Electrically Active Deep Levels in ScN
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AbstractWe report the electronic characterization of n-ScN in ScN-Si heterojunctions using Deep Level Transient Spectroscopy of electrically active deep levels. ScN material was grown by plasma assisted physical vapor deposition and by reactive sputtering on commercial p+ Si substrates. Deep level transient spectroscopy of the junction grown by plasma assisted physical vapor deposition shows the presence of an electronic trap with activation energy EC-ET= 0.51 eV. The trap has a higher concentration (1.2–1.6 1013cm−3) closer to the ScN/Si interface. Junctions grown by sputtering also have an electronic trap, situated at about EC-ET= 0.90 eV.
2008 ◽
Vol 28
(5-6)
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pp. 787-790
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2009 ◽
Vol 615-617
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pp. 381-384
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Keyword(s):
2008 ◽
Vol 19
(S1)
◽
pp. 281-284
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Keyword(s):
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