scholarly journals Pengaruh Personal Value Terhadap Entrepreneurship Intention

2020 ◽  
Vol 4 (3) ◽  
pp. 40-45
Author(s):  
Fitria Fii Silmi Kaaffah Kamilia ◽  
Hari Mulyadi ◽  
R Dian H Utama

Penelitian ini betujuan untuk menilai pengaruh dimensi personal value terhadap intensi berwirausaha siswa SMK Kiansantang. Rancangan penelitian ini menggunakan cross sectional melalui pendekatan explanatory survey. Pengumpulan data dari 75 orang responden siswa kelas 12 SMK Kiansantag menggunakan kuisioner. Analisis teknik yang digunakan adalah tabel frekuensi dan analisis jalur. Hasil perhiutngan dari personal value secara simultan berpengaruh positif terhadap intensi berwirausaha.  Hasil perhitungan secara parsial menunjukkan bahwa dimensi self-direction secara dominan mempengaruhi intensi berwirausaha.

2013 ◽  
Vol 19 (2) ◽  
pp. 91-100 ◽  
Author(s):  
Pilar Almansa ◽  
Olivia López-Martínez ◽  
Javier Corbalán ◽  
Rosa M. Limiñana-Gras

This article describes a study using a descriptive approach of cross-sectional correlation to explore the association between thinking styles and creativity in a group of nursing professionals and students. A thinking style is a characteristic way of thinking. The hypothesis was that the most creative subjects would present thinking styles that enhance and express their creativity. De la Torre and Violant (2006) argue that creativity is not only a personal value, insofar as it recognizes and stimulates the transforming potential of the individual, but is also an educational value because it generates abilities and attitudes toward improvement. The study results show that a legislative thinking style encourages innovation and creativity and should be encouraged both during education and training and in the professional domain.


PLoS ONE ◽  
2021 ◽  
Vol 16 (1) ◽  
pp. e0245276
Author(s):  
Patrick Nekula ◽  
Clemens Koob

Introduction The aging of staff and skill shortage are major challenges for social enterprises. Nurturing a workplace culture of health and fostering employee engagement could be starting points to combat these challenges. The associations between these two factors have received comparatively little attention from the scientific community, in particular with regard to social enterprises. Hence, this study aims to examine those associations, drawing on the job demands-resources theory and the social-ecological workplace culture of health model. It is hypothesized that employees’ self-rated health acts as a mediator in the relationship between culture of health and employee engagement and that health as personal value works as a moderator. Method The study used the Workplace Culture of Health scale to measure culture of health in social enterprises and UWES-9 to assess employee engagement. Data was collected administering a quantitative online survey among employees of social enterprises in Germany. The dataset for analyses comprised N = 172 employees in total. Data analyses included Pearson’s correlations, regression analysis, as well as mediation, moderation and moderated mediation analyses. Results Culture of health is a predictor of employee engagement in social enterprises. The analyses demonstrate a moderate association between culture of health and employee engagement. Indications were found that employees’ self-rated health acts as a mediator and that health as personal value acts as a moderator between culture of health and employee engagement in social enterprises. Discussion This study suggests that fostering a culture of health in social enterprises does not only have a positive effect on employee health, but also on employee engagement. This applies in particular when employees attribute great value to their health, which is to be expected even more in future. Hence, nurturing a culture of health becomes a pivotal management task in social enterprises. Moreover, a comprehensive assessment of the benefits of health promotion programs in social enterprises should not only consider their health-related outcomes, but also factor in their impact on employee engagement.


2020 ◽  
Vol 8 (1) ◽  
Author(s):  
Norito Kawakami ◽  
Kazuhiro Watanabe ◽  
Daisuke Nishi ◽  
Daisuke Takagi ◽  
Hideki Hashimoto ◽  
...  

Author(s):  
S.F. Stinson ◽  
J.C. Lilga ◽  
M.B. Sporn

Increased nuclear size, resulting in an increase in the relative proportion of nuclear to cytoplasmic sizes, is an important morphologic criterion for the evaluation of neoplastic and pre-neoplastic cells. This paper describes investigations into the suitability of automated image analysis for quantitating changes in nuclear and cytoplasmic cross-sectional areas in exfoliated cells from tracheas treated with carcinogen.Neoplastic and pre-neoplastic lesions were induced in the tracheas of Syrian hamsters with the carcinogen N-methyl-N-nitrosourea. Cytology samples were collected intra-tracheally with a specially designed catheter (1) and stained by a modified Papanicolaou technique. Three cytology specimens were selected from animals with normal tracheas, 3 from animals with dysplastic changes, and 3 from animals with epidermoid carcinoma. One hundred randomly selected cells on each slide were analyzed with a Bausch and Lomb Pattern Analysis System automated image analyzer.


Author(s):  
Henry I. Smith ◽  
D.C. Flanders

Scanning electron beam lithography has been used for a number of years to write submicrometer linewidth patterns in radiation sensitive films (resist films) on substrates. On semi-infinite substrates, electron backscattering severely limits the exposure latitude and control of cross-sectional profile for patterns having fundamental spatial frequencies below about 4000 Å(l),Recently, STEM'S have been used to write patterns with linewidths below 100 Å. To avoid the detrimental effects of electron backscattering however, the substrates had to be carbon foils about 100 Å thick (2,3). X-ray lithography using the very soft radiation in the range 10 - 50 Å avoids the problem of backscattering and thus permits one to replicate on semi-infinite substrates patterns with linewidths of the order of 1000 Å and less, and in addition provides means for controlling cross-sectional profiles. X-radiation in the range 4-10 Å on the other hand is appropriate for replicating patterns in the linewidth range above about 3000 Å, and thus is most appropriate for microelectronic applications (4 - 6).


Author(s):  
Michel Troyonal ◽  
Huei Pei Kuoal ◽  
Benjamin M. Siegelal

A field emission system for our experimental ultra high vacuum electron microscope has been designed, constructed and tested. The electron optical system is based on the prototype whose performance has already been reported. A cross-sectional schematic illustrating the field emission source, preaccelerator lens and accelerator is given in Fig. 1. This field emission system is designed to be used with an electron microscope operated at 100-150kV in the conventional transmission mode. The electron optical system used to control the imaging of the field emission beam on the specimen consists of a weak condenser lens and the pre-field of a strong objective lens. The pre-accelerator lens is an einzel lens and is operated together with the accelerator in the constant angular magnification mode (CAM).


Author(s):  
M.A. Parker ◽  
K.E. Johnson ◽  
C. Hwang ◽  
A. Bermea

We have reported the dependence of the magnetic and recording properties of CoPtCr recording media on the thickness of the Cr underlayer. It was inferred from XRD data that grain-to-grain epitaxy of the Cr with the CoPtCr was responsible for the interaction observed between these layers. However, no cross-sectional TEM (XTEM) work was performed to confirm this inference. In this paper, we report the application of new techniques for preparing XTEM specimens from actual magnetic recording disks, and for layer-by-layer micro-diffraction with an electron probe elongated parallel to the surface of the deposited structure which elucidate the effect of the crystallographic structure of the Cr on that of the CoPtCr.XTEM specimens were prepared from magnetic recording disks by modifying a technique used to prepare semiconductor specimens. After 3mm disks were prepared per the standard XTEM procedure, these disks were then lapped using a tripod polishing device. A grid with a single 1mmx2mm hole was then glued with M-bond 610 to the polished side of the disk.


Author(s):  
E. R. Macagno ◽  
C. Levinthal

The optic ganglion of Daphnia Magna, a small crustacean that reproduces parthenogenetically contains about three hundred neurons: 110 neurons in the Lamina or anterior region and about 190 neurons in the Medulla or posterior region. The ganglion lies in the midplane of the organism and shows a high degree of left-right symmetry in its structures. The Lamina neurons form the first projection of the visual output from 176 retinula cells in the compound eye. In order to answer questions about structural invariance under constant genetic background, we have begun to reconstruct in detail the morphology and synaptic connectivity of various neurons in this ganglion from electron micrographs of serial sections (1). The ganglion is sectioned in a dorso-ventra1 direction so as to minimize the cross-sectional area photographed in each section. This area is about 60 μm x 120 μm, and hence most of the ganglion fit in a single 70 mm micrograph at the lowest magnification (685x) available on our Zeiss EM9-S.


Author(s):  
M. K. Lamvik ◽  
A. V. Crewe

If a molecule or atom of material has molecular weight A, the number density of such units is given by n=Nρ/A, where N is Avogadro's number and ρ is the mass density of the material. The amount of scattering from each unit can be written by assigning an imaginary cross-sectional area σ to each unit. If the current I0 is incident on a thin slice of material of thickness z and the current I remains unscattered, then the scattering cross-section σ is defined by I=IOnσz. For a specimen that is not thin, the definition must be applied to each imaginary thin slice and the result I/I0 =exp(-nσz) is obtained by integrating over the whole thickness. It is useful to separate the variable mass-thickness w=ρz from the other factors to yield I/I0 =exp(-sw), where s=Nσ/A is the scattering cross-section per unit mass.


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