Грибовидная меза-структура для лавинных фотодиодов на гетероструктурах InAlAs/InGaAs

Author(s):  
Н.А. Малеев ◽  
А.Г. Кузьменков ◽  
М.М. Кулагина ◽  
А.П. Васильев ◽  
С.А. Блохин ◽  
...  

Mushroom mesa structure for InAlAs/InGaAs avalanche photodiodes (APD) was proposed and investigated. APD heterostructrures were grown by molecular-beam epitaxy. Fabricated APDs with sensitive area diameter of about 30 micron were passivated by SiN deposition and demonstrate avalanche breakdown voltage Vbr ~ 70-80 V. At applied bias of 0.9 Vbr the dark current was ~ 75-200 nA. The single-mode coupled APDs demonstrate responsivity at a gain of unity is high than 0.5A/W at 1550 nm.

2005 ◽  
Vol 44 (No. 17) ◽  
pp. L508-L510 ◽  
Author(s):  
Tomoki Abe ◽  
Koshi Ando ◽  
Katsushi Ikumi ◽  
Hiroyasu Maeta ◽  
Junji Naruse ◽  
...  

1994 ◽  
Vol 11 (12) ◽  
pp. 734-736
Author(s):  
Yong Gao ◽  
Enke Liu ◽  
Guozheng Li ◽  
Xiding Liu ◽  
Xiangjiu Zhang ◽  
...  

Author(s):  
Г.Э. Цырлин ◽  
Р.Р. Резник ◽  
А.Е. Жуков ◽  
Р.А. Хабибуллин ◽  
К.В. Маремьянин ◽  
...  

The data on the synthesis and characterization of structures for a quantum cascade terahertz laser in an AlGaAs/GaAs material system on GaAs substrates using the molecular beam epitaxy method are presented. The features necessary for the implementation of such structures are considered. It was shown that for this geometry almost single-mode lasing is observed at a frequency of ∼ 3 THz up to a temperature of ∼ 60 K.


2004 ◽  
Vol 43 (No. 12A) ◽  
pp. L1555-L1557 ◽  
Author(s):  
Ru-Shang Hsiao ◽  
Jyh-Shyang Wang ◽  
Kun-Feng Lin ◽  
Li Wei ◽  
Hui-Yu Liu ◽  
...  

1996 ◽  
Vol 450 ◽  
Author(s):  
M. Micovic ◽  
W. Z. Cai ◽  
Y. Ren ◽  
J. Neal ◽  
S. F. Nelson ◽  
...  

ABSTRACTWe have investigated several approaches to improve the material quality of lattice-mismatched In.75Ga.25As grown by Molecular Beam Epitaxy (MBE) on (100) InP substrates. They include linear grading of In composition from lattice matched In.53Ga.47As to In.75Ga.25As in a 1 μm buffer layer grown at reduced substrate temperature, in combination with various in situ annealing and material regrowth steps. The material was used for fabrication of mesa-structure p-i-n photodetectors with 2.2 μm cutoff wavelength. The room temperature dark current density at 1 V reverse bias was approximately 2 mA/cm2 in all structures that were subjected to anneal and regrowth process, a factor of three improvement over reference samples which were not subjected to annealing and regrowth. The dark current density at 15 V reverse bias (10 mA/cm2 for the best devices) was at least two orders of magnitude lower in all annealed samples than in reference samples. These results suggest that the MBE grown material can be an attractive alternative to the vapor phase epitaxy (VPE) grown material which is commonly used for fabrication of these detectors.


1990 ◽  
Vol 56 (20) ◽  
pp. 1939-1941 ◽  
Author(s):  
D. J. Arent ◽  
L. Brovelli ◽  
H. Jäckel ◽  
E. Marclay ◽  
H. P. Meier

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