Mechanical Testing of Free-Standing Thin Films

2001 ◽  
Vol 687 ◽  
Author(s):  
W. N. Sharpe ◽  
K. J. Hemker
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Silicon Carbide ◽  
Silicon Nitride ◽  
Surface Coatings ◽  
Free Standing ◽  
Coating Materials ◽  
Strain Measurements ◽  
Bond Coating ◽  
And Diffusion

AbstractAn overview is given of methods for testing thin-film tensile specimens of either MEMS materials or surface coatings. MEMS specimens are deposited in a final shape and need only to be released for testing, while specimens of coating materials must be extracted. Very brief descriptions of the specimen designs, force application approaches, and strain measurements are given along with a limited number of references. Representative stress-strain curves for polysilicon, silicon nitride, silicon carbide, electroplated nickel and diffusion aluminide bond coating are presented. Results at high temperatures are presented for the latter two materials.

Mechanical Testing of Free-Standing Thin Films

2001 ◽  
Vol 697 ◽  
Author(s):  
W. N. Sharpe ◽  
K. J. Hemker
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Silicon Carbide ◽  
Silicon Nitride ◽  
Surface Coatings ◽  
Free Standing ◽  
Coating Materials ◽  
Strain Measurements ◽  
Bond Coating ◽  
And Diffusion

AbstractAn overview is given of methods for testing thin-film tensile specimens of either MEMS materials or surface coatings. MEMS specimens are deposited in a final shape and need only to be released for testing, while specimens of coating materials must be extracted. Very brief descriptions of the specimen designs, force application approaches, and strain measurements are given along with a limited number of references. Representative stress-strain curves for polysilicon, silicon nitride, silicon carbide, electroplated nickel and diffusion aluminide bond coating are presented. Results at high temperatures are presented for the latter two materials.

Thermodynamics and Microstructure Development in the Thin Film Reaction of Aluminum on Silicon Carbide

1995 ◽  
Vol 403 ◽  
Author(s):  
T. S. Hayes ◽  
F. T. Ray ◽  
K. P. Trumble ◽  
E. P. Kvam
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Silicon Carbide ◽  
Ohmic Contacts ◽  
Microstructure Development ◽  
P Type ◽  
Microstructural Studies

AbstractA refined thernodynamic analysis of the reaction between molen Al and SiC is presented. The calculations indicate much higher Si concentrations for saturation with respect to AkC 3 formation than previously reported. Preliminary microstructural studies confirm the formation of interfacial A14C3 for pure Al thin films on SiC reacted at 9000C. The implications of the calculations and experimental observations for the production of ohmic contacts to p-type SiC are discussed.

The Elastic Moduli of Silver Thin Films Measured with a New Microtensile Tester

1991 ◽  
Vol 239 ◽  
Author(s):  
J. Ruud ◽  
D. Josell ◽  
A. L. Greer ◽  
F. Spaepen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Diffraction Grating ◽  
Strain Measurement ◽  
Elastic Moduli ◽  
Two Dimensional ◽  
Bulk Crystals ◽  
Free Standing ◽  
Tensile Direction ◽  
Silver Thin Films

ABSTRACTA new design for a thin film microtensile tester is presented. The strain is measured directly on the free-standing thin film from the displacement of laser spots diffracted from a thin grating applied to its surface by photolithography. The diffraction grating is two-dimensional, allowing strain measurement both along and transverse to the tensile direction. In principle, both Young's modulus and Poisson's ratio of a thin film can be determined. Ag thin films with strong <111> texture were tested. The measured Young moduli agreed with those measured on bulk crystals, but the measured Poisson ratios were low, most likely due to slight transverse folding of the film that developed during the test.

scholarly journals The Study of Optical and Electrical Properties of Nanostructured Silicon Carbide Thin Films Grown by Pulsed-Laser Deposition

2021 ◽  
Vol 9 (2) ◽  
pp. 46-50
Author(s):  
Muhanad A. Ahmed ◽  
Mohammed F. Mohammed Sabri ◽  
Wathiq R. Abed
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Silicon Carbide ◽  
Absorption Coefficient ◽  
Pulsed Laser Deposition ◽  
Extinction Coefficient ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Cutoff Wavelength ◽  
Nanostructured Silicon

In this paper, nanostructured silicon carbide (SiC) thin films are deposited onto glass substrate using pulsed laser deposition technique. Electrical and optical characterizations such as conductivity, resistivity, transmission, Seeback effect, absorption, absorption coefficient, energy band gap, and extinction coefficient as a function of photon energy, and the effect of thin films thickness on transmission are carried out to characterize the prepared samples. Results showed that the prepared SiC thin film is an n-type semiconductor with an indirect bandgap of ~3 eV, 448 nm cutoff wavelength, 3.4395 × 104 cm−1 absorption coefficient and 0.154 extinction coefficient. The surface morphology of the SiC thin films is studied using scanning electron microscope at a substrate temperature of 400 °C and it is found that the grain size of the prepared SiC thin film is about 30 nm. As such, the nano thin films optical and structural characteristics enable the films to be used as gases sensors in many optoelectronic devices such as the environment and ultraviolet photodiode.

Characterisation of silicon carbide and silicon nitride thin films and Si3N4/SiC multilayers

2002 ◽  
Vol 11 (3-6) ◽  
pp. 1248-1253 ◽  
Author(s):  
M. Lattemann ◽  
S. Ulrich ◽  
H. Holleck ◽  
M. Stüber ◽  
H. Leiste
Keyword(s):  
Thin Films ◽  
Silicon Carbide ◽  
Silicon Nitride

Free-standing membranes from the chemical exfoliation of mesoporous amorphous titania thin film

2021 ◽  
Author(s):  
Victor Malgras ◽  
Joel Henzie ◽  
Yoshitaka Matsushita ◽  
Yoshiyuki Sugahara ◽  
Yusuke Yamauchi
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Free Standing ◽  
Amorphous Titania ◽  
Titania Thin Film ◽  
Chemical Exfoliation

Thin films are typically bound to their substrate, limiting their integration on rough, porous, curved or chemically/thermally sensitive surfaces. Instead of employing tedious and expensive back-etching processes, certain chemical routes...

Dynamics of Thin Film NiTi Cantilevers on Si

1993 ◽  
Vol 311 ◽  
Author(s):  
A.Peter Jardine ◽  
Peter G. Mercado
Keyword(s):  
Thin Film ◽  
Mechanical Properties ◽  
Response Times ◽  
Bulk Material ◽  
Fast Response ◽  
Free Standing ◽  
Promising Candidate ◽  
Strain Measurements ◽  
Micro Actuators ◽  
Cycling Time

ABSTRACTAlthough the thermo-mechanical properties of NiTi are well known for bulk material, its deposition and utilization as a thin film are still in their earliest stages of research. The deposition of thin-films of Shape Memory Effect NiTi onto Si(100) wafers offers several advantages over bulk NiTi, including fast response times and comparatively large transformation forces. This has made it a promising candidate material as micro-actuators for Micro-Electro-Mechanical (MEMS) systems as well as for strain measurements. The cycling time for actuation was measured for a 20 μm free standing NiTi thin film cantilever. It was demonstrated that cycling frequencies of up to 50 Hz are achievable.

Monolayer graphene-supported free-standing PS-b-PMMA thin film with perpendicularly orientated microdomains

RSC Advances ◽  
2014 ◽  
Vol 4 (109) ◽  
pp. 63941-63945 ◽  
Author(s):  
Mei-Ling Wu ◽  
Jing Li ◽  
Li-Jun Wan ◽  
Dong Wang
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Monolayer Graphene ◽  
Free Standing

A facile way to fabricate robust free-standing PS-b-PMMA thin films with perpendicularly orientated microdomains on monolayer graphene is reported.

scholarly journals Formation and Properties of Amorphous Multi-Component (CrFeMoNbZr)Ox Thin Films

Metals ◽  
2020 ◽  
Vol 10 (5) ◽  
pp. 599
Author(s):  
Xiaoyu Gu ◽  
Hengwei Luan ◽  
Xinglong Yang ◽  
Xinchao Wang ◽  
Kaixuan Fang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Corrosion Resistance ◽  
High Hardness ◽  
Oxide Phase ◽  
Dual Phase ◽  
Coating Materials ◽  
Amorphous Thin Film ◽  
Amorphous Structures ◽  
Superior Corrosion Resistance

In this work, a new multi-component (CrFeMoNbZr)Ox system was developed. The thin films presented dual-phase amorphous structures, comprising a dominant amorphous alloy phase and a small amount of an amorphous oxide phase. The thin films showed higher hardness and better corrosion resistance than a commercial Zr-based alloy. The combined properties of high hardness and superior corrosion-resistance make the amorphous thin film a candidate for coating materials on commercial Zr-based alloys for engineering applications.

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