Study of the Absorptance of Si-gratings and of arrays of SiO2-filled trenches on Si-grating substrate

2016 ◽  
Vol 12 (2) ◽  
pp. 4278-4290
Author(s):  
Faouzi Ghmari ◽  
Ilhem Mezni
Keyword(s):  
Transverse Electric ◽  
Transverse Magnetic ◽  
Radiative Properties ◽  
Geometrical Parameters ◽  
Perfect Absorber ◽  
Angle Of Incidence ◽  
Patterned Wafers ◽  
Rigorous Coupled Wave Analysis ◽  
Rigorous Coupled Wave ◽  
Model Structures

The purpose of this paper is to study the radiative properties of two model structures. The first model (A-1) is a rectangular grating of silicon (Si). The second one (A-2) is obtained from A-1 by filling their trenches by SiO2. These patterned wafers are characterized by three geometrical parameters, the period d, the filling factorand the thickness h. To derive and compute the radiative properties we use a rigorous coupled wave analysis (RCWA) method. Our attention is focused on the absorptance of these structures when they are illuminated by a monochromatic plane wave. We investigate the effect of the filling factor on the absorptance versus the direction of the incident wave. At specific angles of incidence the effect of the period is also studied. Besides, the influence of the thickness h on the absorptance is included throughout this work. At the wavelength = 632,8nm, we especially show that we can identify several perfect absorber model structures characterized by specific parameters and by accurate angle of incidence. We show that this will be done in both transverse electric (TE) and transverse magnetic (TM) polarization cases.

Radiative Properties of Pattered Wafers With Linewidth Below 100 nm

2005 ◽  
Author(s):  
Y.-B. Chen ◽  
Z. M. Zhang ◽  
P. J. Timans
Keyword(s):  
Periodic Structures ◽  
Numerical Study ◽  
Radiative Properties ◽  
Angle Of Incidence ◽  
Patterned Wafers ◽  
Rigorous Coupled Wave Analysis ◽  
Recent Developments ◽  
Effective Medium Approach ◽  
Rigorous Coupled Wave ◽  
Very High

Temperature nonuniformity is a critical problem in rapid thermal processing (RTP) of wafers because it leads to uneven diffusion of implanted dopants and introduces thermal stress that can produce defects. One cause of the problem is nonuniform absorption of thermal radiation, especially in patterned wafers, where the optical properties vary across the surface of the wafer. Recent developments in RTP have lead to the use of millisecond-duration heating cycles, where light with very high power density is used to heat the surface of the wafer. Pattern effects are especially important here, because there is very little time for thermal diffusion to even out temperature distributions during the heating cycle. There have been very few studies on the radiative properties of patterned wafers, especially for the structures expected to be used on advanced semiconductor devices. The feature size is already below 100 nm and is comparable or smaller than the wavelengths of radiation (200–1000 nm) emitted by the flash-lamps typically used for millisecond processing. Hence, this work is devoted to a parametric numerical study of the radiative properties of patterned wafers with the smallest dimension down to 30 nm. The effects of wavelength, wave polarization, and angle of incidence on selected periodically patterned wafers are presented. The methods include the rigorous coupled wave analysis (RCWA) and the effective medium approach (EMA). RCWA is used to obtain exact solutions of Maxwell’s equations, and EMA is used to approximate the periodic structures as a planar multilayer structure with an effective dielectric function. This study provides an assessment of the applicability of EMA for simulations of radiative properties of patterned wafers.

Impacts of Nanoscale Features on Infrared Radiative Properties of Metallic Slit Arrays

2009 ◽  
Author(s):  
Y.-B. Chen ◽  
J.-S. Chen ◽  
P.-F. Hsu
Keyword(s):  
Transverse Magnetic ◽  
Radiative Properties ◽  
Cavity Resonance ◽  
Resonance Excitation ◽  
Angle Of Incidence ◽  
Resonance Modes ◽  
Rigorous Coupled Wave Analysis ◽  
Rigorous Coupled Wave ◽  
Nanoscale Features ◽  
Poynting Vectors

Radiative properties (absorptance, reflectance, and transmittance) of deep slits with five nanoscale slit profile variations at the transverse magnetic wave incidence are numerically investigated in this work by employing the rigorous coupled-wave analysis. For slits with attached features, their radiative properties can be much different due to the modified cavity geometry and dangled structures, even at wavelengths between 3 and 15 μm. The shifts of cavity resonance excitation result in higher transmittance through narrower slits at specific wavelengths and resonance modes are confirmed with the electromagnetic fields. Opposite roles possibly played by features in increasing or decreasing absorptance are determined by the feature position and demonstrated by Poynting vectors. Correlations among all properties of a representative slit array, the angle of incidence, and the slit density are also comprehensively studied.

Radiative Properties of Patterned Wafers With Nanoscale Linewidth

2006 ◽  
Vol 129 (1) ◽  
pp. 79-90 ◽  
Author(s):  
Y.-B. Chen ◽  
Z. M. Zhang ◽  
P. J. Timans
Keyword(s):  
Numerical Solutions ◽  
Radiative Properties ◽  
Wafer Surface ◽  
Angle Of Incidence ◽  
Patterned Wafers ◽  
Rigorous Coupled Wave Analysis ◽  
Recent Developments ◽  
Effects Of Temperature ◽  
Rigorous Coupled Wave ◽  
Feature Dimension

Abstract Temperature nonuniformity is a critical problem in rapid thermal processing (RTP) of wafers because it leads to uneven diffusion of implanted dopants and introduces thermal stress. One cause of the problem is nonuniform absorption of thermal radiation, especially in patterned wafers, where the optical properties vary across the wafer surface. Recent developments in RTP have led to the use of millisecond-duration heating cycle, which is too short for thermal diffusion to even out the temperature distribution. The feature size is already below 100nm and is smaller than the wavelength (200-1000nm) of the flash-lamp radiation. Little is known to the spectral distribution of the absorbed energy for different patterning structures. This paper presents a parametric study of the radiative properties of patterned wafers with the smallest feature dimension down to 30nm, considering the effects of temperature, wavelength, polarization, and angle of incidence. The rigorous coupled wave analysis is employed to obtain numerical solutions of the Maxwell equations and to assess the applicability of the method of homogenization based on effective medium formulations.

Reflective three-port high-efficiency grating with two dielectric layers based on a sandwiched configuration

2016 ◽  
Vol 30 (12) ◽  
pp. 1650072 ◽  
Author(s):  
Hongtao Li ◽  
Bo Wang ◽  
Hao Pei ◽  
Wenhao Shu ◽  
Li Chen ◽  
...  
Keyword(s):  
High Efficiency ◽  
Transverse Electric ◽  
Transverse Magnetic ◽  
Wave Analysis ◽  
Beam Splitting ◽  
Practical Applications ◽  
Rigorous Coupled Wave Analysis ◽  
Dielectric Layers ◽  
Rigorous Coupled Wave ◽  
Sandwiched Structure

In this paper, we describe a novel reflective sandwiched three-port grating with two dielectric layers. The two-layer sandwiched grating can separate incident wave into the [Formula: see text] and the 0th-order with high-efficiency beam splitting and good splitting ratios for both transverse electric (TE) and transverse magnetic (TM) polarizations. The grating parameters can be optimized by using rigorous coupled-wave analysis (RCWA) with a special duty cycle of 0.6. With the optimized results, efficiencies more than 32% in the [Formula: see text]st-orders and the 0th-order can be obtained. Furthermore, performance of the incident bandwidth and aspect ratio can be improved. Compared with conventional surface-relief grating, the grating with sandwiched structure is aimed at cleaning and protecting grating surface. The presented reflective two-layer sandwiched three-port grating would be put into practical applications for its beneficial performances.

Dual-function splitting of the embedded grating with connecting layer

2019 ◽  
Vol 33 (11) ◽  
pp. 1850129
Author(s):  
Wenhua Zhu ◽  
Bo Wang ◽  
Chenhao Gao ◽  
Kunhua Wen ◽  
Ziming Meng ◽  
...  
Keyword(s):  
Transverse Electric ◽  
Groove Depth ◽  
Transverse Magnetic ◽  
Dual Function ◽  
First Order ◽  
Rigorous Coupled Wave Analysis ◽  
Rigorous Coupled Wave ◽  
Plane Light ◽  
High Diffraction ◽  
Modal Method

We design and optimize the embedded dual-function grating with connecting layer in Littrow mounting. By using modal method and rigorous coupled-wave analysis, grating parameters are analyzed and calculated including grating groove depth, thickness of connecting layer, and so on. The grating device can diffract the transverse electric-polarized plane light mainly in the first-diffractive order with high-diffraction efficiency of 98.36%. Meanwhile, for the transverse magnetic-polarized plane light, the diffraction efficiencies in the zeroth-order and the first-order corresponding to 49.34% and 49.29% are obtained, respectively.

Research of High Performance Polarization-Independent Grating Beam Splitter

2013 ◽  
Vol 310 ◽  
pp. 481-485
Author(s):  
Ke Zhao ◽  
Xiao Min Lei ◽  
Guo Feng Xie ◽  
Wen Hua Xiong
Keyword(s):  
High Performance ◽  
Beam Splitter ◽  
Transverse Electric ◽  
Transverse Magnetic ◽  
Silicon On Insulator ◽  
Material System ◽  
Design And Optimization ◽  
Rigorous Coupled Wave Analysis ◽  
Rigorous Coupled Wave ◽  
Polarization Independent

Based on a silicon-on-insulator (Silicon-on-insulator, SOI) material system design and optimization of a high performance, the polarization independent of 1 × 3 subwavelength grating stars beam splitter. By a rigorous coupled-wave analysis method showed that, in the 1550nm wavelength range, at vertical incidence, the device on the transverse electric field (transverse electric, TE) ,the 0 and ± 1 order transmittance is 31%, 32%, 32%,respectively; cross the magnetic field (transverse magnetic, TM), the 0 and ± 1 transmittance is 33%, 32%, 32%, respectively.

scholarly journals Quad-Band Plasmonic Perfect Absorber for Visible Light with a Patchwork of Silicon Nanorod Resonators

Materials ◽  
2018 ◽  
Vol 11 (10) ◽  
pp. 1954 ◽  
Author(s):  
Can Cao ◽  
Yongzhi Cheng
Keyword(s):  
Visible Light ◽  
Transverse Electric ◽  
Transverse Magnetic ◽  
Localized Surface Plasmon ◽  
Perfect Absorber ◽  
Absorption Properties ◽  
Perfect Absorption ◽  
Potential Applications ◽  
Polarization Insensitive ◽  
Band Absorption

In this paper, a plasmonic perfect absorber (PPA) based on a silicon nanorod resonator (SNRR) for visible light is proposed and investigated numerically. The proposed PPA is only a two-layer nanostructure consisting of a SNRR periodic array and metal substrate. The perfect absorption mainly originates from excitation of the localized surface plasmon resonance (LSPR) mode in the SNRR structure. The absorption properties of this design can be adjusted by varying the radius (r) and height (h) of the SNRR structure. What is more, the stronger quad-band absorption can be achieved by combing four different radius of the SNRR in one period as a super unit-cell. Numerical simulation indicates that the designed quad-band PPA can achieve the absorbance of 99.99%, 99.8%, 99.8%, and 92.2% at 433.5 THz, 456 THz, 482 THz, and 504.5 THz, respectively. Further simulations show that the proposed PPA is polarization-insensitive for both transverse electric (TE) and transverse magnetic (TM) modes. The proposed PPA can be a desirable candidate for some potential applications in detecting, sensing, and visible spectroscopy.

SURFACE-COVERED 1×3 GRATING WITH DIELECTRIC-METAL SLABS UNDER SECOND BRAGG INCIDENCE

2020 ◽  
Vol 27 (09) ◽  
pp. 1950201
Author(s):  
CHEN FU ◽  
BO WANG ◽  
WENHUA ZHU ◽  
KUNHUA WEN ◽  
ZIMING MENG ◽  
...  
Keyword(s):  
Incident Light ◽  
Polarized Light ◽  
Transverse Magnetic ◽  
Second Order ◽  
Bragg Angle ◽  
Efficiency Ratio ◽  
First Order ◽  
Rigorous Coupled Wave Analysis ◽  
Rigorous Coupled Wave ◽  
The Given

This paper designed a novel three-port reflective surface-covered grating with a connecting layer. The grating can be used as a splitter, and the polarized light can be divided into zero order, first order and second order. Through rigorous coupled-wave analysis, the efficiency of the three orders of diffraction light is close to 33% under the condition that the incident light at 1550 nm is incident at the second Bragg angle and the given duty cycle is 0.5. The efficiency and bandwidth of the surface-covered grating are improved compared with that of the surface-relief grating reported in the past. Especially for transverse magnetic polarized light, the beam splitting effect is more uniform, the efficiency ratio of the zeroth order to first order can reach 1.01, and the efficiency ratio of the first order to second order can reach 1.

Impact of Nanoscale Features of Metallic Slits on Mid-Infrared Radiative Properties

2008 ◽  
Author(s):  
Y.-B. Chen ◽  
J.-S. Chen ◽  
K. Fu ◽  
P.-F. Hsu
Keyword(s):  
Physical Mechanism ◽  
Radiative Properties ◽  
Cavity Resonance ◽  
Mid Infrared ◽  
Rigorous Coupled Wave Analysis ◽  
Slit Geometry ◽  
Rigorous Coupled Wave ◽  
Nanoscale Features ◽  
Poynting Vectors ◽  
Difference Time

Mid-Infrared radiative properties (absorptance, reflectance, and transmittance) of submicron gold slit arrays have been numerically studied with rigorous coupled-wave analysis and the finite difference time domain method. The slit width varies from 50 nm to 300 nm and a square feature may attach at either or both slit sides. Although the wavelength is one or two orders of magnitude longer than the side length of features, the attached nanoscale features can modify radiative properties significantly. Directional dependence on radiative properties has also been detail investigated by looking into electromagnetic fields and Poynting vectors of selected slit geometry. One possible physical mechanism, cavity resonance, account for unique radiative properties have been suggested and verified in the study as well.

scholarly journals Graphene-Based Cylindrical Pillar Gratings for Polarization-Insensitive Optical Absorbers

2019 ◽  
Vol 9 (12) ◽  
pp. 2528 ◽  
Author(s):  
Muhammad Fayyaz Kashif ◽  
Giuseppe Valerio Bianco ◽  
Tiziana Stomeo ◽  
Maria Antonietta Vincenti ◽  
Domenico de Ceglia ◽  
...  
Keyword(s):  
Near Infrared ◽  
Monolayer Graphene ◽  
Geometrical Parameters ◽  
Guided Mode ◽  
Rigorous Coupled Wave Analysis ◽  
Dielectric Gratings ◽  
Method Effects ◽  
Polarization Insensitive ◽  
Rigorous Coupled Wave ◽  
Infrared Frequencies

In this study, we present a two-dimensional dielectric grating which allows achieving high absorption in a monolayer graphene at visible and near-infrared frequencies. Dielectric gratings create guided-mode resonances that are exploited to effectively couple light with the graphene layer. The proposed structure was numerically analyzed through a rigorous coupled-wave analysis method. Effects of geometrical parameters and response to the oblique incidence of the plane wave were studied. Numerical results reveal that light absorption in the proposed structure is almost insensitive to the angle of the impinging source over a considerable wide angular range of 20°. This may lead to the development of easy to fabricate and experimentally viable graphene-based absorbers in the future.

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