastic constants has been used. From this model it can be concluded that the model by Hill is applicable for the layers analyzed. Annealing experiments between 300 and 500 K show that the initially present growth stress reduces to zero at 500 K. The microstrain inside the grains is obtained from the broadening of the diffraction lines measured. During annealing the diffraction lines narrow. This is caused by two effects: grain growth and reduction of the dislocation density.

Dependence of Hysteresis Loops on Thickness of Thin Nickel Films Prepared by RF Sputtering

2011 ◽  
Vol 335-336 ◽  
pp. 1443-1447 ◽  
Author(s):  
Watcharee Rattanasakulthong ◽  
Pichai Sirisangsawang ◽  
Supree Pinitsoontorn ◽  
Chitnarong Sirisathitkul
Keyword(s):  
Rf Sputtering ◽  
Hysteresis Loops ◽  
Perpendicular Anisotropy ◽  
X Ray Diffraction ◽  
Saturation Field ◽  
X Ray ◽  
Nickel Films ◽  
Glass Substrates ◽  
Plane Anisotropy ◽  
Thin Nickel

Nickel films of varying thicknesses between 70 and 300 nm were deposited on glass substrates by RF sputtering and their broad (111) FCC peaks were identified by X-ray diffraction. The surface roughness and sub-micron grains were revealed by scanning electron microscopy. According to vibrating sample magnetometry, the films showed hysteresis loops with comparable coercive field and saturation field for the in-plane and perpendicular magnetizations. The increase in thickness substantially increased the magnetization and the squareness of the Ni films. The thickness can be classified into 2 regimes by the variation of squareness. The films are thinner than 200 nm showed the in-plane anisotropy whereas the perpendicular anisotropy was developed in the case of the thickness above 200 nm.

Preparation and Characterisation of TiO2 Thick Films Fabricated by Electrophoretic Deposition

2007 ◽  
Vol 561-565 ◽  
pp. 2163-2166 ◽  
Author(s):  
H.Z. Abdullah ◽  
Charles C. Sorrell
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Grain Growth ◽  
Electrophoretic Deposition ◽  
Defect Formation ◽  
Titanium Foil ◽  
X Ray Diffraction ◽  
Voltage Range ◽  
X Ray ◽  
Scanning Electron

Rutile nano-powders were suspended in a solution of acetylacetone and iodine. The suspensions were electrophoretically deposited on titanium foil at a voltage range of 5-30 V over times of 5-120 s. The dried tapes then were sintered at 800°C for 2 h in flowing argon. Both the green and fired tapes were examined by field emission scanning electron microscopy, optical microscopy, X-ray diffraction, and Raman microspectroscopy. The thickness of the films depended on the voltage and the time of deposition. The sintered microstructures depended significantly on the thickness of the film, which was a function the proximity to the Ti/TiO2 interface. The interface is critical to the microstructure because it acts as the source of defect formation, which enhances sintering, grain growth, and grain facetting.

Microstructure Evolution of a Fine Grain Al-50wt%Si Alloy Fabricated by High Energy Milling

2011 ◽  
Vol 479 ◽  
pp. 54-61 ◽  
Author(s):  
Fei Wang ◽  
Ya Ping Wang
Keyword(s):  
Grain Growth ◽  
Microstructure Evolution ◽  
Room Temperature ◽  
Milling Time ◽  
High Energy ◽  
X Ray Diffraction ◽  
Scanning Calorimetry ◽  
Laser Method ◽  
X Ray ◽  
Fine Grain

Microstructure evolution of high energy milled Al-50wt%Si alloy during heat treatment at different temperature was studied. Scanning electron microscope (SEM) and X-ray diffraction (XRD) results show that the size of the alloy powders decreased with increasing milling time. The observable coarsening of Si particles was not seen below 730°C in the high energy milled alloy, whereas, for the alloy prepared by mixed Al and Si powders, the grain growth occurred at 660°C. The activation energy for the grain growth of Si particles in the high energy milled alloy was determined as about 244 kJ/mol by the differential scanning calorimetry (DSC) data analysis. The size of Si particles in the hot pressed Al-50wt%Si alloy prepared by high energy milled powders was 5-30 m at 700°C, which was significantly reduced compared to that of the original Si powders. Thermal diffusivity of the hot pressed Al-50wt%Si alloy was 55 mm2/s at room temperature which was obtained by laser method.

Evaluation of threading dislocation density of strained Ge epitaxial layer by high resolution x-ray diffraction

2017 ◽  
Vol 26 (12) ◽  
pp. 127309 ◽  
Author(s):  
Yuan-Hao Miao ◽  
Hui-Yong Hu ◽  
Xin Li ◽  
Jian-Jun Song ◽  
Rong-Xi Xuan ◽  
...  
Keyword(s):  
High Resolution ◽  
Dislocation Density ◽  
Epitaxial Layer ◽  
Threading Dislocation ◽  
X Ray Diffraction ◽  
X Ray ◽  
Threading Dislocation Density

Determination of the Elastic Constants of Pentaerythritol by X-Ray Diffraction Method

1962 ◽  
Vol 17 (11) ◽  
pp. 1767-1770 ◽  
Author(s):  
R. C. Srivastava ◽  
S. C. Chakraborty
Keyword(s):  
Elastic Constants ◽  
Diffraction Method ◽  
X Ray Diffraction ◽  
X Ray

Effects of Surface Energy on the Microstructures of Thin Sb Films

1990 ◽  
Vol 202 ◽  
Author(s):  
L. H. Chou ◽  
M. C. Kuo
Keyword(s):  
Electron Microscopy ◽  
Surface Energy ◽  
Grain Growth ◽  
Grain Orientation ◽  
Thermal Evaporation ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates ◽  
Transmission Electron ◽  
Diffraction Peaks

ABSTRACTThin Sb films have been prepared on glass substrates by rapid thermal evaporation. Films with thicknesses varied from 260 Å to 1300Å were used for the study. X-ray diffraction data showed that for films deposited at room substrate temperature, an almost random grain orientation was observed for films of 1300 Å thick and a tendency for preferred grain orientation was observed as films got thinner. For films of 260 Å thick, only two x-ray diffraction peaks--(003) and (006) were observed. After thermal annealing, secondary grains grew to show preferred orientation in all the films. This phenomenon was explained by surface-energy-driven secondary grain growth. This paper reports the effects of annealing time and film thickness on the secondary grain growth and the evolution of thin Sb film microstmctures. Transmission electron microscopy (TEM) and x-ray diffraction were used to characterize the films.

Structure, Elastic Constants and XRD Spectra of Extended Solids under High Pressure

MRS Advances ◽  
2018 ◽  
Vol 3 (8-9) ◽  
pp. 499-504 ◽  
Author(s):  
I.G. Batyrev ◽  
S.P. Coleman ◽  
J.A. Ciezak-Jenkins ◽  
E. Stavrou ◽  
J.M. Zaug
Keyword(s):  
Elastic Constants ◽  
Energetic Materials ◽  
Density Functional ◽  
Three Dimensional ◽  
Peak Position ◽  
X Ray Diffraction ◽  
Covalent Bonds ◽  
X Ray ◽  
Extended Solids ◽  
Xrd Patterns

ABSTRACTWe present results of evolutionary simulations based on density functional calculations of a potentially new type of energetic materials called extended solids: P-N and N-H. High-density structures with covalent bonds generated using variable and fixed concentration methods were analysed in terms of thermo-dynamical stability and agreement with experimental X-ray diffraction (XRD) spectra. X-ray diffraction spectra were calculated using a virtual diffraction algorithm that computes kinematic diffraction intensity in three-dimensional reciprocal space before being reduced to a two-theta line profile. Calculated XRD patterns were used to search for the structure of extended solids present at experimental pressures by optimizing data according to experimental XRD peak position, peak intensity and theoretically calculated enthalpy. Elastic constants has been calculated for thermodynamically stable structures of P-N system.

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