LAYERED IN2SE3 ON SI (111) SURFACE WITH HYSTERESIS OF THE TEMPERATURE DEPENDENCE OF RESISTANCE
2020 ◽
Keyword(s):
In this work, the methods of controlled growth of two-dimensional In2Se3 on a Si (111) substrate were studied by reflection high-energy electron diffraction (RHEED). According to experimental data, the deposition rate reduction increases the size of two-dimensional In2Se3 islands. The temperature dependence of the film resistance was measured by the two-contact technique. At temperature decrease near T = 140 K, an abrupt decrease in resistance by a factor of ~ 1000 was found. The reverse transition occurs near T = 180 K. At T = 20–40 K the second hysteresis occurring without the film resistance jump was found.
1990 ◽
Vol 48
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pp. 398-399
2015 ◽
Vol 48
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1994 ◽
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pp. L1-L4
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2000 ◽
Vol 18
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pp. 968-971
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pp. 1024-1030
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2000 ◽
Vol 80
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pp. 2355-2363
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1998 ◽
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pp. 2373
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