TPLY for Yield Improvement

Author(s):  
G. Matusiewicz

Abstract A strategy for improving yield lately is this: wafers are electrically tested to determine which chips are defective. Defects are located and classified by the failure analyst who establishes a root cause for each type of defect. This information is delivered to the process engineers who then eliminate the root causes of the most frequently occurring defects. This process is known as TPLY. for Tested Product Limited Yield. This method gives the physical failure analyst the job of finding statistical numbers of defects. Defects are located by deprocessing chips and examining them with an optical or electron microscope, usually in an area of the chip identified by a bit fail map or some other technique, such as liquid crystal hot spot detection. This presentation offers practical suggestions for improving the efficiency of the TPLY process. It includes general considerations for TPLY, methods for delayering chips and finding defects quickly, and statistical methods for identifying the cause of low yield with minimum sample sizes. A simple yield model is developed for relating test site yield to product chip final test yield, and explains why test sites do not always adequately predict yield of the product. Case studies and other examples are discussed to demonstrate the application of these techniques.

2002 ◽  
Vol 42 (9-11) ◽  
pp. 1741-1746 ◽  
Author(s):  
O. Crepel ◽  
F. Beaudoin ◽  
L. Dantas de Morais ◽  
G. Haller ◽  
C, Goupil ◽  
...  

Author(s):  
Dominique Carisetti ◽  
Mohsine Bouya ◽  
Odile Bezencenet ◽  
Bernard Servet ◽  
Jean-Claude Clément ◽  
...  

Abstract This paper focuses on infrared (IR) thermography capabilities on III-V components for thermal measurements applications and failure analysis (FA). The first part discusses the thermal mapping on InGaAs/AlGaAs PHEMT structure and compares IR thermal measurement with the well-known techniques as Raman and SThM. The second part discusses IR thermography on challenging FA for hot spot detection on the most popular type of capacitor for III-V MMICs as the metal-insulator-metal capacitor. It shows how IR thermography can easily localize very small pinholes in SiN, where liquid crystal and OBIRCH techniques are not well adapted.


Author(s):  
S. Ferrier

Abstract Three enhancements to Liquid Crystal hot spot detection improve thermal and optical sensitivity while substantially maintaining simplicity, safety and relative low cost. These enhancements have permitted detection of hot spots unidentifiable by traditional LC methods. Details, capabilities and limitations of the enhancements are discussed, results of rudimentary defect thermal modeling are presented, and an improved metric for evaluating LC technique sensitivity is proposed.


Author(s):  
Erik Paul ◽  
Holger Herzog ◽  
Sören Jansen ◽  
Christian Hobert ◽  
Eckhard Langer

Abstract This paper presents an effective device-level failure analysis (FA) method which uses a high-resolution low-kV Scanning Electron Microscope (SEM) in combination with an integrated state-of-the-art nanomanipulator to locate and characterize single defects in failing CMOS devices. The presented case studies utilize several FA-techniques in combination with SEM-based nanoprobing for nanometer node technologies and demonstrate how these methods are used to investigate the root cause of IC device failures. The methodology represents a highly-efficient physical failure analysis flow for 28nm and larger technology nodes.


Author(s):  
Rami F. Salem ◽  
Ahmed Arafa ◽  
Sherif Hany ◽  
Abdelrahman ElMously ◽  
Haitham Eissa ◽  
...  

2016 ◽  
Vol 19 (3) ◽  
pp. 77-83 ◽  
Author(s):  
Miroslav Prístavka ◽  
Martina Kotorová ◽  
Radovan Savov

AbstractThe tools for quality management are used for quality improvement throughout the whole Europe and developed countries. Simple statistics are considered one of the most basic methods. The goal was to apply the simple statistical methods to practice and to solve problems by using them. Selected methods are used for processing the list of internal discrepancies within the organization, and for identification of the root cause of the problem and its appropriate solution. Seven basic quality tools are simple graphical tools, but very effective in solving problems related to quality. They are called essential because they are suitable for people with at least basic knowledge in statistics; therefore, they can be used to solve the vast majority of problems.


2011 ◽  
Author(s):  
Hongbo Zhang ◽  
Yuelin Du ◽  
Martin D. F. Wong ◽  
Rasit O. Topaloglu

Sign in / Sign up

Export Citation Format

Share Document