Red Emitting Electroluminescent Devices Using Ga2O3 Phosphor Thin Films Prepared by Sol-Gel Process

2001 ◽  
Vol 667 ◽  
Author(s):  
Tadatsugu Minami ◽  
Tetsuya Shirai ◽  
Toshihiro Miyata
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Sol Gel ◽  
Deposition Method ◽  
Sinusoidal Wave ◽  
High Luminance ◽  
Insulating Layer ◽  
Electroluminescent Devices ◽  
Sol Gel Process ◽  
Dopant Source

ABSTRACTHigh-luminance red-emitting thin-film electroluminescent (TFEL) devices have been developed using Ga2O3 phosphor thin films prepared by a sol-gel deposition method. Single-insulating-layer-type TFEL devices were fabricated by depositing a Cr- or a Eu-activated Ga2O3 phosphor thin film onto a thick BaTiO3 ceramic sheet insulator. The Ga2O3:Cr or Ga2O3:Eu thin-film emitting layer was prepared by a sol-gel process using gallium acethylacetonate (Ga(C5H7O2)3) as the Ga source with Cr(C5H7O2)3 or EuC13 as the dopant source, respectively. A high red luminance of 622 cd/m2 was obtained for a Ga2O3:Cr TFEL device driven by a sinusoidal wave voltage at 1 kHz.

Electroluminescent Oxide Phosphor Thin Films Prepared by a Sol-gel Process

2000 ◽  
Vol 621 ◽  
Author(s):  
Tadatsugu Minami ◽  
Toshihiro Miyata ◽  
Tetsuya Shirai ◽  
Toshikuni Nakatani
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Sol Gel ◽  
High Luminance ◽  
Sol Gel Process

ABSTRACTGa2O3:Mn and (Ga2O3-SnO2):Eu thin films have been prepared by a sol-gel process. High luminance emissions were obtained in TFEL devices: green using a Ga2O3:Mn and red using a Ga2O3:Eu or a SnO2:Eu thin-film emitting layer. These sol-gel prepared devices were produced without using any vacuum processes and always exhibited higher luminances than equivalent devices prepared by r.f. magnetron sputtering: 40, 309 and above 1000 cd/m2 using SnO2:Eu, Ga2O3:Eu and Ga2O3:Mn phosphor thin films, respectively, in TFEL devices prepared by the sol-gel process and driven at 1kHz.

Epitaxial Growth of Sr0.3Ba0.7Nb2O6 Thin Films Prepared by Sol-Gel Process

1999 ◽  
Vol 606 ◽  
Author(s):  
Keishi Nishio ◽  
Jirawat Thongrueng ◽  
Yuichi Watanabe ◽  
Toshio Tsuchiya
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Epitaxial Growth ◽  
Raw Materials ◽  
Substrate Surface ◽  
Sol Gel ◽  
Tungsten Bronze ◽  
Monomethyl Ether ◽  
Tetragonal Tungsten Bronze ◽  
Sol Gel Process

AbstructWe succeeded in the preparation of strontium-barium niobate (Sr0.3Ba0.7Nb2O6 : SBN30)that have a tetragonal tungsten bronze type structure thin films on SrTiO3 (100), STO, or La doped SrTiO3 (100), LSTO, single crystal substrates by a spin coating process. LSTO substrate can be used for electrode. A homogeneous coating solution was prepared with Sr and Ba acetates and Nb(OEt)5 as raw materials, and acetic acid and diethylene glycol monomethyl ether as solvents. The coating thin films were sintered at temperature from 700 to 1000°C for 10 min in air. It was confirmed that the thin films on STO substrate sintered above 700°C were in the epitaxial growth because the 16 diffraction spots were observed on the pole figure using (121) reflection. The <130> and <310> direction of the thin film on STO were oriented with the c-axis in parallel to the substrate surface. However, the diffraction spots of thin film on LSTO substrate sintered at 700°C were corresponds to the expected pattern for (110).

Synthesis and Characterizations of Strontium Substituted Hydroxyapatite Thin Films

2010 ◽  
Vol 93-94 ◽  
pp. 231-234
Author(s):  
B. Hongthong ◽  
Satreerat K. Hodak ◽  
Sukkaneste Tungasmita
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Chemical Composition ◽  
Spin Coating ◽  
Phase Structure ◽  
Sol Gel ◽  
Cross Linking ◽  
X Ray Diffraction ◽  
X Ray ◽  
Sol Gel Process

Strontium substituted hydroxyapatite(SrHAp) were fabricated both in the form of powder as reference and thin film by using inorganic precursor reaction. The sol-gel process has been used for the deposition of SrHAp layer on stainless steal 316L substrate by spin coating technique, after that the films were annealed in air at various temperatures. The chemical composition of SrHAp is represented (SrxCa1-x)5(PO4)3OH, where x is equal to 0, 0.5 and 1.0. Investigations of the phase structure of SrHAp were carried out by using X-ray diffraction technique (XRD). The results showed that strontium is incorporated into hydroxyapatite where its substitution for calcium increases in the lattice parameters, and Sr3(PO4)2 can be detected at 900°C. The SEM micrographs showed that SrHAp films exhibited porous structure before develop to a cross-linking structure.

Preparation and Characterization of Novel Lithium Tantalate Target

2011 ◽  
Vol 117-119 ◽  
pp. 840-844
Author(s):  
Xu Yong Wu ◽  
De Yin Zhang ◽  
Kun Li
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
High Temperature ◽  
Ion Beam ◽  
Sol Gel ◽  
Lithium Tantalate ◽  
Lithium Oxide ◽  
The Novel ◽  
Sol Gel Process

The novel lithium enriched lithium tantalate (LiTaO3) targets were papered by employing the sol-gel process and the high temperature sintered process. The sol of LiTaO3 was firstly prepared through reacting lithium ethoxide with tantalum ethoxide. The LiTaO3 powder was fabricated by presintered LiTaO3 dry gel 4 hour, at 800°C. The 11cm13cm1cm lithium enriched LiTaO3 target samples were prepared by sintered the pressed LiTaO3 powder billet 4 hour in the 850°C muffle furnace. The density of the 5% overdose lithium enriched LiTaO3 target is measured 5.96g/cm3. The XRD measured results show that the ion beam enhanced deposited (IBED) thin film samples using the prepared 5% overdose lithium enriched LiTaO3 target have the polycrystal structure of LiTaO3, but there has remanent Ta2O5 existed in the IBED thin film samples. The main reason for the remanent Ta2O5 growth was due to the stoichiometric proportion mismatch between Li and Ta in the IBED thin film samples during the high temperature annealed process, which caused the lithium oxide evaporation loss from the IBED thin film samples and made the proportion of Ta2O5 increase. After multipule repeated target prepared experiments, the 8.76% overdose lithium enriched LiTaO3 target is suitable for fabricating the 550°C annealed IBED LiTaO3 thin film. After the repeated process experiments, the suitable deposited process parameters of the IBED-C600M instrument for the 8.76% overdose lithium enriched LiTaO3 target were obtained. The SEM micrographs of the 550°C annealed IBED LiTaO3 thin films prepared by the 8.76% overdose lithium enriched LiTaO3 target reveal the prepared thin films are uniform, smooth and crack-free on the surface, and the perfect adhesion between the thin film and the substrate. The successfully fabricated LiTaO3 thin film samples verify the prepared processes of novel LiTaO3 sputtering target are effective.

Preparation and Properties of Multiferroic La-Doped BiFeO3 Thin Film

2012 ◽  
Vol 486 ◽  
pp. 417-421 ◽  
Author(s):  
Xiao Yan Zhang ◽  
Xi Wei Qi ◽  
Jian Quan Qi ◽  
Xuan Wang
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Indium Tin Oxide ◽  
Remanent Polarization ◽  
Sol Gel ◽  
Secondary Phases ◽  
Glass Substrates ◽  
Ito Glass ◽  
Sol Gel Process ◽  
La Doped

Multiferroic La-doped Bi1-xLaxFeO3 thin films were prepared on conductive indium tin oxide (ITO)/glass substrates through a simple sol-gel process. The crystal structure of La-doped Bi1-xLaxFeO3 thin films annealed at different temperature was determined to be rhombohedral of R3m space and free of secondary phases. The grain size of La-doped BiFeO3 thin films tends to become larger and the grain boundary is gradually ambiguous compared to pure BiFeO3. The double remanent polarization 2Pr of Bi0.9La0.1FeO3 thin film annealed at 500°C is 6.66 µC/cm2, which is slightly improved than that of pure BiFeO3 thin film. With the increase of La-doping levels, the dielectric constant is increased and the dielectric loss is obviously decreased.

Preparation of Lithium Ion Conductive Li4.2Al0.2Si0.8O4 Thin Films Using Sol-Gel Process

2006 ◽  
Vol 301 ◽  
pp. 91-94
Author(s):  
Yasuhiro Isshiki ◽  
Kaoru Dokko ◽  
Jun Ichi Hamagami ◽  
Takashi Takei ◽  
Kiyoshi Kanamura
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
High Temperatures ◽  
Room Temperature ◽  
Sol Gel ◽  
Lithium Ion ◽  
Heat Treated ◽  
Sol Gel Process ◽  
Li Ion ◽  
Spin Coater

Thin films of lithium ion conductive ceramic Li4+xAlxSi1-xO4 were fabricated on Au substrate using sol-gel process. The sol of Li-Al-Si-O was spread on Au substrate using a spin coater, and it was gelated at room temperature. The gel was calcinated at 400 °C and heat-treated at high temperatures between 500 °C and 800 °C in air. The addition of poly(vinylpyrrolidone) (PVP) was effective in stabilizing the sol. Furthermore, the morphology of the obtained thin film was changed by the PVP additive. Li4+xAlxSi1-xO4 thin film prepared at 800 °C exhibited a Li+ ion conductivity of 10-8 S cm-1 at room temperature.

THICKNESS-DEPENDENT MICROSTRUCTURES AND ELECTRICAL PROPERTIES OF LiTaO3 THIN FILMS PREPARED BY A Sol-Gel PROCESS

2007 ◽  
Vol 21 (18n19) ◽  
pp. 3404-3411
Author(s):  
M. C. KAO ◽  
H. Z. CHEN ◽  
S. L. YOUNG ◽  
C. C. LIN ◽  
C. C. YU
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Remanent Polarization ◽  
Ferroelectric Properties ◽  
Sol Gel ◽  
Relative Dielectric Constant ◽  
Coating Technology ◽  
Si Substrates ◽  
Sol Gel Process

LiTaO 3 thin films were deposited on Pt / Ti / SiO 2/ Si substrates by means of a sol-gel spin-coating technology and rapid thermal annealing (RTA). The influence of various annealing treatments on the characteristics of the thin films were studied by varying the single-annealed-layer thickness (50 ~ 200 nm ) and heating temperatures (500 ~ 800° C ) of the samples. Experimental results reveal that the single-annealed-layer strongly influences grain size, dielectricity and ferroelectricity of LiTaO 3 thin films. The grain size of LiTaO 3 thin film decreases slightly with increasing thickness of the single-annealed-layer, and highly c-axis orientated LiTaO 3 films can be obtained for a single-annealed-layer of 50 nm. When the thickness of the single-annealed-layer was increased from 50 to 200 nm, the relative dielectric constant of LiTaO 3 thin film decreased from 65 to 35, but the dielectric loss factor (tanδ) was increased. The LiTaO 3 films with the single-annealed-layer of 50 nm showed excellent ferroelectric properties in terms of a remanent polarization ( P r) of 12.3 μ C /cm2 (Ec ∼ 60 kV/cm), and a low current density of 5.2×l0-8 A /cm2 at 20 kV/cm.

Fabrication of oxide phosphor thin film electroluminescent devices using a sol-gel process

2001 ◽  
Author(s):  
Tadatsugu Minami ◽  
Tetsuya Shirai ◽  
Toshihiro Miyata
Keyword(s):  
Thin Film ◽  
Sol Gel ◽  
Electroluminescent Devices ◽  
Sol Gel Process

Electroluminescent Devices with Ga2O3:Mn Thin-Film Emitting Layer Prepared by Sol-Gel Process

2000 ◽  
Vol 39 (Part 2, No. 6A) ◽  
pp. L524-L526 ◽  
Author(s):  
Tadatsugu Minami ◽  
Tetsuya Shirai ◽  
Toshikuni Nakatani ◽  
Toshihiro Miyata
Keyword(s):  
Thin Film ◽  
Sol Gel ◽  
Electroluminescent Devices ◽  
Sol Gel Process
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